公开(公告)号：US09466463B1

公开(公告)日：2016-10-11

申请号：US14085768

申请日：2013-11-20

Applicant: Mutibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Enden David Liu ,  Cong Tran ,  Theodore A. Prescop

IPC: H01J49/00 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J37/292 ,  H01J37/20 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/30494 ,  H01J2237/31761

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to inspect and perform lithography on a substrate using a combination of vectoring to move a beam to features to be imaged, and raster scanning to obtain an image of the feature(s). The inventors have discovered that it is highly advantageous to use an extra step, a fast raster scan to image the substrate at a lower resolution, to determine which features receive priority for inspection; this extra step can reduce total inspection time, enhance inspection results, and improve beam alignment and manufacturing yield. Using multiple beam-producing columns, with multiple control computers local to the columns, provides various synergies. Preferably, miniature, non-magnetic, electrostatically-driven columns are used.

Abstract translation: 本申请公开了使用带电粒子束工具来使用矢量化的组合来检测和执行光刻的方法，系统和装置，以将光束移动到要成像的特征，以及光栅扫描以获得特征的图像 ）。 本发明人已经发现，使用额外的步骤是非常有利的，快速光栅扫描以较低的分辨率对衬底进行成像，以确定哪些特征接受检查的优先级; 这个额外的步骤可以减少总检查时间，增强检测结果，并提高光束对准和制造产量。 使用多个光束产生色谱柱，多个控制计算机在本地列，提供了各种协同作用。 优选地，使用微型，非磁性，静电驱动的列。