公开(公告)号：US11331689B1

公开(公告)日：2022-05-17

申请号：US17560464

申请日：2021-12-23

Applicant: GUANGDONG UNIVERSITY OF TECHNOLOGY

Inventor： Yun Chen ,  Yuanhui Guo ,  Yixuan Bu ,  Shuquan Ding ,  Shengyu Hou ,  Junyu Long ,  Xun Chen ,  Xin Chen ,  Jian Gao

IPC: B05D1/38 ,  B05D3/12 ,  B05D3/06 ,  B05C9/08 ,  H05K1/02 ,  C01B32/194 ,  C09D5/20

Abstract: This application relates to an apparatus for producing a graphene film with a thermal manipulation function. The apparatus includes a filter cup, a filter flask, a vacuum pump, a fixing clamp, and a laser. The fixing clamp is configured to clamp a first filter membrane and a second filter membrane. The laser is configured to irradiate the first filter membrane. The first filter membrane and the second filter membrane are arranged stackedly. The filter cup and the filter flask are in snap fit up and down. The first filter membrane and the second filter membrane are arranged between the filter cup and the filter flask. The vacuum pump is in communication with the filter flask. This application also provides a method for producing the graphene film with a thermal manipulation function.

公开(公告)号：US11791178B1

公开(公告)日：2023-10-17

申请号：US18062026

申请日：2022-12-06

Applicant: GUANGDONG UNIVERSITY OF TECHNOLOGY

Inventor： Hui Tang ,  Zhishen Liao ,  Xin Chen ,  Zhihang Lin ,  Jian Gao ,  Qiang Liu ,  Xun Chen

IPC: H01L21/67

CPC classification number: H01L21/67144 ,  H01L21/67259

Abstract: A compliant mechanical system for Mini/Micro chip mass transfer and packaging comprises a flexure-based continuous ejector pin mechanism including a drive support plate, a mounting base, first thorn die attach drive devices, second thorn die attach drive devices, first flexible hinges, second flexible hinges, and a pricking pin. The first thorn die attach drive devices and the second thorn die attach drive devices are mounted on the drive support plate. A drive end of the first thorn die attach drive device horizontally passes rightward through the first flexible hinge at a corresponding position; a drive end of the second thorn die attach drive device horizontally passes leftward through the first flexible hinge at a corresponding position; and the mounting base is hinged to the drive ends of the two thorn die attach drive devices through the second flexible hinges.

公开(公告)号：US10564553B2

公开(公告)日：2020-02-18

申请号：US15853847

申请日：2017-12-24

Applicant: GUANGDONG UNIVERSITY OF TECHNOLOGY

Inventor： Zhijun Yang ,  Qian Li ,  Youdun Bai ,  Xin Chen ,  Xun Chen ,  Yaobin He ,  Han Sun ,  Guanxin Huang ,  Baisheng Wu

IPC: G03F7/00 ,  G03F7/20 ,  F16C11/12 ,  B23Q1/44 ,  B23Q1/36

Abstract: The present invention also discloses a multi-DOF (Degree of Freedom) large-stroke high-precision motion platform system using the guide mechanism. A large load-bearing guide mechanism comprises: a rigid frame for generating a large-stroke displacement to realize high-speed motion; a core motion platform connected with a motion portion of a non-contact actuator, connected with the rigid frame by a primary flexible hinge group and a secondary flexible hinge group, and used for generating a small-stroke precise displacement by elastic deformation of the flexible hinge groups under driving of the actuator.

公开(公告)号：US10468265B1

公开(公告)日：2019-11-05

申请号：US16383885

申请日：2019-04-15

Applicant: Guangdong University of Technology

Inventor： Xin Chen ,  Yun Chen ,  Dachuang Shi ,  Xun Chen ,  Qiang Liu ,  Jian Gao ,  Chengqiang Cui

IPC: H01L31/0216 ,  B81C1/00 ,  H01L21/308 ,  H01L21/306

Abstract: A method for synchronous wet etching processing of differential microstructures, including the following steps: step a: performing photoetching on a processing surface of a workpiece to be processed to develop the workpiece; step b: affixing a mask to a surface opposite to the processing surface of the workpiece; step c: continuously cooling the mask; step d: placing the cooled mask and the workpiece in a wet etching device; and adding an etchant to the processing surface of the workpiece to start etching; step e: removing the mask and the workpiece from the wet etching device after the set etching time; separating the mask and the workpiece to obtain a workpiece with a etching structure. A temperature difference is formed between the pattern area to be processed and the retaining area.

公开(公告)号：US11715655B1

公开(公告)日：2023-08-01

申请号：US18062025

申请日：2022-12-06

Applicant: GUANGDONG UNIVERSITY OF TECHNOLOGY

Inventor： Xin Chen ,  Zhihang Lin ,  Hui Tang ,  Hongcheng Li ,  Jian Gao ,  Qiang Liu ,  Xun Chen

IPC: H01L21/67 ,  H01L33/00

CPC classification number: H01L21/67144 ,  H01L33/0093

Abstract: A flexure-based continuous ejector pin mechanism for Mini/Micro chip mass transfer includes a first drive frame, a second drive frame, a mounting base, a first thorn die attach drive device, a second thorn die attach drive device, first flexible hinges, second flexible hinges, and a pricking pin. The second drive frame and the first drive frame are connected through the first flexible hinge. The mounting base is connected to a left side and a right side of the second drive frame through the second flexible hinges. Compared with a laser transfer technology, the flexible movable thorn die attach device has lower cost and higher accuracy; compared with a vacuum nozzle transfer technology, the flexible movable thorn die attach device has higher transfer efficiency and quality; and compared with a conventional thorn die attach device, the flexible movable thorn die attach device has higher transfer efficiency and precision.

公开(公告)号：US11339316B1

公开(公告)日：2022-05-24

申请号：US17559112

申请日：2021-12-22

Applicant: GUANGDONG UNIVERSITY OF TECHNOLOGY

Inventor： Yun Chen ,  Xiangyuan Luo ,  Shuquan Ding ,  Canguang Lin ,  Zengguang Gao ,  Xin Chen ,  Xun Chen ,  Jian Gao

IPC: C09K5/06 ,  C08K3/04 ,  C08K9/12 ,  C08J9/40

Abstract: A method and device for preparing a graphene-based polyethylene glycol phase change material. The method includes: (S1) dispersing carbon black in deionized water to form a carbon black dispersion; immersing polyurethane sponge in the carbon black dispersion; and taking out polyurethane sponge followed by drying to obtain a polyurethane sponge-carbon black combination; (S2) subjecting the polyurethane sponge-carbon black combination to a first electrical discharge machining to obtain a first intermediate; (S3) ultrasonically mixing the first intermediate, polyethylene glycol, and MgO to obtain a second intermediate; (S4) subjecting the second intermediate to a second electrical discharge machining to obtain a third intermediate; (S5) subjecting the third intermediate to acid washing to obtain a fourth intermediate, and drying the fourth intermediate; (S6) injecting polyethylene glycol into the fourth intermediate followed by stirring in a mold and drying to prepare the graphene-based polyethylene glycol phase change material.