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公开(公告)号：US08887659B2
公开(公告)日：2014-11-18
申请号：US12527885
申请日：2008-02-18
Applicant: Frederick H. Fiesser
Inventor： Frederick H. Fiesser
IPC: B05C3/00 , B05B17/00 , B05C5/00 , B05C3/02 , B05C5/02 , B05D1/02 , B01J2/00 , B05C3/05 , B05C13/00 , B05C19/02 , B05C9/08 , B05B13/02 , A23G3/20 , B01J2/18 , A23G3/26 , B05D1/22 , B05D3/12 , A61J3/00 , A01C1/06
CPC classification number: A61K9/5089 , A01C1/06 , A23G3/26 , A61J3/005 , B01J2/006 , B01J2/18 , B05B13/0257 , B05C3/05 , B05C5/0216 , B05C5/022 , B05C9/08 , B05C13/00 , B05C19/02 , B05D1/02 , B05D1/22 , B05D3/12 , B05D2258/00
Abstract: A continuous dosage form coating apparatus uses vibrational impulses to maintain a dosage forms in a fluid state to expose them to a coating material atomized by spraying.
Abstract translation: 连续剂型涂布装置使用振动脉冲将剂型保持在流体状态以将它们暴露于通过喷雾雾化的涂层材料。
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公开(公告)号：US5475964A
公开(公告)日：1995-12-19
申请号：US264889
申请日：1994-06-24
Applicant: Frederick H. Fiesser , Robert V. Jeral
Inventor： Frederick H. Fiesser , Robert V. Jeral
CPC classification number: B65B25/064 , B65B51/30 , B65B53/02 , B65B9/067
Abstract: An apparatus which produces consistent transverse seals in a continuous shrink film packaging operation to package trays is disclosed. The seals are consistent as a result of constant sealing dwell-time, and are also consistently positioned with respect to the trays. Neat, leak-free packages are produced after shrinking. The apparatus is particularly useful for packaging trays of moisture-containing food products such as chicken parts.
Abstract translation: 公开了一种在包装托盘的连续收缩膜包装操作中产生一致横向密封的装置。 由于密封停留时间恒定，密封件是一致的，并且也相对于托盘始终定位。 整齐无泄漏的包装在收缩后生产。 该装置特别适用于包装诸如鸡零件的含水食品的托盘。
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公开(公告)号：US08252234B2
公开(公告)日：2012-08-28
申请号：US11148920
申请日：2005-06-09
Applicant: Allan J. Clarke , David George Doughty , Frederick H. Fiesser , David S. Wagner
Inventor： Allan J. Clarke , David George Doughty , Frederick H. Fiesser , David S. Wagner
CPC classification number: B05C11/10 , A61J3/00 , A61J3/005 , A61J3/007 , A61J3/10 , B41P2200/00 , B41P2200/31 , C23C16/52 , G01N21/3563 , G01N21/359 , G01N21/64 , G01N21/93 , G01N21/9508 , G01N2021/6417 , Y10T436/11 , Y10T436/113332 , Y10T436/12 , Y10T436/2575
Abstract: An apparatus is provided for producing pharmaceutical and pharmaceutical-like product. The apparatus provides real-time monitoring of the pharmaceutical product and can provide real-time control. The apparatus monitors the dosage both before and after it has been added to a carrier substrate. The apparatus can provide monitoring of each pharmaceutical product that is processed.
Abstract translation: 提供了用于生产药物和药物样产品的装置。 该设备提供医药产品的实时监控，并可提供实时控制。 该装置在添加到载体基质之前和之后监测剂量。 该装置可以提供对被处理的每种药物的监测。
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公开(公告)号：US08101244B2
公开(公告)日：2012-01-24
申请号：US11148822
申请日：2005-06-09
Applicant: Allan J. Clarke , David George Doughty , Frederick H. Fiesser
Inventor： Allan J. Clarke , David George Doughty , Frederick H. Fiesser
IPC: B05C11/10
CPC classification number: B05C11/10 , G01N21/95684
Abstract: An apparatus and method are provided for producing a plurality of products or processing a plurality of samples via dispensing. The apparatus and method provide real-time monitoring of the products/samples and can provide real-time control. The apparatus and method can monitor the liquid both before and after it has been added to a carrier substrate. The apparatus and method can provide monitoring of each product/sample that is processed.
Abstract translation: 提供了用于生产多个产品或通过分配来处理多个样品的装置和方法。 该设备和方法提供对产品/样品的实时监控，并可提供实时控制。 该装置和方法可以在添加到载体基板之前和之后监测液体。 该装置和方法可以提供对处理的每个产品/样品的监测。
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Patent Agency Ranking
公开(公告)号：US20120141655A1
公开(公告)日：2012-06-07
申请号：US13389457
申请日：2010-08-11
Applicant: Allan J. Clarke , Frederick H. Fiesser , James A. McHugh
Inventor： Allan J. Clarke , Frederick H. Fiesser , James A. McHugh
Abstract: The present disclosure provides a device for preventing the fouling of a liquid dispensing nozzle. The end of the dispensing nozzle is placed in a hollow interior of a band carrying the same solvents that are dispensed by the nozzle. The solvent on the band evaporates into a gap between the ring and dispensing nozzle, thus providing a vapor sheath or environment that helps to prevent the fouling of the dispensing nozzle.
Abstract translation: 本公开提供了一种用于防止液体分配喷嘴的结垢的装置。 分配喷嘴的端部放置在携带由喷嘴分配的相同溶剂的带的中空内部。 带上的溶剂蒸发到环和分配喷嘴之间的间隙中，从而提供有助于防止分配喷嘴结垢的蒸气鞘或环境。
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公开(公告)号：US06402595B1
公开(公告)日：2002-06-11
申请号：US09610820
申请日：2000-07-06
Applicant: Frederick H. Fiesser
Inventor： Frederick H. Fiesser
IPC: B24B100
CPC classification number: B24B49/006 , B24B37/042
Abstract: A semiconductor wafer is polished by a method which avoids constant instantaneous relative velocity between the wafer and an abrasive medium. The wafer is held by a tooling head and is contacted by an abrasive pad which is fixedly attached to a table. At least one of the tooling head and the table is movable relative to the other. A controller governs movement of the tooling head and/or the table according to a predetermined polishing pattern to initially effect a uniform instantaneous relative velocity between the wafer and the abrasive pad. The wafer is held by the tooling head in an initial orientation with respect to the abrasive pad. By changing the orientation of the wafer with respect to the abrasive pad, the instantaneous relative velocity changes for at least some point on the wafer.
Abstract translation: 通过避免晶片和研磨介质之间恒定的瞬时相对速度的方法来抛光半导体晶片。 晶片由工具头保持，并且被固定地附接到工作台的研磨垫接触。 工具头和工作台中的至少一个可相对于另一工具移动。 控制器根据预定的抛光图案控制加工头和/或台的运动，以最初实现晶片和研磨垫之间的均匀的瞬时相对速度。 晶片由模具头以相对于研磨垫的初始取向保持。 通过改变晶片相对于研磨垫的取向，晶片上的至少某个点的瞬时相对速度发生变化。
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公开(公告)号：US08986777B2
公开(公告)日：2015-03-24
申请号：US13389457
申请日：2010-08-11
Applicant: Allan J. Clarke , Frederick H. Fiesser , James A. McHugh
Inventor： Allan J. Clarke , Frederick H. Fiesser , James A. McHugh
Abstract: The present disclosure provides a device for preventing the fouling of a liquid dispensing nozzle. The end of the dispensing nozzle is placed in a hollow interior of a band carrying the same solvents that are dispensed by the nozzle. The solvent on the band evaporates into a gap between the ring and dispensing nozzle, thus providing a vapor sheath or environment that helps to prevent the fouling of the dispensing nozzle.
Abstract translation: 本公开提供了一种用于防止液体分配喷嘴的结垢的装置。 分配喷嘴的端部放置在携带由喷嘴分配的相同溶剂的带的中空内部。 带上的溶剂蒸发到环和分配喷嘴之间的间隙中，从而提供有助于防止分配喷嘴结垢的蒸气鞘或环境。
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公开(公告)号：US08967074B2
公开(公告)日：2015-03-03
申请号：US12854566
申请日：2010-08-11
Applicant: Allan J. Clarke , Frederick H. Fiesser , James A. McHugh
Inventor： Allan J. Clarke , Frederick H. Fiesser , James A. McHugh
Abstract: The present disclosure provides a device for preventing the fouling of a liquid dispensing nozzle. The end of the dispensing nozzle is placed In a hollow interior of a band carrying the same solvents that are dispensed by the nozzle. The solvent on the band evaporates into a gap between the ring and the dispensing nozzle, thus providing a vapor sheath or environment that helps to prevent the fouling of the dispensing nozzle.
Abstract translation: 本公开提供了一种用于防止液体分配喷嘴的结垢的装置。 分配喷嘴的末端被放置在携带由喷嘴分配的相同溶剂的带的中空内部。 带上的溶剂蒸发到环和分配喷嘴之间的间隙中，从而提供有助于防止分配喷嘴结垢的蒸气鞘或环境。
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公开(公告)号：US20100080897A1
公开(公告)日：2010-04-01
申请号：US12527885
申请日：2008-02-18
Applicant: Frederick H. Fiesser
Inventor： Frederick H. Fiesser
CPC classification number: A61K9/5089 , A01C1/06 , A23G3/26 , A61J3/005 , B01J2/006 , B01J2/18 , B05B13/0257 , B05C3/05 , B05C5/0216 , B05C5/022 , B05C9/08 , B05C13/00 , B05C19/02 , B05D1/02 , B05D1/22 , B05D3/12 , B05D2258/00
Abstract: A continuous dosage form coating apparatus uses vibrational impulses to maintain a dosage forms in a fluid state to expose them to a coating material atomized by spraying.
Abstract translation: 连续剂型涂布装置使用振动脉冲将剂型保持在流体状态以将其暴露于通过喷雾雾化的涂层材料。
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