公开(公告)号：US20240321543A1

公开(公告)日：2024-09-26

申请号：US18572830

申请日：2021-07-01

Applicant: Hitachi High-Tech Corporation

Inventor： Hideyuki KOTSUJI ,  Toshiyuki YOKOSUKA ,  Hajime KAWANO

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/24 ,  H01J37/28

CPC classification number: H01J37/026 ,  H01J37/20 ,  H01J37/24 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/24564

Abstract: The present disclosure provides a charged particle beam device capable of removal or control of an electric charge by plasma without affecting control of the charged particle beam. The charged particle beam device according to the present disclosure is provided with a charged particle beam optical system for emitting a charged particle beam onto a sample, a sample chamber provided with a stage on which the sample is placed, a plasma generating device for generating plasma to be emitted onto the stage so as to remove an electrification charge from the sample, and a coupling member coupling the plasma generating device to the sample chamber, the coupling member including an insulating spacer insulating the sample chamber and the plasma generating device.

公开(公告)号：US20230420215A1

公开(公告)日：2023-12-28

申请号：US18328828

申请日：2023-06-05

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki YOKOSUKA ,  Hideyuki KOTSUJI ,  Hajime KAWANO

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/302 ,  H01J37/32

CPC classification number: H01J37/244 ,  H01J37/22 ,  H01J37/3026 ,  H01J37/32174 ,  H01J2237/2448

Abstract: A charged particle beam device for irradiating a sample arranged in a sample chamber to be observed with an electron beam includes: a plasma generation device to which a bias voltage is applicable to generate plasma containing charged particles for applying charges onto a side wall of a pattern of the sample; and a guide that guides the charged particles in the plasma generated by the plasma generation device to the pattern of the sample.

公开(公告)号：US20200312615A1

公开(公告)日：2020-10-01

申请号：US16900176

申请日：2020-06-12

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki YOKOSUKA ,  Chahn LEE ,  Hideyuki KAZUMI ,  Hajime KAWANO ,  Shahedul HOQUE ,  Kumiko SHIMIZU ,  Hiroyuki TAKAHASHI

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22

Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

公开(公告)号：US20220122804A1

公开(公告)日：2022-04-21

申请号：US17563186

申请日：2021-12-28

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki YOKOSUKA ,  Chahn LEE ,  Hideyuki KAZUMI ,  Hajime KAWANO ,  Shahedul HOQUE ,  Kumiko SHIMIZU ,  Hiroyuki TAKAHASHI

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22

Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

公开(公告)号：US20200321189A1

公开(公告)日：2020-10-08

申请号：US16810969

申请日：2020-03-06

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki YOKOSUKA ,  Hirohiko KITSUKI ,  Daisuke BIZEN ,  Makoto SUZUKI ,  Yusuke ABE ,  Kenji YASUI ,  Mayuka OSAKI ,  Hideyuki KAZUMI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22

Abstract: The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.

公开(公告)号：US20250095956A1

公开(公告)日：2025-03-20

申请号：US18728002

申请日：2022-01-27

Applicant: Hitachi High-Tech Corporation

Inventor： Hang DU ,  Toshiyuki YOKOSUKA ,  Yuko SASAKI ,  Yasuko WATANABE ,  Megumi KIMURA

IPC: H01J37/28 ,  H01J37/08 ,  H01J37/22

Abstract: Provided is a charged particle beam inspection system that can derive an optimal observation condition using an image prediction model obtained by machine learning of simulation results. The charged particle beam inspection system includes: a charged particle beam irradiation device configured to acquire an image of a sample; and an observation condition search device configured to search for an observation condition of the charged particle beam irradiation device and control image acquisition performed by the charged particle beam irradiation device. The observation condition search device acquires a module including a learning device subjected to training using labeled training data, which includes a plurality of simulation images obtained by inputting image generation condition including a plurality of first device conditions and a plurality of first sample conditions into a simulator and the first image generation condition, sets a plurality of second device conditions in an image generation tool to acquire a plurality of output images output by the image generation tool, collates the plurality of output images with an image obtained by inputting the first sample condition and the second device condition to the learning device, and generates a second sample condition based on the collation result.

公开(公告)号：US20240062986A1

公开(公告)日：2024-02-22

申请号：US18270937

申请日：2021-03-01

Applicant: Hitachi High-Tech Corporation

Inventor： Naho TERAO ,  Toshiyuki YOKOSUKA ,  Hideyuki KOTSUJI ,  Tomohito NAKANO ,  Hajime KAWANO

IPC: H01J37/02 ,  H01J37/28 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J37/244 ,  H01J37/222 ,  H01J2237/2817 ,  H01J2237/0656 ,  H01J2237/30483

Abstract: The purpose of the present invention is to provide a charged particle beam device that can specify irradiation conditions for primary charged particles that can obtain a desired charged state without adjusting the acceleration voltage. The charged particle beam device according to the present invention specifies the irradiation conditions for a charged particle beam in which the charged state of a sample is switched between a positive charge and a negative charge, and adjusts the irradiation conditions according to the relationship between the specified irradiation conditions and the irradiation conditions when an observation image of the sample has been acquired (see FIG. 8).

公开(公告)号：US20210366685A1

公开(公告)日：2021-11-25

申请号：US16967989

申请日：2018-12-18

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki YOKOSUKA ,  Hajime KAWANO ,  Kouichi KUROSAWA ,  Hideyuki KAZUMI

IPC: H01J37/22 ,  H01J37/05 ,  H01J37/28

Abstract: The objective of the present invention is to use brightness images acquired under different energy conditions to estimate the size of a defect in the depth direction in a simple manner. A charged-particle beam device according to the present invention determines the brightness ratio for each irradiation position on a brightness image while changing parameters varying the signal amount, estimates the position of the defect in the depth direction on the basis of the parameters at which the brightness ratio is at a minimum, and estimates the size of the defect in the depth direction on the basis of the magnitude of the brightness ratio (see FIG. 5).