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公开(公告)号：US20240307914A1
公开(公告)日：2024-09-19
申请号：US18603922
申请日：2024-03-13
Applicant: FLOSFIA INC.
Inventor： Makoto SHIMIZU , Hiroshi SHIHO , Hiroyuki ANDO , Naoyuki TSUKAMOTO , Yuji KATO
CPC classification number: B05D1/60 , B05D1/005 , C09D4/00 , B05D2203/30
Abstract: The present disclosure provides a film formation method having an excellent mass productivity.
The present disclosure provides a film formation method using one aqueous solution or different aqueous solutions containing at least one of a metal complex having two or more different ligands and a metal complex having same ligands and substituents as well as a gallium compound, in which the metal complex having the two or more different ligands has nitrogen atom, and the metal complex having the same ligands and substituents has a halogen atom.-
公开(公告)号：US20240309556A1
公开(公告)日：2024-09-19
申请号：US18603541
申请日：2024-03-13
Applicant: FLOSFIA INC.
Inventor： Makoto SHIMIZU , Hiroshi SHIHO , Hiroyuki ANDO , Naoyuki TSUKAMOTO , Yuji KATO
Abstract: The present disclosure provides a film formation method having an excellent mass productivity.
In the film formation method, at least one of a metal complex having two or more different ligands, and a metal complex having same ligands and substituents is used.-
公开(公告)号：US20240307913A1
公开(公告)日：2024-09-19
申请号：US18603868
申请日：2024-03-13
Applicant: FLOSFIA INC.
Inventor： Makoto Shimizu , Hiroshi SHIHO , Hiroyuki ANDO , Naoyuki TSUKAMOTO , Yuji KATO
CPC classification number: B05D1/60 , B05D1/005 , C09D4/00 , B05D2203/30
Abstract: The present disclosure provides a film formation method having an excellent mass productivity.
In the film formation method, a metal complex is used, which shows an exothermic peak at 480°° C. to 520°° C. in a thermogravimetric-differential thermal analysis at a temperature increase rate of 20° C./min under an oxygen-containing atmosphere.
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