ION BEAM SYSTEM
    2.
    发明申请
    ION BEAM SYSTEM 审中-公开

    公开(公告)号:US20180012726A1

    公开(公告)日:2018-01-11

    申请号:US15635500

    申请日:2017-06-28

    CPC classification number: H01J37/08 H01J37/18 H01J37/261 H01J2237/0807

    Abstract: Provided is an ion beam system including a gas field ionization ion source which can obtain a high current sufficient for processing and stabilize an ion beam current. The ion beam system includes a gas field ionization ion source which includes: a vacuum vessel; an emitter tip holder disposed in the vacuum vessel; an emitter tip connected to the emitter tip holder; an extraction electrode opposed to the emitter tip; a gas supply portion for supplying a gas to the emitter tip; and a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder. The cold transfer member has its surface covered with a heat insulating material in order to prevent the gas condensation.

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