公开(公告)号：US20210225608A1

公开(公告)日：2021-07-22

申请号：US15734367

申请日：2018-06-14

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Takahiro NISHIHATA ,  Mayuka OSAKI ,  Wei SUN ,  Takuma YAMAMOTO

IPC: H01J37/21 ,  H01J37/22 ,  H01J37/244

Abstract: In the present invention, an electro-optical condition generation unit includes: a condition setting unit that sets, as a plurality of electro-optical conditions, a plurality of electro-optical conditions in which the combinations of the aperture angle and the focal-point height for an electron beam are different; an index calculating unit that determines a measurement-performance index in the electro-optical conditions set by the condition setting unit; and a condition deriving unit that derives an electro-optical condition, including an aperture angle and a focal-point height, so that the measurement-performance index determined by the index calculating unit becomes a prescribed value.

公开(公告)号：US20220367147A1

公开(公告)日：2022-11-17

申请号：US17771551

申请日：2020-10-06

Applicant: Hitachi High-Tech Corporation

Inventor： Takahiro NISHIHATA ,  Mayuka OSAKI ,  Yuji TAKAGI ,  Takuma YAMAMOTO ,  Makoto SUZUKI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22

Abstract: A charged particle beam device 1 includes: a plurality of detectors 7 for detecting a signal particle 9 emitted from a sample 8 irradiated with a charged particle beam 3 and converting the detected signal particle 9 into an output electrical signal 17; an energy discriminator 14 provided for each detector 7 and configured to discriminate the output electrical signal 17 according to energy of the signal particle 9; a discrimination control block 21 for setting an energy discrimination condition of each of the energy discriminators 14; and an image calculation block 22 for generating an image based on the discriminated electrical signal. The discrimination control block 21 sets energy discrimination conditions different from each other among the plurality of energy discriminators 14.

公开(公告)号：US20240212973A1

公开(公告)日：2024-06-27

申请号：US18534853

申请日：2023-12-11

Applicant: Hitachi High-Tech Corporation

Inventor： Kaoru SAKAI ,  Mayuka OSAKI ,  Hajime KAWANO

IPC: H01J37/22 ,  G06T5/70 ,  G06T5/94 ,  G06T7/00 ,  G06T7/70 ,  G06V10/22 ,  G06V10/74 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  G06T5/70 ,  G06T5/94 ,  G06T7/001 ,  G06T7/70 ,  G06V10/22 ,  G06V10/74 ,  H01J37/244 ,  H01J37/28 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J2237/2448

Abstract: A processor system capable of communicating with the multi-charged particle beam device includes reducing an influence of first crosstalk caused by a first detector detecting secondary electrons from a second scanning region by recognizing a first ghost caused by the first crosstalk from a first image using the first image. The processor system modifies a first occurrence region of the first ghost, or outputs a defect candidate position as a defect position when the detected defect candidate position is outside the first occurrence region.

公开(公告)号：US20240222064A1

公开(公告)日：2024-07-04

申请号：US18390046

申请日：2023-12-20

Applicant: Hitachi High-Tech Corporation

Inventor： Mayuka OSAKI ,  Shgunki Tsuboya ,  Hajime Kawano

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/244 ,  H01J37/285 ,  H01J37/30 ,  H01J37/304

CPC classification number: H01J37/153 ,  H01J37/222 ,  H01J37/226 ,  H01J37/244 ,  H01J37/3005 ,  H01J37/3045 ,  H01J37/285 ,  H01J2229/507 ,  H01J2231/50047

Abstract: A multi-beam charged-particle microscope apparatus 100 includes an irradiation system 104 that irradiates a plurality of regions on a surface of a sample 9 with a plurality of beams, a detection system 125 (correction detector 132 and imaging detector 131) that detects emitted electrons from the surface of the sample 9, and a controller 102 that generates a first brightness of a first pixel in a first region based on a first signal of a first detector of a multi-detector 123 and generates a second brightness of a second pixel in a second region based on a second signal of a second detector. A processor of a processor system 103 that can communicate with the charged-particle microscope apparatus 100 specifies a first crosstalk amount from a second emitted electron to the first signal based on the first brightness obtained from the charged-particle microscope apparatus 100 and an output of the correction detector 132 and corrects the first brightness based on the first crosstalk amount.

公开(公告)号：US20230238210A1

公开(公告)日：2023-07-27

申请号：US18151530

申请日：2023-01-09

Applicant: Hitachi High-Tech Corporation

Inventor： Hiroaki KASAI ,  Kenji YASUI ,  Mayuka OSAKI ,  Maki KIMURA ,  Makoto SUZUKI

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/28 ,  H01J2237/2804 ,  H01J2237/24495 ,  H01J2237/24578

Abstract: The invention provides an observation system capable of observing a formation position of a target shape that cannot be directly irradiated with an electron beam. The observation system includes an electron microscope and a computer. The electron microscope is configured to irradiate, with an electron beam, a first surface position on a specimen, which is different from a formation position of a target shape on the specimen, detect predetermined electrons that are scattered in the specimen from the first surface position and that escape from the formation position of the target shape to an outside of the specimen, and output the predetermined electrons as a detection signal. The computer is configured to output one or more values related to the target shape based on the detection signal.

公开(公告)号：US20230230886A1

公开(公告)日：2023-07-20

申请号：US18065698

申请日：2022-12-14

Applicant: Hitachi High-Tech Corporation

Inventor： Kenji YASUI ,  Mayuka OSAKI ,  Hitoshi NAMAI ,  Yuki OJIMA ,  Wataru NAGATOMO ,  Masami IKOTA ,  Maki KIMURA

IPC: H01L21/66 ,  G06T7/50 ,  G06T1/00

CPC classification number: H01L22/12 ,  G06T7/50 ,  G06T1/0007 ,  G06T2207/30148

Abstract: To provide a technique capable of quantitatively grasping a change in three-dimensional shape including a cross-sectional shape of a pattern within a surface of a wafer or between wafers in a non-destructive manner before cross-sectional observation. A processor system of a semiconductor inspection system acquires images captured by an electron microscope (SEM) for a sample (S102), calculates, for a reference region defined on a surface of the sample, first feature data corresponding to each of a plurality of locations in the reference region from the captured image (S103A), calculates a first statistical value based on the first feature data at the plurality of locations (S103B), calculates, for each of a plurality of evaluation regions defined as points or regions on the surface of the sample in correspondence with the reference region, second feature data corresponding to each of one or more locations in the evaluation region from the captured image, as feature data of the same type as the first feature data (S104A), and converts the second feature data using the first statistical value to obtain second feature data after conversion (S105).

公开(公告)号：US20200321189A1

公开(公告)日：2020-10-08

申请号：US16810969

申请日：2020-03-06

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki YOKOSUKA ,  Hirohiko KITSUKI ,  Daisuke BIZEN ,  Makoto SUZUKI ,  Yusuke ABE ,  Kenji YASUI ,  Mayuka OSAKI ,  Hideyuki KAZUMI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22

Abstract: The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.