公开(公告)号：US20240307914A1

公开(公告)日：2024-09-19

申请号：US18603922

申请日：2024-03-13

Applicant: FLOSFIA INC.

Inventor： Makoto SHIMIZU ,  Hiroshi SHIHO ,  Hiroyuki ANDO ,  Naoyuki TSUKAMOTO ,  Yuji KATO

IPC: B05D1/00 ,  C09D4/00

CPC classification number: B05D1/60 ,  B05D1/005 ,  C09D4/00 ,  B05D2203/30

Abstract: The present disclosure provides a film formation method having an excellent mass productivity.
The present disclosure provides a film formation method using one aqueous solution or different aqueous solutions containing at least one of a metal complex having two or more different ligands and a metal complex having same ligands and substituents as well as a gallium compound, in which the metal complex having the two or more different ligands has nitrogen atom, and the metal complex having the same ligands and substituents has a halogen atom.

公开(公告)号：US20240309556A1

公开(公告)日：2024-09-19

申请号：US18603541

申请日：2024-03-13

Applicant: FLOSFIA INC.

Inventor： Makoto SHIMIZU ,  Hiroshi SHIHO ,  Hiroyuki ANDO ,  Naoyuki TSUKAMOTO ,  Yuji KATO

IPC: C30B29/54 ,  C30B25/18

CPC classification number: C30B29/54 ,  C30B25/18

Abstract: The present disclosure provides a film formation method having an excellent mass productivity.
In the film formation method, at least one of a metal complex having two or more different ligands, and a metal complex having same ligands and substituents is used.