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公开(公告)号：KR20200130289A
公开(公告)日：2020-11-18
申请号：KR20207025911
申请日：2019-02-07
Applicant: ASML NETHERLANDS BV
Inventor： KURGANOVA EVGENIA , GIESBERS ADRIANUS JOHANNES MARIA , KLEIN ALEXANDER LUDWIG , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN ZWOL PIETER JAN , VLES DAVID FERDINAND , VOLLEBREGT STEN , VOORTHUIJZEN WILLEM PIETER
IPC: B01J21/18 , B01J23/28 , B01J23/30 , B01J23/652 , B01J23/883 , B01J23/885 , B01J27/22 , B01J35/00 , B01J37/02 , G03F1/62 , G03F7/20
Abstract: 몰리브덴을포함하는제 1 층; 베이스층; 및중간층을포함하고, 중간층은베이스층과제 1 층사이에배치되는촉매가개시된다. 또한, 촉매를제조하는방법및 그래핀을합성하는방법, 본명세서에개시된촉매또는방법을사용하여생성되는펠리클, 및이러한펠리클을포함하는리소그래피장치가개시된다.
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公开(公告)号：WO2016124536A3
公开(公告)日：2016-10-06
申请号：PCT/EP2016052055
申请日：2016-02-01
Applicant: ASML NETHERLANDS BV
Inventor： BROUNS DERK SERVATIUS GERTRUDA , DE GRAAF DENNIS , DE KRUIF ROBERTUS CORNELIS MARTINUS , JANSSEN PAUL , KRUIZINGA MATTHIAS , NOTENBOOM ARNOUD WILLEM , SMITH DANIEL ANDREW , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , WILEY JAMES NORMAN
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
Abstract translation: 一种方法，包括以下步骤：接收包括掩模和由薄膜框架保持的可移除EUV透明薄膜的掩模组件，使用检查工具从掩模移除薄膜框架和EUV透明薄膜，以检查掩模上的掩模图案， 随后将由EUV透明薄膜保持在薄膜框架上的面罩附着在面罩上。 所述方法还可以包括以下步骤：在从所述掩模移除所述薄膜框架和所述EUV透明薄膜之后，将替代的薄膜框架附接到所述掩模，所述薄膜框架保持由对所述检查工具的检查梁基本上透明的材料形成的替代薄膜 ; 并且在使用检查工具检查掩模上的掩模图案之后，从掩模去除由替代薄膜框架保持的替代薄膜，以便将由薄膜框架保持的EUV透明薄膜附着到掩模。
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公开(公告)号：CA3008477A1
公开(公告)日：2017-06-22
申请号：CA3008477
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： VLES DAVID FERDINAND , ABEGG ERIK ACHILLES , BENDIKSEN AAGE , BROUNS DERK SERVATIUS GERTRUDA , GOVIL PRADEEP K , JANSSEN PAUL , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WILEY JAMES NORMAN
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：CA3116145A1
公开(公告)日：2020-04-23
申请号：CA3116145
申请日：2019-10-02
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , BALTUSSEN SANDER , DE GRAAF DENNIS , FRANKEN JOHANNES CHRISTIAAN LEONARDUS , GIESBERS ADRIANUS JOHANNES MARIA , KLEIN ALEXANDER LUDWIG , KLOOTWIJK JOHAN HENDRIK , KNAPEN PETER SIMON ANTONIUS , KURGANOVA EVGENIA , KUZNETSOV ALEXEY SERGEEVICH , NOTENBOOM ARNOUD WILLEM , VALEFI MAHDIAR , VAN DE KERKHOF MARCUS ADRIANUS , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER WOORD TIES WOUTER , WONDERGEM HENDRIKUS JAN , ZDRAVKOV ALEKSANDAR NIKOLOV
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.
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公开(公告)号：CA3066546A1
公开(公告)日：2018-12-20
申请号：CA3066546
申请日：2018-06-08
Applicant: ASML NETHERLANDS BV
Inventor： VLES DAVID FERDINAND , ANDE CHAITANYA KRISHNA , DE GROOT ANTONIUS FRANCISCUS JOHANNES , GIESBERS ADRIANUS JOHANNES MARIA , JANSSEN JOHANNES JOSEPH , JANSSEN PAUL , KLOOTWIJK JOHAN HENDRIK , KNAPEN PETER SIMON ANTONIUS , KURGANOVA EVGENIA , MEIJER MARCEL PETER , MEIJERINK WOUTER ROGIER , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , OLSMAN RAYMOND , PATEL HRISHIKESH , PETER MARIA , VAN DEN BOSCH GERRIT , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WONDERGEM HENDRIKUS JAN , ZDRAVKOV ALEXANDAR NIKOLOV
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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Patent Agency Ranking
公开(公告)号：CA3081777A1
公开(公告)日：2019-05-09
申请号：CA3081777
申请日：2018-11-05
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , KURGANOVA EVGENIA , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , SJMAENOK LEONID AIZIKOVITSJ , VAN DER WOORD TIES WOUTER , VLES DAVID FERDINAND
IPC: G03F1/62
Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
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公开(公告)号：CA2975806A1
公开(公告)日：2016-08-11
申请号：CA2975806
申请日：2016-02-01
Applicant: ASML NETHERLANDS BV
Inventor： BROUNS DERK SERVATIUS GERTRUDA , DE GRAAF DENNIS , DE KRUIF ROBERTUS CORNELIS MARTINUS , JANSSEN PAUL , KRUIZINGA MATTHIAS , NOTENBOOM ARNOUD WILLEM , SMITH DANIEL ANDREW , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , WILEY JAMES NORMAN
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：CA3149349A1
公开(公告)日：2021-03-04
申请号：CA3149349
申请日：2020-08-20
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , BALTUSSEN SANDER , BANINE VADIM YEVGENYEVICH , DOLGOV ALEXANDR , DONMEZ NOYAN INCI , HOUWELING ZOMER SILVESTER , NOTENBOOM ARNOUD WILLEM , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER WOORD TIES WOUTER , VERMEULEN PAUL ALEXANDER , VLES DAVID FERDINAND , VORONINA VICTORIA , YEGEN HALIL GOKAY
IPC: G03F1/62 , C01B32/158 , D01F9/12 , D01F11/12 , G03F7/20
Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.
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公开(公告)号：CA3148137A1
公开(公告)日：2021-02-04
申请号：CA3148137
申请日：2020-07-24
Applicant: ASML NETHERLANDS BV
Inventor： JANSSEN PAUL , BIRON MAXIME , DONMEZ NOYAN INCI , FERRE LLIN LOURDES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , KUNTZEL JAN HENDRIK WILLEM , NOTENBOOM ARNOUD WILLEM , ROLLIER ANNE-SOPHIE , VAN DER WOORD TIES WOUTER , VAN ZWOL PIETER-JAN
IPC: G03F1/62
Abstract: A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly comprising a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus comprising such pellicles.
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公开(公告)号：CA3104593A1
公开(公告)日：2019-12-26
申请号：CA3104593
申请日：2019-05-29
Applicant: ASML NETHERLANDS BV
Inventor： NASALEVICH MAXIM ALEKSANDROVICH , KLEIN ALEXANDER LUDWIG , KURGANOVA EVGENIA , NOTENBOOM ARNOUD WILLEM , VAN ZWOL PIETER-JAN , VLES DAVID FERDINAND
Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.
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