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1.发明授权公开(公告)号：US07253419B2
公开(公告)日：2007-08-07
申请号：US11105193
申请日：2005-04-13
Applicant: Makoto Takahashi
Inventor： Makoto Takahashi
CPC classification number: H01J37/09 , H01J2237/0456 , H01J2237/3175
Abstract: An apertured plate support mechanism used in an electron beam lithography machine. The apertured plate is held to a plate holder. The plate support mechanism has the plate holder for holding the apertured plate and a holder support for supporting the plate holder. The apertured plate is provided with an aperture through which a beam of charged particles passes. Grooves extending radially in plural directions about the center axis of the aperture are formed in the supported surface of the plate holder or the supporting surface of the holder support. Convex portions engaged in the grooves are formed on the other of the supported or supporting surfaces.
Abstract translation: 一种用于电子束光刻机的多孔板支撑机构。 多孔板被固定在板支架上。 板支撑机构具有用于保持多孔板的板保持器和用于支撑板保持器的保持器支撑件。 多孔板设置有孔，通过该孔通过带电粒子束。 在保持架的支撑面或保持架支撑体的支承面上，形成有围绕孔的中心轴线沿多个方向径向延伸的槽。 在凹槽中啮合的凸部形成在另一个支撑表面上。
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公开(公告)号：US07767977B1
公开(公告)日：2010-08-03
申请号：US12417929
申请日：2009-04-03
Applicant: Ludovic Godet , Svetlana Radovanov , Timothy J. Miller
Inventor： Ludovic Godet , Svetlana Radovanov , Timothy J. Miller
CPC classification number: H01J37/08 , H01J27/024 , H01J37/09 , H01J2237/0451 , H01J2237/0453 , H01J2237/0456 , H01J2237/065 , H01J2237/08 , H01J2237/083 , H01J2237/31 , H01J2237/31701 , Y10S438/961
Abstract: An ion source includes an arc chamber having an extraction aperture, and a plasma sheath modulator. The plasma sheath modulator is configured to control a shape of a boundary between plasma and a plasma sheath proximate the extraction aperture. The plasma sheath modulator may include a pair of insulators positioned in the arc chamber and spaced apart by a gap positioned proximate the extraction aperture. A well focused ion beam having a high current density can be generated by the ion source. A high current density ion beam can improve the throughput of an associated process. The emittance of the ion beam can also be controlled.
Abstract translation: 离子源包括具有提取孔的电弧室和等离子体鞘调制器。 等离子体鞘调制器被配置为控制等离子体和靠近提取孔的等离子体鞘之间的边界的形状。 等离子体鞘调制器可以包括位于电弧室中的一对绝缘体，并且间隔开位于靠近提取孔的间隙。 可以通过离子源产生具有高电流密度的良好聚焦的离子束。 高电流密度离子束可以提高相关过程的吞吐量。 也可以控制离子束的发射。
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公开(公告)号：US6162566A
公开(公告)日：2000-12-19
申请号：US199318
申请日：1998-11-25
Applicant: Isao Amemiya
Inventor： Isao Amemiya
IPC: G03F1/40 , G03F1/66 , G03F7/20 , H01J37/317 , H01L21/027 , G03F9/00
CPC classification number: B82Y10/00 , B82Y40/00 , G03F1/20 , G03F7/707 , H01J37/3174 , H01J2237/0456
Abstract: In a mask holder for supporting a transfer mask which includes a thin-film portion having an aperture pattern forming region and a supporting frame portion for supporting the thin-film portion, the mask holder contacts with the thin-film portion except for the aperture pattern forming region.
Abstract translation: 在用于支撑包括具有孔径图案形成区域的薄膜部分和用于支撑薄膜部分的支撑框架部分的转印掩模的掩模支架中，掩模保持器与除了孔径图案之外的薄膜部分接触 形成区域。
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公开(公告)号：US6008495A
公开(公告)日：1999-12-28
申请号：US927817
申请日：1997-09-11
Applicant: Hitoshi Tanaka , Yoshihisa Ooae
Inventor： Hitoshi Tanaka , Yoshihisa Ooae
CPC classification number: G21K5/04 , H01J37/09 , H01J2237/0456 , H01J2237/3175
Abstract: An electron beam exposure device in which an electron beam from an electron beam source is passed through at least a slit of a first slit assembly. The first slit assembly includes: a base; a bearing assembly; a stage rotatably supported by the base via the bearing assembly; a stage rotation adjusting mechanism; a slit member; and at least one heat transfer path means for transferring heat of the stage to the base, wherein the at least one heat transfer path means enables the rotation of the stage by the stage rotation adjusting mechanism.
Abstract translation: 电子束曝光装置，其中来自电子束源的电子束至少穿过第一狭缝组件的狭缝。 第一缝合组件包括：基部; 轴承组件; 通过所述轴承组件由所述基座可旋转地支撑的台架; 舞台旋转调节机构; 狭缝构件; 以及至少一个热传递路径装置，用于将载物台的热传递到底座，其中至少一个热传递路径装置使得能够通过平台旋转调节机构旋转平台。
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公开(公告)号：US6005910A
公开(公告)日：1999-12-21
申请号：US792526
申请日：1997-01-31
Applicant: Yuji Chiba , Shinichi Hara
Inventor： Yuji Chiba , Shinichi Hara
IPC: G03B27/62 , G03F7/20 , H01J37/09 , H01L21/027 , H01L21/683
CPC classification number: G03F7/707 , H01J37/09 , H01J2237/0456 , H01J2237/31788
Abstract: A holding mechanism includes a box body for providing a space for accommodating an X-ray mask, at least one opening formed at the side of the box body and a holding mechanism for holding the X-ray mask within the space by a kinematic mount system.
Abstract translation: 保持机构包括用于提供用于容纳X射线掩模的空间的箱体，形成在箱体侧面的至少一个开口和用于通过运动安装系统将X射线掩模保持在该空间内的保持机构 。
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Patent Agency Ranking
6.发明授权公开(公告)号：US07714308B2
公开(公告)日：2010-05-11
申请号：US11899291
申请日：2007-09-05
Applicant: Masahito Hiroshima
Inventor： Masahito Hiroshima
CPC classification number: H01J37/1472 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3023 , H01J37/3174 , H01J2237/0455 , H01J2237/0456 , H01J2237/0458 , H01J2237/0835
Abstract: This VSB lithography system includes a first, second and third aperture for forming a single electron beam in each of the rectangular opening portion that are provided, and draws a figure pattern using the single electron beam formed by passing the beam through the first, second and third aperture in sequence. Each of the first, second and third aperture has a mechanism for rotationally driving the aperture around an optical axis up to an arbitrary angle from 0 to 360°. Further, in the third aperture, a mechanism for varying the opening slit width of the rectangular opening portion is provided.
Abstract translation: 该VSB光刻系统包括用于在设置的每个矩形开口部分中形成单个电子束的第一，第二和第三孔，并且使用通过使光束穿过第一，第二和第二孔而形成的单个电子束来绘制图形图案 第三个孔径顺序。 第一，第二和第三孔中的每一个具有用于围绕光轴旋转地驱动孔径至0至360°任意角度的机构。 此外，在第三孔中，设置有用于改变矩形开口部分的开口狭缝宽度的机构。
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公开(公告)号：US20070138403A1
公开(公告)日：2007-06-21
申请号：US10569963
申请日：2004-08-02
Applicant: Dane Cubric , Pieter Kruit
Inventor： Dane Cubric , Pieter Kruit
IPC: H01J1/50
CPC classification number: H01J37/05 , H01J37/09 , H01J37/263 , H01J2237/045 , H01J2237/0453 , H01J2237/0455 , H01J2237/0456 , H01J2237/0458
Abstract: A particle optical apparatus including an aperture plate for shaping a particle beam before the particle beam enters a monochromator filter assembly. The aperture plate has at least one aperture and is adjustable with respect to the monochromator filter assembly, in normal operating conditions, so that the size of the aperture used to shape the particle beam can be varied, and therefore the beam current entering the filter assembly can be varied.
Abstract translation: 一种粒子光学装置，包括用于在粒子束进入单色器过滤器组件之前成形粒子束的孔板。 孔板具有至少一个孔，并且在正常操作条件下可相对于单色仪滤光器组件可调节，使得用于成形粒子束的孔的尺寸可以改变，因此射入电流进入过滤组件 可以变化。
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公开(公告)号：US20180226220A1
公开(公告)日：2018-08-09
申请号：US15867275
申请日：2018-01-10
Applicant: Howard Hughes Medical Institute
Inventor： Tamir Gonen , Igor Negrashov , Dan Shi , Tanya Tabachnik
CPC classification number: H01J37/15 , H01J37/023 , H01J37/09 , H01J37/10 , H01J37/18 , H01J37/26 , H01J37/265 , H01J2237/0455 , H01J2237/0456 , H01J2237/0492 , H01J2237/063 , H01J2237/1502
Abstract: An apparatus for a transmission electron microscope includes a housing configured to be attached to the transmission electron microscope; a plunger received in the housing and movable relative to the housing; a first set of pieces coupled to the plunger, the first piece being configured to move relative to the housing in response to the plunger moving relative to the housing; and a second set of pieces positioned in a fixed spatial relationship relative to each other, the second set of pieces and the first set of pieces forming a perimeter of an opening, an extent of the opening being continuously variable by moving the first set of piece relative to the second set of pieces.
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9.发明申请公开(公告)号：US20080054196A1
公开(公告)日：2008-03-06
申请号：US11899291
申请日：2007-09-05
Applicant: Masahito Hiroshima
Inventor： Masahito Hiroshima
IPC: H01J37/30
CPC classification number: H01J37/1472 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3023 , H01J37/3174 , H01J2237/0455 , H01J2237/0456 , H01J2237/0458 , H01J2237/0835
Abstract: This VSB lithography system includes a first, second and third aperture for forming a single electron beam in each of the rectangular opening portion that are provided, and draws a figure pattern using the single electron beam formed by passing the beam through the first, second and third aperture in sequence. Each of the first, second and third aperture has a mechanism for rotationally driving the aperture around an optical axis up to an arbitrary angle from 0 to 360°. Further, in the third aperture, a mechanism for varying the opening slit width of the rectangular opening portion is provided.
Abstract translation: 该VSB光刻系统包括用于在设置的每个矩形开口部分中形成单个电子束的第一，第二和第三孔，并且使用通过使光束穿过第一，第二和第二孔而形成的单个电子束来绘制图形图案 第三个孔径顺序。 第一，第二和第三孔中的每一个具有用于围绕光轴旋转地驱动孔径至0至360°任意角度的机构。 此外，在第三孔中，设置有用于改变矩形开口部分的开口狭缝宽度的机构。
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10.发明申请公开(公告)号：US20050242295A1
公开(公告)日：2005-11-03
申请号：US11105193
申请日：2005-04-13
Applicant: Makoto Takahashi
Inventor： Makoto Takahashi
CPC classification number: H01J37/09 , H01J2237/0456 , H01J2237/3175
Abstract: An apertured plate support mechanism used in an electron beam lithography machine. The apertured plate is held to a plate holder. The plate support mechanism has the plate holder for holding the apertured plate and a holder support for supporting the plate holder. The apertured plate is provided with an aperture through which a beam of charged particles passes. Grooves extending radially in plural directions about the center axis of the aperture are formed in the supported surface of the plate holder or the supporting surface of the holder support. Convex portions engaged in the grooves are formed on the other of the supported or supporting surfaces.
Abstract translation: 一种用于电子束光刻机的多孔板支撑机构。 多孔板被固定在板支架上。 板支撑机构具有用于保持多孔板的板保持器和用于支撑板保持器的保持器支撑件。 多孔板设置有孔，通过该孔通过带电粒子束。 在保持架的支撑面或保持支架的支承面上，形成有围绕孔的中心轴线沿多个方向径向延伸的槽。 在凹槽中啮合的凸部形成在另一个支撑表面上。
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