公开(公告)号：CA3081777A1

公开(公告)日：2019-05-09

申请号：CA3081777

申请日：2018-11-05

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  KURGANOVA EVGENIA ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  PETER MARIA ,  SJMAENOK LEONID AIZIKOVITSJ ,  VAN DER WOORD TIES WOUTER ,  VLES DAVID FERDINAND

IPC: G03F1/62

Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.