公开(公告)号：US11664252B2

公开(公告)日：2023-05-30

申请号：US17787565

申请日：2020-12-21

Applicant: EBARA CORPORATION

Inventor： Michiaki Matsuda ,  Hisajiro Nakano ,  Fuyuki Ogaki ,  Yusuke Watanabe ,  Junji Kunisawa

IPC: H01L21/67 ,  B08B1/00 ,  B08B1/02 ,  B08B3/02 ,  B08B13/00 ,  H01L21/02

CPC classification number: H01L21/67253 ,  B08B1/001 ,  B08B1/02 ,  B08B3/022 ,  B08B13/00 ,  H01L21/67051 ,  H01L21/67219 ,  H01L21/67288 ,  H01L21/02057

Abstract: A cleaning device includes: a plurality of rollers that hold a peripheral edge part of a substrate; a rotation driving unit that rotates the substrate by rotationally driving the plurality of rollers; a cleaning member that abuts on the substrate and cleans the substrate; a cleaning liquid supply nozzle that supplies a cleaning liquid to the substrate; a microphone that detects a sound generated when a notch of the peripheral edge part of the substrate hits the plurality of rollers; and a rotation speed calculation unit that calculates a rotation speed of the substrate on the basis of the sound detected by the microphone.

公开(公告)号：US11094548B2

公开(公告)日：2021-08-17

申请号：US16313442

申请日：2017-06-26

Applicant: EBARA CORPORATION

Inventor： Shinji Kajita ,  Hisajiro Nakano ,  Tomoatsu Ishibashi ,  Koichi Fukaya ,  Yasuyuki Motoshima ,  Yohei Eto ,  Fumitoshi Oikawa

IPC: H01L21/304 ,  H01L21/67 ,  H01L21/687 ,  H01L21/02

Abstract: An apparatus for cleaning a substrate has a holding unit 60 that holds a substrate W; a rotated unit 30 connected to the holding unit 60; a rotating unit 35 that is provided on a peripheral outer side of the rotated unit 30 and rotates the rotated unit 30; and a cleaning unit 10, 20 that physically cleans the substrate W held by the holding unit 60.

公开(公告)号：US11495475B2

公开(公告)日：2022-11-08

申请号：US16780049

申请日：2020-02-03

Applicant: EBARA CORPORATION

Inventor： Koji Maeda ,  Hiroshi Shimomoto ,  Hisajiro Nakano ,  Masayoshi Imai ,  Yoichi Shiokawa

IPC: H01L21/302 ,  H01L21/67 ,  B24B37/34 ,  B24B37/04

Abstract: Various methods of cleaning a substrate are provided. In one aspect, method of cleaning a substrate, comprising: holding and rotating a substrate by a substrate holder; and supplying a chemical liquid to a chemical liquid nozzle and supplying two fluids to a two-fluid nozzle while moving the chemical-liquid nozzle and the two-fluid nozzle radially outwardly from the center to the periphery of the substrate, wherein the distance of the chemical-liquid nozzle from a rotating axis of the substrate holder is longer than the distance of the two-fluid nozzle from the rotating axis of the substrate holder while the chemical-liquid nozzle and the two-fluid nozzle are moved radially outwardly from the rotating axis of the substrate holder.

公开(公告)号：US20220203411A1

公开(公告)日：2022-06-30

申请号：US17561268

申请日：2021-12-23

Applicant: EBARA CORPORATION

Inventor： Fumitoshi Oikawa ,  Koichi Fukaya ,  Erina Baba ,  Shuichi Suemasa ,  Hisajiro Nakano

IPC: B08B3/12 ,  B08B3/02 ,  B08B1/04

Abstract: A substrate cleaning device includes a rotation mechanism that rotates the substrate, a first cleaning solution supply nozzle that discharges a cleaning solution to which ultrasonic vibration is applied to the surface of the substrate, and a swing mechanism that swings the first cleaning solution supply nozzle from a vicinity of a rotation center of the substrate toward an outer peripheral edge of the substrate in a range narrower than a half-surface of the substrate.

公开(公告)号：US20210163208A1

公开(公告)日：2021-06-03

申请号：US16322400

申请日：2018-11-14

Applicant: EBARA CORPORATION

Inventor： Hisajiro Nakano ,  Tomoatsu Ishibashi

IPC: B65D81/26 ,  H01L21/67

Abstract: A storage container of a scrub member includes a container warn body and a lid body engaging with the container main body, where the scrub member is accommodated in an internal portion of the storage container surrounded by the container main body and the lid body, and a ventilation groove which communicates the internal portion of the storage container and an outside of the storage container is formed on an engagement surface where the container main body and the lid both are engaged.

公开(公告)号：US10741423B2

公开(公告)日：2020-08-11

申请号：US15978320

申请日：2018-05-14

Applicant: Ebara Corporation

Inventor： Hisajiro Nakano ,  Junji Kunisawa

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/677

Abstract: A substrate cleaning apparatus and related apparatuses/methods are disclosed. In one embodiment, a substrate cleaning apparatus includes: a first spindle group including a first driving spindle having a first driving roller configured to rotate a substrate and an idler spindle having a driven roller rotated by the substrate; a second spindle group including a plurality of second driving spindles each having a second driving roller configured to rotate the substrate; a cleaning mechanism configured to clean the substrate rotated by the first driving roller and the plurality of second driving rollers; and a rotation detector configured to detect the rotational speed of the driven roller. The driven roller is positioned on the opposite side to a direction in which the substrate receives a force from the cleaning mechanism.

公开(公告)号：US11948827B2

公开(公告)日：2024-04-02

申请号：US17838248

申请日：2022-06-12

Applicant: EBARA CORPORATION

Inventor： Mitsuru Miyazaki ,  Hisajiro Nakano ,  Takuya Inoue

IPC: H01L21/687 ,  B08B3/02 ,  B08B13/00 ,  H01L21/67

CPC classification number: H01L21/68728 ,  B08B3/022 ,  B08B13/00 ,  H01L21/67028

Abstract: The disclosure provides one technique for suppressing wear of a cleaning member and unexpected dust generation. A substrate support mechanism 100 includes a first support part 110 which is swingable and has a contact region that can come into contact with a peripheral edge of one surface of a substrate W in a closed state, a second support part 120 which supports the other surface of the substrate W, and a first support part moving part 140 which swings the first support part 110.

公开(公告)号：US20240082885A1

公开(公告)日：2024-03-14

申请号：US18511727

申请日：2023-11-16

Applicant: EBARA CORPORATION

Inventor： Fumitoshi Oikawa ,  Koichi Fukaya ,  Erina Baba ,  Shuichi Suemasa ,  Hisajiro Nakano

IPC: B08B3/02 ,  B08B1/04

CPC classification number: B08B3/024 ,  B08B1/04 ,  B08B2203/0288

Abstract: A substrate cleaning device includes a rotation mechanism that rotates the substrate, a first cleaning solution supply nozzle that discharges a cleaning solution to which ultrasonic vibration is applied to the surface of the substrate, and a swing mechanism that swings the first cleaning solution supply nozzle from a vicinity of a rotation center of the substrate toward an outer peripheral edge of the substrate in a range narrower than a half-surface of the substrate.

公开(公告)号：US11532491B2

公开(公告)日：2022-12-20

申请号：US16919788

申请日：2020-07-02

Applicant: Ebara Corporation

Inventor： Hisajiro Nakano ,  Junji Kunisawa

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/677

Abstract: A substrate cleaning apparatus and related apparatuses/methods are disclosed. In one embodiment, a substrate cleaning apparatus includes: a first spindle group including a first driving spindle having a first driving roller configured to rotate a substrate and an idler spindle having a driven roller rotated by the substrate; a second spindle group including a plurality of second driving spindles each having a second driving roller configured to rotate the substrate; a cleaning mechanism configured to clean the substrate rotated by the first driving roller and the plurality of second driving rollers; and a rotation detector configured to detect the rotational speed of the driven roller. The driven roller is positioned on the opposite side to a direction in which the substrate receives a force from the cleaning mechanism.

公开(公告)号：US11142386B2

公开(公告)日：2021-10-12

申请号：US16322400

申请日：2018-11-14

Applicant: EBARA CORPORATION

Inventor： Hisajiro Nakano ,  Tomoatsu Ishibashi

IPC: A46B17/04 ,  B65D81/26 ,  H01L21/67 ,  B65D43/02

Abstract: A storage container of a scrub member includes a container main body and a lid body engaging with the container main body, where the scrub member is accommodated in an internal portion of the storage container surrounded by the container main body and the lid body, and a ventilation groove which communicates the internal portion of the storage container and an outside of the storage container is formed on an engagement surface where the container main body and the lid body are engaged.