公开(公告)号：US11760854B2

公开(公告)日：2023-09-19

申请号：US15316034

申请日：2015-06-02

Applicant: LINTEC CORPORATION

Inventor： Toshifumi Mimura ,  Yuuta Suzuki ,  Satoshi Naganawa

IPC: C08J7/048 ,  C23C14/08 ,  B05D1/00 ,  C08J7/04 ,  C08J7/043 ,  B05D5/00 ,  B05D7/04 ,  B05D7/00 ,  C23C14/00

CPC classification number: C08J7/048 ,  B05D1/60 ,  B05D1/62 ,  B05D5/00 ,  B05D7/04 ,  B05D7/51 ,  C08J7/043 ,  C08J7/0427 ,  C23C14/0036 ,  C23C14/086 ,  C08J2383/16

Abstract: The present invention is a gas barrier laminate comprising a base unit that comprises a base and a modification-promoting layer, and a gas barrier layer that is formed on a side of the modification-promoting layer with respect to the base unit,



the modification-promoting layer having a modulus of elasticity at 23° C. of less than 30 GPa,
the base unit having a water vapor transmission rate at a temperature of 40° C. and a relative humidity of 90% of 1.0 g/(m2·day) or less, and
the gas barrier layer being a layer formed by applying a modification treatment to a surface of a layer that comprises a polysilazane-based compound and is formed on the side of the modification-promoting layer with respect to the base unit, and
a method for producing the gas barrier laminat, and
an electronic device member comprising the gas barrier laminate, and
an electronic device comprising the electronic device member.