公开(公告)号：US20220072585A1

公开(公告)日：2022-03-10

申请号：US17309980

申请日：2020-01-08

Applicant: EUROPLASMA NV

Inventor： Marc Sercu ,  Samir Loulidi

IPC: B05D1/00 ,  B05D3/14 ,  B05D7/00

Abstract: A plasma polymerisation method for coating a substrate with a polymer layer, which method includes: providing a substrate to be coated within a plasma chamber; introducing a flow of a first polymer precursor to the plasma chamber; applying a power at a level greater than zero Watts (W) and converting the first polymer precursor to a first polymer precursor plasma; exposing the substrate to the first polymer precursor plasma; introducing a flow of a second polymer precursor to the plasma chamber; applying a power at a level greater than zero Watts (W) and converting the second polymer precursor to a second polymer precursor plasma; and exposing the substrate to the second polymer precursor plasma, wherein exposing the substrate to the first polymer precursor plasma forms a first polymer layer thereon and exposing the substrate to the second polymer precursor plasma forms a second polymer layer thereon, characterised by maintaining the power at a level greater than zero Watts (W) between exposing the substrate to the first polymer precursor plasma and exposing the substrate to the second polymer precursor plasma.

公开(公告)号：US10410833B2

公开(公告)日：2019-09-10

申请号：US15027708

申请日：2014-10-07

Applicant: Europlasma NV

Inventor： Filip Legein ,  Eva Rogge ,  Marc Sercu

IPC: H01J37/32 ,  B05D7/02 ,  B05D5/08 ,  C03C17/32 ,  C23C16/50 ,  B05D7/14 ,  C04B41/00 ,  C04B41/45 ,  C04B41/83 ,  C09D133/16 ,  C23C26/00 ,  D21H23/22 ,  B05D1/00

Abstract: The present invention concerns a method comprising the steps of: introducing a substrate comprising a surface to be coated in a low-pressure reaction chamber; exposing said surface to a plasma during a treatment period within said reaction chamber; ensuring a stable plasma ignition by applying a power input, characterized in that the power input is continuously strictly higher than zero Watt (W) during said treatment period and comprises at least a lower limit power and at least an upper limit power strictly larger than said lower limit power, thereby obtaining a substrate with a coated surface. The present invention further concerns an apparatus for treating a substrate with a low-pressure plasma process and a substrate treated as such.

公开(公告)号：US20160284518A1

公开(公告)日：2016-09-29

申请号：US15027708

申请日：2014-10-07

Applicant: EUROPLASMA NV

Inventor： Filip Legein ,  Eva Rogge ,  Marc Sercu

IPC: H01J37/32 ,  B05D7/02 ,  C03C17/32 ,  B05D7/14 ,  C09D133/16 ,  D21H23/22 ,  C04B41/45 ,  C04B41/00 ,  C04B41/83 ,  B05D5/08 ,  C23C26/00

CPC classification number: H01J37/32146 ,  B05D1/62 ,  B05D5/08 ,  B05D7/02 ,  B05D7/14 ,  C03C17/32 ,  C03C2217/20 ,  C03C2217/76 ,  C03C2218/15 ,  C04B41/009 ,  C04B41/4523 ,  C04B41/83 ,  C09D133/16 ,  C23C16/50 ,  C23C26/00 ,  D21H23/22 ,  H01J2237/327 ,  H01J2237/3326

Abstract: The present invention concerns a method comprising the steps of: introducing a substrate comprising a surface to be coated in a low-pressure reaction chamber; exposing said surface to a plasma during a treatment period within said reaction chamber; ensuring a stable plasma ignition by applying a power input, characterized in that the power input is continuously strictly higher than zero Watt (W) during said treatment period and comprises at least a lower limit power and at least an upper limit power strictly larger than said lower limit power, thereby obtaining a substrate with a coated surface. The present invention further concerns an apparatus for treating a substrate with a low-pressure plasma process and a substrate treated as such.

Abstract translation: 本发明涉及一种包括以下步骤的方法：将包含待涂覆表面的基底引入低压反应室中; 在所述反应室内的处理期间将所述表面暴露于等离子体; 通过施加电力输入来确保稳定的等离子体点火，其特征在于，在所述处理期间，功率输入连续严格地高于零瓦特（W），并且至少包括下限功率和至少严格大于所述 下限功率，从而获得具有涂覆表面的基板。 本发明还涉及一种用低压等离子体工艺处理衬底的设备和这样处理的衬底。