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    MULTIFUNCTIONAL GRAPHENE COATED SCANNING TIPS
    2.
    发明申请
    MULTIFUNCTIONAL GRAPHENE COATED SCANNING TIPS 审中-公开
    多功能石墨涂层扫描提示

    公开(公告)号：US20150309073A1

    公开(公告)日：2015-10-29

    申请号：US14414042

    申请日：2013-07-12

    Applicant: NORTHWESTERN UNIVERSITY

    Inventor： Chad A. Mirkin ,  Wooyoung Shim ,  Keith A. Brown ,  Boris Rasin ,  Xing Liao ,  Xiaozhu Zhou

    IPC: G01Q70/06 ,  G01Q70/16 ,  G01Q80/00 ,  G01Q70/14

    CPC classification number: G01Q70/06 ,  G01Q70/14 ,  G01Q70/16 ,  G01Q80/00 ,  G03F7/0002

    Abstract: A coat micro tip can include a tip having a base and an oppositely disposed tip end having a radius of curvature of less than 1 μm and a graphene film conformally coated on the tip. A method of making a graphene coated tip can include immersing a tip in a fluid comprising a graphene film floating on a surface of the fluid over the tip, disposing the immersed tip at an angle relative to the graphene film floating on the surface of the fluid as measured from a plane parallel to the base of the tip, and coating the tip with the graphene film by gradually bringing the graphene film into contact with the tip while maintaining the relative angle between the floating portion of the film and the tip during coating

    Abstract translation: 涂层微尖端可以包括具有基部和相对设置的具有小于1μm的曲率半径的尖端的尖端和在尖端上共形涂覆的石墨烯膜。 制造石墨烯涂覆的尖端的方法可以包括将尖端浸入包含漂浮在流体的表面上的石墨烯膜的流体超过尖端，将浸没的尖端相对于漂浮在流体表面上的石墨烯膜设置成一定角度 从平行于尖端的基底的平面测量，并且通过逐渐使石墨烯膜与尖端接触而涂覆具有石墨烯膜的尖端，同时在涂覆期间保持膜的浮动部分与尖端之间的相对角度

    Gradient spray coating polymer pen arrays
    3.
    发明授权
    Gradient spray coating polymer pen arrays 有权

    公开(公告)号：US10203598B2

    公开(公告)日：2019-02-12

    申请号：US15295914

    申请日：2016-10-17

    Applicant: NORTHWESTERN UNIVERSITY

    Inventor： Chad A. Mirkin ,  Keith A. Brown ,  James L. Hedrick, III

    IPC: G03F7/00 ,  B05D5/06

    Abstract: The disclosure provides a method of inking a polymer pen lithography tip array (“PPL tip array”), including applying an ink composition to a PPL tip array using at least two spray applicators to deposit the ink as a non-uniform ink layer. The disclosure further provides a method of depositing at least two ink compositions on PPL tip array, including applying a first ink to a first defined area using a first spray applicator, and applying a second ink to a second defined area using a second spray applicator. The disclosure further provides a method of scaling a linear ink composition gradient provided by at least two spray applicators to a PPL tip array having a length, L, including positioning the spray applicators at a distance of about 5.0 L to about 8.0 L relative to the surface of the PPL tip array, positioning the spray applicators at a distance of about 0.5 L to about 3.0 L relative to each other, and applying an ink composition.

    GRADIENT SPRAY COATING POLYMER PEN ARRAYS
    9.
    发明申请
    GRADIENT SPRAY COATING POLYMER PEN ARRAYS 审中-公开

    公开(公告)号：US20170108772A1

    公开(公告)日：2017-04-20

    申请号：US15295914

    申请日：2016-10-17

    Applicant: NORTHWESTERN UNIVERSITY

    Inventor： Chad A. Mirkin ,  Keith A. Brown ,  James L. Hedrick, III

    IPC: G03F7/00 ,  B05D1/36 ,  B05D1/02

    CPC classification number: G03F7/0002 ,  B05D5/061 ,  B05D2490/60

    Abstract: The disclosure provides a method of inking a polymer pen lithography tip array (“PPL tip array”), including applying an ink composition to a PPL tip array using at least two spray applicators to deposit the ink as a non-uniform ink layer. The disclosure further provides a method of depositing at least two ink compositions on PPL tip array, including applying a first ink to a first defined area using a first spray applicator, and applying a second ink to a second defined area using a second spray applicator. The disclosure further provides a method of scaling a linear ink composition gradient provided by at least two spray applicators to a PPL tip array having a length, L, including positioning the spray applicators at a distance of about 5.0 L to about 8.0 L relative to the surface of the PPL tip array, positioning the spray applicators at a distance of about 0.5 L to about 3.0 L relative to each other, and applying an ink composition.

    Heat Actuated and Projected Lithography Systems and Methods
    10.
    发明申请
    Heat Actuated and Projected Lithography Systems and Methods 有权
    热激活和投影光刻系统和方法

    公开(公告)号：US20150286148A1

    公开(公告)日：2015-10-08

    申请号：US14439252

    申请日：2013-10-15

    Applicant: NORTHWESTERN UNIVERSITY

    Inventor： Chad A. Mirkin ,  Xing Liao ,  Keith A. Brown ,  Guoliang Liu ,  Abrin L. Schmucker ,  Shu He ,  Wooyoung Shim ,  Daniel J. Eichelsdoerfer ,  Boris Rasin

    IPC: G03F7/20 ,  B05D3/06 ,  G02B13/14 ,  B05D1/26

    CPC classification number: G03F7/7035 ,  B05D1/26 ,  B05D3/06 ,  B82Y40/00 ,  G02B13/143 ,  G03F7/0002 ,  G03F7/20 ,  G03F7/2049 ,  G03F7/70141 ,  G03F7/70325 ,  G03F7/70383 ,  G03F7/7045

    Abstract: In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array to selectively irradiate tips of the tip array and pattern the substrate, wherein the second pattern of radiation corresponds to a tip pattern for the second frame section; and repeating the disposing and projecting for each frame section in the set of frame sections to pattern the image.

    Abstract translation: 根据本公开的实施例，图案化方法可以包括将图像划分成一组帧部分; 在所述一组框架部分的每个框架部分中确定要由所述尖端阵列的每个尖端构图的图像的相应部分的尖端图案; 将所述尖端阵列布置在所述基板的第一位置中的图案化位置，所述第一位置对应于所述基板的位置，所述框架部分组中的第一框架部分将被构图; 将第一辐射模式投影到所述尖端阵列上以选择性地照射所述尖端阵列中的一个或多个尖端并对所述衬底进行图案化，其中所述第一辐射图案对应于所述第一框架部分的尖端图案; 将所述末端阵列布置在所述基板的第二位置中的对应于所述基板的位置的图案化位置中，在所述基板的位置中所述框架部分组中的第二框架部分将被图案化; 将第二辐射模式投影到所述尖端阵列上以选择性地照射所述尖端阵列的尖端并对所述衬底进行图案化，其中所述第二辐射图案对应于所述第二框架部分的尖端图案; 并且重复对所述一组帧部分中的每个帧部分的布置和投影以对图像进行图案化。

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