公开(公告)号：US20240161999A1

公开(公告)日：2024-05-16

申请号：US18054880

申请日：2022-11-11

Applicant: FEI Company

Inventor： Rudolf Geurink ,  Hugo Cornelis Van Leeuwen ,  Gerard Nicolass Anne Van Veen ,  Pleun Dona ,  Stephan Kujawa ,  Maarten Bischoff

IPC: H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/18 ,  H01J37/20 ,  H01J37/226 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2802

Abstract: The present disclosure relates to a charged particle microscope in which in-situ thermal laser epitaxy can be performed and the product analysed, methods of performing in-situ thermal laser epitaxy and analysis within the charged particle microscope and the combination of at least one cartridge and a laser for use in a charged-particle microscope to provide in-situ thermal laser epitaxy and analysis are also described.

公开(公告)号：US20240112878A1

公开(公告)日：2024-04-04

申请号：US17957171

申请日：2022-09-30

Applicant: FEI COMPANY

Inventor： Pleun Dona ,  Johannes A.H.W.G. Persoon ,  Hugo Cornelis Van Leeuwen ,  Peter Tiemeijer

IPC: H01J37/18 ,  H01J37/141 ,  H01J37/20

CPC classification number: H01J37/18 ,  H01J37/141 ,  H01J37/20

Abstract: A charged particle microscope for imaging a specimen. The charged particle microscope includes a specimen holder movable into an imaging position intersecting an optical axis, a specimen chamber configured to receive the specimen holder in the imaging position, and a sorption pump disposed in the specimen chamber and configured to lower a pressure in the specimen chamber.