公开(公告)号：US20180236505A1

公开(公告)日：2018-08-23

申请号：US15963910

申请日：2018-04-26

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marc SMITS ,  Johan Joost KONING ,  Chris Franciscus Jessica LODEWIJK ,  Hindrik Willem MOOK ,  Ludovic LATTARD

IPC: B08B7/04 ,  H01J37/317 ,  H01J37/18 ,  H01J37/02 ,  B08B17/02 ,  H01J37/147

CPC classification number: B08B7/04 ,  B08B17/02 ,  H01J37/02 ,  H01J37/1472 ,  H01J37/18 ,  H01J37/3177 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/0492

Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：US20170309438A1

公开(公告)日：2017-10-26

申请号：US15632477

申请日：2017-06-26

Applicant: Mapper Lithography IP B.V.

Inventor： Stijn Willem Herman Karel STEENBRINK ,  Johan Joost KONING ,  Peter VELTMAN

IPC: H01J37/12 ,  H01J37/317

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/03 ,  H01J2237/04924 ,  Y10T29/49

Abstract: An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.