公开(公告)号：US20240371601A1

公开(公告)日：2024-11-07

申请号：US18775180

申请日：2024-07-17

Applicant: Hitachi High-Tech Corporation

Inventor： Yusuke NAKAMURA ,  Yusuke ABE ,  Kenji TANIMOTO ,  Takeyoshi OHASHI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

Abstract: A high-quality image is acquired while maintaining an improvement in throughput of image acquisition (measurement (length measurement)) in a charged particle beam system including a charged particle beam device and a computer system configured to control the charged particle beam device. The charged particle beam device includes an objective lens, a sample stage, and a backscattered electron detector that is disposed between the objective lens and the sample stage and that adjusts a focus of a charged particle beam with which a sample is irradiated. The computer system adjusts a value of an electric field on the sample in accordance with a change in a voltage applied to the backscattered electron detector.

公开(公告)号：US20220130638A1

公开(公告)日：2022-04-28

申请号：US17501249

申请日：2021-10-14

Applicant: Hitachi High-Tech Corporation

Inventor： Keiichiro HITOMI ,  Kenji TANIMOTO ,  Yusuke ABE ,  Takuma YAMAMOTO ,  Kei SAKAI ,  Satoru YAMAGUCHI ,  Yasunori GOTO ,  Shuuichirou TAKAHASHI

IPC: H01J37/22 ,  H01J37/147 ,  H01J37/21

Abstract: Provided is a charged particle beam device capable of focusing with high accuracy even when a charged particle beam has a large off-axis amount. The charged particle beam device generates an observation image of a sample by irradiating the sample with a charged particle beam, and includes: a deflection unit that inclines the charged particle beam; a focusing lens that focuses the charged particle beam; an adjustment unit that adjusts a lens strength of the focusing lens based on an evaluation value calculated from the observation image; a storage unit that stores a relationship between a visual field movement amount and the lens strength; and a filter setting unit that calculates the visual field movement amount based on an inclination angle of the charged particle beam and the relationship, and sets an image filter to be superimposed on the observation image based on the calculated visual field movement amount.

公开(公告)号：US20220351938A1

公开(公告)日：2022-11-03

申请号：US17702343

申请日：2022-03-23

Applicant: Hitachi High-Tech Corporation

Inventor： Yusuke NAKAMURA ,  Yusuke ABE ,  Kenji TANIMOTO ,  Takeyoshi OHASHI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

Abstract: An object of the invention is to acquire a high-quality image while maintaining an improvement in throughput of image acquisition (measurement (length measurement)). The present disclosure provides a charged particle beam system including a charged particle beam device and a computer system configured to control the charged particle beam device. The charged particle beam device includes an objective lens, a sample stage, and a backscattered electron detector that is disposed between the objective lens and the sample stage and that adjusts a focus of a charged particle beam with which a sample is irradiated. The computer system adjusts a value of an electric field on the sample in accordance with a change in a voltage applied to the backscattered electron detector.

公开(公告)号：US20250060678A1

公开(公告)日：2025-02-20

申请号：US18937471

申请日：2024-11-05

Applicant: Hitachi High-Tech Corporation

Inventor： Takuma YAMAMOTO ,  Hiroya OHTA ,  Kenji TANIMOTO ,  Yusuke ABE ,  Tomohiro TAMORI ,  Masaaki NOJIRI

IPC: G03F7/00 ,  G01B15/04 ,  G01N23/225 ,  G03F7/20

Abstract: A computation device is provided for measuring the dimensions of patterns formed on a sample based on a signal obtained from a charged particle beam device. The computation device includes a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights based on an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.

公开(公告)号：US20230290606A1

公开(公告)日：2023-09-14

申请号：US18013952

申请日：2020-07-07

Applicant: Hitachi High-Tech Corporation

Inventor： Yusuke ABE ,  Yusuke NAKAMURA ,  Shunsuke MIZUTANI ,  Muneyuki FUKUDA

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/24 ,  H01J37/244

CPC classification number: H01J37/147 ,  H01J37/14 ,  H01J37/241 ,  H01J37/244

Abstract: Provided is a charged particle beam device that can impart a function of an energy filter to even a small BSE detector. The charged particle beam device includes a fluorescent substance that converts charged particles generated by irradiation of a sample with a charged particle beam into light; a detector that detects the light emitted from the fluorescent substance; a light guide element for guiding the light from the fluorescent substance to the detector; a light amount adjuster that adjusts the amount of light that is received by the detector through the fluorescent substance and the light guide element; and a control unit that controls the light amount adjuster.

公开(公告)号：US20230064202A1

公开(公告)日：2023-03-02

申请号：US17921416

申请日：2020-06-18

Applicant: Hitachi High-Tech Corporation

Inventor： Kazuo OOTSUGA ,  Kazufumi YACHI ,  Makoto SAKAKIBARA ,  Heita KIMIZUKA ,  Yusuke ABE

IPC: H01J37/244 ,  H01J37/28

Abstract: A charged particle beam device includes: a stage 124 on which a sample 108 is to be placed; a charged particle optical system including a charged particle source 113 and an objective lens 121 that focuses a charged particle beam from the charged particle source onto the sample; and a detector 123 disposed between the objective lens and the stage and configured to detect electrons 109 emitted by an interaction between the charged particle beam and the sample. The stage, the charged particle optical system, and the detector are housed in a vacuum housing 112, and the detector includes a scintillator 107, a solid-state photomultiplier tube 104, and a light guide 106 provided between the scintillator and the solid-state photomultiplier tube, and an area of a light receiving surface of the scintillator is larger than an area of a light receiving surface of the solid-state photomultiplier tube.

公开(公告)号：US20210272770A1

公开(公告)日：2021-09-02

申请号：US17255724

申请日：2018-07-02

Applicant: Hitachi High-Tech Corporation

Inventor： Yasunari SOHDA ,  Kaori BIZEN ,  Yusuke ABE ,  Kenji TANIMOTO

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/244 ,  H01J37/153 ,  H01J37/21 ,  H01J37/26 ,  H01J37/147

Abstract: Provided is a scanning electron microscope which can perform high-speed focus correction even when an electron beam having high energy is used. The scanning electron microscope includes an electron optical system including an electron source 100 that emits an electron beam and an objective lens 113, a sample stage 1025 which is disposed on a stage 115 and on which a sample 114 is placed, a backscattered electron detector 1023 which is disposed between the objective lens and the sample stage and is configured to detect backscattered electrons 1017 emitted due to interaction between the electron beam and the sample, a backscattered electron detection system control unit 138 which is provided corresponding to the backscattered electron detector and is configured to apply a voltage to the backscattered electron detector, and a device control calculation device 146. The objective lens has an opening in a stage direction, and the device control calculation device performs focus correction of the electron beam by controlling the voltage applied to the backscattered electron detector from the backscattered electron detection system control unit.

公开(公告)号：US20200321189A1

公开(公告)日：2020-10-08

申请号：US16810969

申请日：2020-03-06

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki YOKOSUKA ,  Hirohiko KITSUKI ,  Daisuke BIZEN ,  Makoto SUZUKI ,  Yusuke ABE ,  Kenji YASUI ,  Mayuka OSAKI ,  Hideyuki KAZUMI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22

Abstract: The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.