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    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
    3.
    发明申请
    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
    充电颗粒光束写字装置和充电颗粒光束写字方法

    公开(公告)号：US20160336141A1

    公开(公告)日：2016-11-17

    申请号：US15145398

    申请日：2016-05-03

    Applicant: NuFlare Technology, Inc.

    Inventor： Haruyuki NOMURA

    IPC: H01J37/14 ,  H01J37/317

    CPC classification number: H01J37/14 ,  H01J37/063 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/0653

    Abstract: A charged particle beam writing apparatus includes a limiting aperture member at the downstream side of the emission source, arranged such that its height position can be selectively adjusted, according to condition, to be one of the n-th height position (n being an integer of 1 or more) based on the n-th condition depending on at least one of the height position of the emission source and an emission current value, and the (n+m)th height position (m being an integer of 1 or more) based on the (n+m)th condition depending on at least one of the height position of the emission source and the emission current value, and a shaping aperture member at the downstream side of the electron lens and the limiting aperture member to shape the charged particle beam by letting a part of the charged particle beam pass through a second opening.

    Abstract translation: 带电粒子束写入装置包括在发射源的下游侧的限制孔径构件，其布置成使得其高度位置可以根据条件被选择性地调节为第n高度位置之一（n为整数） 基于根据发光源的高度位置和发射电流值中的至少一个的第n个条件，并且第（n + m）个高度位置（m是1或更大的整数） ）基于取决于发射源的高度位置和发射电流值中的至少一个的第（n + m）条件，以及在电子透镜的下游侧的成形孔构件和限制孔径构件 带电粒子束通过使一部分带电粒子束通过第二个开口。

    Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method
    4.
    发明授权
    Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method 有权
    带电粒子束写入装置，孔径单元和带电粒子束写入方法

    公开(公告)号：US09449792B2

    公开(公告)日：2016-09-20

    申请号：US14193182

    申请日：2014-02-28

    Applicant: NuFlare Technology, Inc.

    Inventor： Tetsuro Nishiyama

    IPC: H01L21/00 ,  H01J37/317 ,  H01J37/09 ,  H01L21/263

    CPC classification number: H01J37/3174 ,  H01J37/09 ,  H01J2237/022 ,  H01J2237/0451 ,  H01L21/2636

    Abstract: A charged particle beam writing apparatus according to an embodiment includes: a beam emitter configured to emit a charged particle beam; an aperture having an opening portion through which the charged particle beam emitted by the beam emitter passes; an aperture beam tube being provided on a surface of the aperture and functioning as a thermally conductive member having thermal conductivity; and a heater provided on a surface of the aperture beam tube and configured to supply heat to the aperture via the aperture beam tube.

    Abstract translation: 根据实施例的带电粒子束写入装置包括：被配置为发射带电粒子束的射束发射器; 具有开口部分的孔，由射束发射器发射的带电粒子束通过该开口部分; 孔径管设置在孔的表面上并用作具有导热性的导热构件; 以及加热器，其设置在所述孔径光束管的表面上并且经配置以经由所述孔径管向所述孔提供热量。

    Scanning transmission electron microscope and axial adjustment method thereof
    5.
    发明授权
    Scanning transmission electron microscope and axial adjustment method thereof 失效
    扫描透射电子显微镜及其轴向调整方法

    公开(公告)号：US08710438B2

    公开(公告)日：2014-04-29

    申请号：US13808134

    申请日：2011-07-11

    Applicant: Kuniyasu Nakamura ,  Hiromi Inada

    Inventor： Kuniyasu Nakamura ,  Hiromi Inada

    IPC: G21K7/00 ,  H01J37/26 ,  H01J37/28 ,  G01N23/00

    CPC classification number: H01J37/263 ,  H01J37/28 ,  H01J2237/0451 ,  H01J2237/1501 ,  H01J2237/2802

    Abstract: A scanning transmission electron microscope equipped with an aberration corrector is capable of automatically aligning the position of a convergence aperture with the center of an optical axis irrespective of skill and experience of an operator. The scanning transmission electron microscope system includes an electron source; a condenser lens configured to converge an electron beam emitted from the electron source; a deflector configured to cause the electron beam to perform scanning on a sample; an aberration correction device configured to correct an aberration of the electron beam; a convergence aperture configured to determine a convergent angle of the electron beam; and a detector configured to detect electrons passing through or diffracted by the sample. The system acquires information on contrast of a Ronchigram formed by the electron beam passing through the sample, and determines a position of the convergence aperture on the basis of the information.

    Abstract translation: 配备有像差校正器的扫描透射电子显微镜能够自动地将会聚孔的位置与光轴的中心对齐，而与操作者的技术和经验无关。 扫描透射电子显微镜系统包括电子源; 聚光透镜，被配置为会聚从电子源发射的电子束; 配置成使电子束对样品进行扫描的偏转器; 被配置为校正电子束的像差的像差校正装置; 收敛孔，被配置为确定电子束的收敛角; 以及检测器，其被配置为检测通过所述样品的衍射的电子。 该系统获取通过通过样本的电子束形成的罗尼克拉姆的对比度的信息，并且基于该信息确定会聚孔径的位置。

    COMPRESSIVE TRANSMISSION MICROSCOPY
    8.
    发明申请
    COMPRESSIVE TRANSMISSION MICROSCOPY 审中-公开
    压缩传输显微镜

    公开(公告)号：US20160276129A1

    公开(公告)日：2016-09-22

    申请号：US15075015

    申请日：2016-03-18

    Applicant: Battelle Memorial Institute

    Inventor： Andrew J. Stevens ,  Libor Kovarik ,  Nigel D. Browning ,  Andrey V. Liyu ,  Xin Yuan ,  Lawrence Carin

    IPC: H01J37/22 ,  H01J37/244 ,  H01J37/26

    CPC classification number: H01J37/222 ,  G03F7/20 ,  G03F7/30 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/0451 ,  H01J2237/0453 ,  H01J2237/226 ,  H01J2237/24455 ,  H01J2237/2802

    Abstract: Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane.

    Abstract translation: 透射显微镜成像系统包括掩模和/或其它调制器，其位于编码图像束，例如通过相对于掩模和/或传感器偏转图像束。 在通过样本传输之前或之后，波束被调制/屏蔽，以通过修改包括传感器上的波束的相位/相干性，强度或位置的任何波束/图像分量来诱导空间和/或时间编码的信号。 例如，可以通过光束放置/平移掩模，使得在单个传感器积分时间期间，传感器接收多个屏蔽光束。 然后使用与多个掩模位移相关联的图像来使用压缩感测方法重建视频序列。 掩模调制的另一示例涉及相位检索的机制，由此通过图像平面中的一组不同的掩模来调制光束，并且每个被掩蔽的图像被记录在衍射平面中。

    Method of producing aperture member
    9.
    发明授权
    Method of producing aperture member 有权
    孔径构件的制造方法

    公开(公告)号：US09343323B2

    公开(公告)日：2016-05-17

    申请号：US14732001

    申请日：2015-06-05

    Applicant: NuFlare Technology, Inc.

    Inventor： Takashi Kamikubo

    IPC: H01L21/308 ,  H01L21/78 ,  H01L21/84 ,  H01L21/306

    CPC classification number: H01L21/84 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/0451 ,  H01J2237/31776

    Abstract: In one embodiment, an aperture member producing method includes applying a charged particle beam to a plurality of chip areas on a first substrate while changing a writing condition to write a first pattern corresponding to an aperture opening, processing the first substrate based on the written first pattern to form a second pattern, cutting out a chip area provided with the second pattern having desired accuracy from the first substrate to produce a template, allowing the template to come into contact with a resist overlying a front surface of a second substrate, separating the template from the hardened resist to pattern the resist with a transfer pattern, processing the second substrate using the transfer pattern as a mask to form a first recess, and etching a rear surface of the second substrate to form a second recess communicating with the first recess.

    Abstract translation: 在一个实施例中，一种孔径构件的制造方法包括：在改变写入条件的同时，向第一衬底上的多个芯片区域施加带电粒子束以写入对应于孔径开口的第一图案，基于所写入的第一衬底来处理第一衬底 形成第二图案，从第一基板切出具有期望精度的第二图案的芯片区域以产生模板，从而允许模板与覆盖在第二基板的前表面上的抗蚀剂接触， 模板，用转印图案对抗蚀剂进行图案化，使用转印图案作为掩模处理第二基板以形成第一凹部，并且蚀刻第二基板的后表面以形成与第一凹部连通的第二凹部 。

    Focused ion beam apparatus
    10.
    发明授权
    Focused ion beam apparatus 有权
    聚焦离子束装置

    公开(公告)号：US08389953B2

    公开(公告)日：2013-03-05

    申请号：US12931993

    申请日：2011-02-15

    Applicant: Takashi Ogawa ,  Kenichi Nishinaka ,  Yoshihiro Koyama

    Inventor： Takashi Ogawa ,  Kenichi Nishinaka ,  Yoshihiro Koyama

    IPC: H01J49/10 ,  H01J37/08 ,  H01J27/02 ,  H01J3/14

    CPC classification number: H01J37/08 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/0807 ,  H01J2237/083 ,  H01J2237/24535 ,  H01J2237/28 ,  H01J2237/31749

    Abstract: A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit that supplies gas to the tip, and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample. An aperture member has an opening that passes therethrough a part of the ion beam ejected from the ion gun unit, and a lens system focuses the ion beam onto the sample.

    Abstract translation: 聚焦离子束装置包括具有发射极尖端的离子枪单元，向尖端供应气体的气体供应单元和离子源气体供应源。 提取电极通过在提取电极和尖端之间施加电压使吸附在尖端表面上的气体电离并提取离子。 阴极将离子加速到样品。 孔部件具有从离子枪单元喷出的离子束的一部分通过的开口，透镜系统将离子束聚焦到样品上。

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