公开(公告)号：US20240212969A1

公开(公告)日：2024-06-27

申请号：US18288405

申请日：2022-04-19

Applicant: NIKON CORPORATION

Inventor： Takakuni GOTO ,  Motofusa ISHIKAWA ,  Baku OGASAWARA ,  Shunta KUSU ,  Yuta KOMATSU ,  Tomoya UCHIDA

IPC: H01J37/145 ,  H01J37/141 ,  H01J37/143 ,  H01J37/147

CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/143 ,  H01J37/1472

Abstract: A charged particle optical system includes a permanent magnetic lens disposed closer to an object than a central point between a charged particle beam source and the object in an optical axis direction of the charged particle optical system, an electromagnetic lens disposed such that a position of at least a part of the electromagnetic lens overlaps the permanent magnetic lens in the optical axis direction of the charged particle optical system, and an electrostatic lens disposed such that a position of at least a part of the electrostatic lens overlaps at least one of the permanent magnetic lens and the electromagnetic lens in the optical axis direction of the charged particle optical system.