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公开(公告)号：KR1020090095851A
公开(公告)日：2009-09-10
申请号：KR1020080021043
申请日：2008-03-06
Applicant: 삼성전자주식회사
Inventor： 김미애
CPC classification number: H04N5/238 , H04N5/23248 , H04N5/2354 , H04N9/64
Abstract: A camera and a photographing method are provided to locate a filter on a light emitting path according to a determined photographing environment, thereby lessening intensity of emitting light. A filter(30) reduces a light amount of a light emitting unit(20). A controller(50) preliminarily emits the light emitting unit before main photographing. The controller determines a photographing environment of a subject from an electric signal of an image device(10). The controller drives a filter moving unit(40) according to the determination. The controller controls the light emitting unit to emit light.
Abstract translation: 提供相机和拍摄方法以根据确定的拍摄环境在发光路径上定位滤光器，从而降低发光强度。 滤光器（30）减少发光单元（20）的光量。 控制器（50）在主拍摄之前预先发射发光单元。 控制器根据图像设备（10）的电信号确定被摄体的拍摄环境。 控制器根据确定器驱动过滤器移动单元（40）。 控制器控制发光单元发光。
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公开(公告)号：KR100725460B1
公开(公告)日：2007-06-07
申请号：KR1020050131420
申请日：2005-12-28
Applicant: 삼성전자주식회사
IPC: G01N1/36
Abstract: A method of manufacturing a standard specimen for metal contamination analysis is provided to manufacture the standard specimen existing in a certain depth and uniformly distributed in a semiconductor wafer. A method of manufacturing a standard specimen for metal contamination analysis includes a step of applying an organic silica solution(14a) including metal impurities(12) on a semiconductor wafer(10). The metal impurities are intentionally contained in the organic silica solution to analyze a metal contamination source. Concentration of the metal impurities can be adjusted by an operator. The metal impurities include iron, nickel, and so on. Before applying the organic silica solution on the semiconductor wafer, a natural oxide layer remaining on the semiconductor wafer can be removed. The semiconductor wafer is submerged in a first solution including ammonia, peroxide, and so on. Then, the semiconductor wafer is submerged in a second solution including fluoride.
Abstract translation: 提供一种制造用于金属污染物分析的标准样本的方法，以制造存在于一定深度并均匀分布在半导体晶片中的标准样本。 制造用于金属污染物分析的标准样品的方法包括在半导体晶片（10）上涂覆包含金属杂质（12）的有机二氧化硅溶液（14a）的步骤。 金属杂质有意地包含在有机二氧化硅溶液中以分析金属污染源。 操作人员可以调整金属杂质的浓度。 金属杂质包括铁，镍等。 在将有机二氧化硅溶液涂覆在半导体晶片上之前，可以去除残留在半导体晶片上的自然氧化层。 将半导体晶片浸没在包含氨，过氧化物等的第一溶液中。 然后，将半导体晶片浸没在包含氟化物的第二溶液中。
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公开(公告)号：KR1020070032434A
公开(公告)日：2007-03-22
申请号：KR1020050086646
申请日：2005-09-16
Applicant: 삼성전자주식회사
IPC: H01L21/68
CPC classification number: H01L21/67742 , H01L21/67017 , H01L21/67259
Abstract: A substrate transfer system and a method for transferring a substrate are provided to prevent air in a clean room from flowing into a substrate container, a housing, and contamination of the substrate due to the air in the clean room by employing at least one ventilation unit. A load port(100) accommodates a substrate container(20) including a door(22). A housing(200) is arranged between the load port and process equipment(10). A substrate transfer robot(280) is installed on the housing to transfer a substrate between the substrate container placed on the load port and the process equipment. A ventilation unit(400) is located at a side of the substrate container placed on the load port. The ventilation unit prevents an external air current from flowing into the substrate container or the housing by forming an air current parallel to the door between the door and the housing.
Abstract translation: 提供了一种基板转印系统和转印基板的方法，以通过采用至少一个通风单元来防止洁净室中的空气流入基板容器，外壳以及由于洁净室中的空气而导致的基板污染 。 负载端口（100）容纳包括门（22）的基板容器（20）。 在负载端口和处理设备（10）之间布置有壳体（200）。 衬底传送机器人（280）安装在壳体上以在放置在负载端口的衬底容器和处理设备之间传送衬底。 通气单元（400）位于放置在负载端口上的基板容器的一侧。 通风单元通过在门和壳体之间形成平行于门的气流来防止外部气流流入基板容器或壳体。
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公开(公告)号：KR101457410B1
公开(公告)日：2014-11-03
申请号：KR1020080021043
申请日：2008-03-06
Applicant: 삼성전자주식회사
Inventor： 김미애
Abstract: 본 발명에 관한 카메라는, 피사체의 상을 입력 받아 전기 신호로 변환하는 촬상 소자와, 피사체를 향해 발광하는 발광 수단과, 발광 수단의 광량을 감소시키는 필터와, 외부 신호에 의해 작동되어 필터를 발광 경로 상의 제1 위치와 발광 경로에서 벗어나는 제2 위치의 사이에서 이동시키는 필터 이동수단과, 본 촬상에 앞서 발광 수단을 예비 발광시키고 예비 발광시의 촬상 소자의 전기 신호로부터 피사체의 촬영 환경을 판단하여 필터 이동수단을 구동하고 발광 수단을 본 발광시키는 제어부를 구비한다.
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公开(公告)号：KR1020070075590A
公开(公告)日：2007-07-24
申请号：KR1020060004009
申请日：2006-01-13
Applicant: 삼성전자주식회사
IPC: H01L21/00
CPC classification number: H01L21/67034 , H01L21/67242
Abstract: An air shower system is provided to shorten an interval of air shower time by performing an air shower process only to a degree that contaminants are removed. A space for performing an air shower process is formed in a housing. A gas supply member(112) injects cleaning gas to a target material in the housing. A detection member measures the quantity of contaminants in the housing. A control part(120) adjusts an interval of gas supply time of the gas supply members according to the quantity of the contaminants measured by the detection member. An adjust member(114) shortens an interval of fluid supply time if the quantity of the contaminants measured by the detection member is smaller than a predetermined value, and increases the interval of the fluid supply time if the quantity of the contaminants is greater than the predetermined value.
Abstract translation: 提供一种空气淋浴系统，以仅通过去除污染物的程度进行空气淋浴过程来缩短空气喷淋时间的间隔。 用于进行空气淋浴处理的空间形成在壳体中。 气体供给构件（112）将清洁气体注入到壳体中的目标材料。 检测构件测量壳体中的污染物的量。 控制部件（120）根据由检测部件测定的污染物的量来调整供气部件的供气时间间隔。 如果由检测构件测量的污染物的量小于预定值，则调节构件（114）缩短流体供应时间的间隔，并且如果污染物的量大于 预定值。
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Patent Agency Ranking
公开(公告)号：KR1020060130791A
公开(公告)日：2006-12-20
申请号：KR1020050048147
申请日：2005-06-07
Applicant: 삼성전자주식회사
IPC: C09D183/05
CPC classification number: H01L21/02164 , C03C3/04 , C09D183/04 , H01L21/02203 , H01L21/02282 , H01L21/316
Abstract: Provided is a porous spin-on glass composition, which forms a porous silicone oxide layer with low dielectric constant to be desired and forms a porous silicon oxide layer with good bonding properties to a lower layer and an upper layer. The porous spin-on glass composition comprises 3-20wt% of silsesquioxane oligomer having a structure of the following formula 1, 3-20wt% of a pore generator, and the balance of solvent. In the formula 1, each of Y1 and Y2 is independently a hydrolyzable alkoxy group, R is a lower alkyl group, and n and m are an integer of 1-9. The alkoxy group is any one selected from the group consisting of methoxide, ethoxide, iso-propoxide, and butoxide.
Abstract translation: 提供一种多孔旋涂玻璃组合物，其形成具有低介电常数的多孔硅氧烷氧化物层，并且形成具有与下层和上层具有良好结合性能的多孔氧化硅层。 多孔旋涂玻璃组合物包含3-20重量％具有下式1结构的倍半硅氧烷低聚物，3-20重量％的孔发生器，余量为溶剂。 在式1中，Y1和Y2各自独立地为可水解烷氧基，R为低级烷基，n和m为1-9的整数。 烷氧基是选自甲醇盐，乙醇盐，异丙醇盐和丁醇盐中的任一种。
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公开(公告)号：KR1020070117884A
公开(公告)日：2007-12-13
申请号：KR1020060052077
申请日：2006-06-09
Applicant: 삼성전자주식회사
IPC: H01L21/02 , H01L21/304
Abstract: A laminator equipped with an air conditioning system and a method for eliminating particles using the same are provided to improve cleanliness of a housing remarkably by installing exhaust lines additionally and using a fan filter unit, thereby reducing particles. A wafer taping device is embedded in a housing(110). An air knife(170) sprays air toward the wafer. A exhaust pipe line(140) exhausts the sprayed air from the air knife to the outside. A fan filter unit(130) sprays the air to inside the housing. An opening(115) exhausts the sprayed air from the fan filter unit to the outside.
Abstract translation: 提供一种配备有空调系统的层压机和使用其的除去颗粒的方法，通过另外安装排气管并使用风扇过滤器单元来显着提高壳体的清洁度，从而减少颗粒。 晶片胶带装置嵌入壳体（110）中。 气刀（170）朝向晶片喷射空气。 排气管线（140）将喷气的空气从气刀排出到外部。 风扇过滤器单元（130）将空气喷射到壳体内部。 开口（115）将喷射的空气从风扇过滤器单元排出到外部。
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公开(公告)号：KR100689668B1
公开(公告)日：2007-03-08
申请号：KR1020050089276
申请日：2005-09-26
Applicant: 삼성전자주식회사
IPC: H01L21/28
Abstract: An organic aluminum precursor and a method for manufacturing a metal wire using the same are provided to form an aluminum line having high electrical conductivity, a uniform surface, and prominent step coverage by minimizing generation of particles. An aluminum layer is formed on a substrate(100). A first interlayer dielectric pattern(110) is formed to expose an upper surface of a contact(105) connected with the substrate. A second interlayer dielectric pattern(120) having an aperture is formed on the first interlayer dielectric pattern. A barrier metal layer(130) is formed on the second interlayer dielectric pattern. A first aluminum layer(140) is formed on the barrier metal layer. A second aluminum layer(150) is formed thereon.
Abstract translation: 提供一种有机铝前驱体及使用该前驱体的金属线的制造方法，通过使粒子的产生最少化，从而形成具有高导电率，均匀表面和突出的台阶覆盖率的铝线。 在基板（100）上形成铝层。 形成第一层间电介质图案（110）以暴露与衬底连接的触点（105）的上表面。 在第一层间电介质图案上形成具有孔的第二层间电介质图案（120）。 在第二层间电介质图案上形成阻挡金属层（130）。 第一铝层（140）形成在阻挡金属层上。 在其上形成第二铝层（150）。
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公开(公告)号：KR100685734B1
公开(公告)日：2007-02-26
申请号：KR1020050048147
申请日：2005-06-07
Applicant: 삼성전자주식회사
IPC: C09D183/05
CPC classification number: H01L21/02164 , C03C3/04 , C09D183/04 , H01L21/02203 , H01L21/02282 , H01L21/316
Abstract: 접합 특성이 우수한 저 유전막을 형성하기 위한 다공성 스핀 온 글래스 조성물, 이의 제조 방법 및 이를 이용한 다공성 실리콘 산화막 형성 방법에 따르면, 상기 다공성 스핀 온 글래스 조성물은 구조식 1을 갖는 3 내지 20 중량%의 실세스퀴옥산 올리고머, 3 내지 20중량%의 기공 생성제 및 여분의 용매를 포함한다. 그리고, 상기 다공성 실리콘 산화막을 형성하기 위하여, 상기 다공성 스핀 온 글래스 조성물을 기판 상에 도포하여 스핀 온 글래스 박막을 형성한 후, 상기 박막을 경화하여 다공성 실리콘 산화막을 형성한다. 따라서, 상기 다공성 실리콘 산화막은 접합 특성이 우수할 뿐만 아니라 후속 공정에서 과 식각이 초래되지 않는다.
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公开(公告)号：KR1020070079437A
公开(公告)日：2007-08-07
申请号：KR1020060010105
申请日：2006-02-02
Applicant: 삼성전자주식회사
IPC: H01L21/02
Abstract: A contaminant controlling system and a method, and substrate processing equipment with the same are provided to monitor the acidity of processing solution for removing contaminants from the external air and to control automatically the acidity of the processing solution. A contaminant controlling system(120) removes contaminants from the air. The contaminant controlling system includes a contaminant removing unit and a monitoring unit. The contaminant removing unit(116) is composed of a contaminant collecting part for collecting contaminants from the air and a processing solution spraying member for spraying a processing solution to the contaminant collecting part. The monitoring unit monitors the acidity of the processing solution.
Abstract translation: 提供了一种污染物控制系统和方法，以及具有该污染物控制系统和方法的基板处理设备，用于监测从外部空气中除去污染物的处理溶液的酸度并自动控制处理溶液的酸度。 污染物控制系统（120）从空气中去除污染物。 污染物控制系统包括污染物去除单元和监测单元。 污染物去除单元（116）由用于从空气中收集污染物的污染物收集部分和用于将处理溶液喷射到污染物收集部分的处理溶液喷洒构件组成。 监控单元监控处理液的酸度。
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