Plasma pretreatment on current collectors for thin film lithium metallization

    公开(公告)号:US11196045B2

    公开(公告)日:2021-12-07

    申请号:US15886396

    申请日:2018-02-01

    Abstract: Methods of forming a lithium-based negative electrode assembly are provided. A surface of a metal current collector is treated with a reducing plasma gas so that after the treating, a treated surface of the metal current collector is formed that has a contact angle of less than or equal to about 10° and has less than or equal to about 5% metal oxides. The metal current collector may include a metal, such as copper, nickel, and iron. A lithium metal is applied to the treated surface of the metal current collector in an environment substantially free from oxidizing species. Lithium metal flows over and adheres to the treated surface to form a layer of lithium. The layer of lithium may be a thin layer having a thickness of ≥about 1 μm to ≤about 75 μm thus forming the lithium metal negative electrode assembly.

    ROTOR FOR AN ELECTRIC MACHINE
    2.
    发明申请

    公开(公告)号:US20210044168A1

    公开(公告)日:2021-02-11

    申请号:US16531631

    申请日:2019-08-05

    Abstract: An electric machine is described, and includes a rotor that is rotatably disposed in a stator. The rotor includes a rotatable shaft that is disposed on a longitudinal axis, and a plurality of laminations that are disposed on the rotatable shaft. The plurality of laminations are arranged on the rotatable shaft to form a plurality of axially-disposed cavities, wherein each of the cavities is defined by a surface. A coating is disposed on the surfaces of the cavities, and a curable filler material is introduced into each of the cavities. The curable filler material adheres to the plurality of laminations via the coating.

    Self-cleaning film system and method of forming same

    公开(公告)号:US10583428B2

    公开(公告)日:2020-03-10

    申请号:US15598829

    申请日:2017-05-18

    Abstract: A self-cleaning film system configured for reducing a visibility of a contaminant includes a substrate and a film. The film includes a monolayer defining a plurality of cavities and formed from a first material having a first surface energy, and a plurality of patches disposed within the plurality of cavities. Each of the patches is formed from a photocatalytic material having a second surface energy that is higher than the first. The film has a touchpoint area having a first use frequency, and a second area having a second use frequency that is less than the first. The patches are present in the touchpoint area in a first concentration and are configured to direct the contaminant towards the second area. The patches are present in the second area in a second concentration that is higher than the first and are configured to reduce the visibility of the contaminant.

    TEXTURED SELF-CLEANING FILM SYSTEM AND METHOD OF FORMING SAME

    公开(公告)号:US20180333756A1

    公开(公告)日:2018-11-22

    申请号:US15598838

    申请日:2017-05-18

    Abstract: A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a first plurality of regions disposed within the monolayer such that each of the first plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material.

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