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公开(公告)号:US20240212969A1
公开(公告)日:2024-06-27
申请号:US18288405
申请日:2022-04-19
Applicant: NIKON CORPORATION
Inventor: Takakuni GOTO , Motofusa ISHIKAWA , Baku OGASAWARA , Shunta KUSU , Yuta KOMATSU , Tomoya UCHIDA
IPC: H01J37/145 , H01J37/141 , H01J37/143 , H01J37/147
CPC classification number: H01J37/145 , H01J37/141 , H01J37/143 , H01J37/1472
Abstract: A charged particle optical system includes a permanent magnetic lens disposed closer to an object than a central point between a charged particle beam source and the object in an optical axis direction of the charged particle optical system, an electromagnetic lens disposed such that a position of at least a part of the electromagnetic lens overlaps the permanent magnetic lens in the optical axis direction of the charged particle optical system, and an electrostatic lens disposed such that a position of at least a part of the electrostatic lens overlaps at least one of the permanent magnetic lens and the electromagnetic lens in the optical axis direction of the charged particle optical system.
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公开(公告)号:US20240102389A1
公开(公告)日:2024-03-28
申请号:US18275367
申请日:2021-02-05
Applicant: NIKON CORPORATION
Inventor: Masayuki SHIRAISHI , Takahiro KURASHIMA , Baku OGASAWARA
IPC: F01D5/14
CPC classification number: F01D5/141
Abstract: A blade member on a surface of which a groove structure is formed, wherein the groove structure includes a plurality of first groove structures, a plurality of second groove structures, and a third groove structure, the plurality of first groove structures are formed to extend in a first direction, the plurality of second groove structures are formed to extend in a second direction that is different from the first direction, the third groove structure extends along a third direction that is different from the first and second directions, and is formed between one first groove structure and one second groove structure.
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公开(公告)号:US20220203477A1
公开(公告)日:2022-06-30
申请号:US17604252
申请日:2019-04-24
Applicant: NIKON CORPORATION
Inventor: Masayuki SHIRAISHI , Kenta SUDO , Yosuke TATSUZAKI , Baku OGASAWARA
IPC: B23K26/359 , B23K26/067 , B23K26/082 , B23K26/362
Abstract: A processing apparatus is a processing apparatus that irradiates a surface of an object with processing light to process an object and is provided with: a light irradiation apparatus that emits first processing light to form a first irradiation area on the surface and emits second processing light to form a second irradiation area, at least a part of which overlaps with the first irradiation area, on the surface, and has a change member that is configured to change a state of an overlap between the first and second irradiation areas.
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公开(公告)号:US20210197312A1
公开(公告)日:2021-07-01
申请号:US16756898
申请日:2017-10-25
Applicant: NIKON CORPORATION
Inventor: Masayuki SHIRAISHI , Shigeki EGAMI , Yoshio KAWABE , Yosuke TATSUZAKI , Baku OGASAWARA
Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; and a measurement apparatus that measures a position of an irradiation area, which is formed on the surface of the object by the light irradiation apparatus, relative to the object.
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