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公开(公告)号：KR20200130289A
公开(公告)日：2020-11-18
申请号：KR20207025911
申请日：2019-02-07
Applicant: ASML NETHERLANDS BV
Inventor： KURGANOVA EVGENIA , GIESBERS ADRIANUS JOHANNES MARIA , KLEIN ALEXANDER LUDWIG , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN ZWOL PIETER JAN , VLES DAVID FERDINAND , VOLLEBREGT STEN , VOORTHUIJZEN WILLEM PIETER
IPC: B01J21/18 , B01J23/28 , B01J23/30 , B01J23/652 , B01J23/883 , B01J23/885 , B01J27/22 , B01J35/00 , B01J37/02 , G03F1/62 , G03F7/20
Abstract: 몰리브덴을포함하는제 1 층; 베이스층; 및중간층을포함하고, 중간층은베이스층과제 1 층사이에배치되는촉매가개시된다. 또한, 촉매를제조하는방법및 그래핀을합성하는방법, 본명세서에개시된촉매또는방법을사용하여생성되는펠리클, 및이러한펠리클을포함하는리소그래피장치가개시된다.
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2.发明公开
公开(公告)号：KR20180072786A
公开(公告)日：2018-06-29
申请号：KR20187014403
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PETER MARIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM PIETER
IPC: G03F1/62 , G03F1/66 , G03F7/20 , H01L21/027
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: 리소그래피장치를위한펠리클을제조하는방법들이개시된다. 일배치에서, 상기방법은기판의평탄한표면상에적어도하나의그래핀층을증착하는단계를포함한다. 상기기판은제1기판부및 제2기판부를포함한다. 상기방법은상기적어도하나의그래핀층으로부터프리스탠딩막을형성하기위해상기제1기판부를제거하는단계를더 포함한다. 상기프리스탠딩막은상기제2기판부에의해지지된다.
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公开(公告)号：JP2009147327A
公开(公告)日：2009-07-02
申请号：JP2008309314
申请日：2008-12-04
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： DE LAAT WILHELMUS JOHANNES MAR , GUI CHENG-QUN , GIESEN PETER THEODORUS MARIA , LEONARDUS VAN DIJK PAULUS WILH , MEINDERS ERWIN RINALDO , PETER MARIA
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/707
Abstract: PROBLEM TO BE SOLVED: To provide a new lithographic carrier substrate. SOLUTION: A layer of PDMS and curing agent is provided on one side of the carrier substrate. The PDMS and curing agent receive and adhere to a lithographic substrate. Such dimensions can be given to the carrier substrate that the combination of the carrier substrate and the lithographic substrate may be handled by a conventional lithographic apparatus. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供新的平版印刷载体基板。 解决方案：在载体基底的一侧上设置一层PDMS和固化剂。 PDMS和固化剂接收并粘附到平版印刷基板上。 可以将这样的尺寸提供给载体基底，即载体基底和光刻基底的组合可以由传统的光刻设备来处理。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：WO2009060294A3
公开(公告)日：2009-08-13
申请号：PCT/IB2008002977
申请日：2008-11-03
Applicant: ASML NETHERLANDS BV , TNO , DE LAAT WILHELMUS JOHANNES MARIA , GUI CHENG-QUN , GIESEN PETER THEODORUS MARIA , VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS , MEINDERS ERWIN RINALDO , PETER MARIA
Inventor： DE LAAT WILHELMUS JOHANNES MARIA , GUI CHENG-QUN , GIESEN PETER THEODORUS MARIA , VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS , MEINDERS ERWIN RINALDO , PETER MARIA
IPC: G01B11/30
CPC classification number: G01B11/306 , G01N2021/95676 , G03F7/703 , G03F7/70783 , G03F7/7085
Abstract: A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including: directing a beam of radiation at the surface of the flexible substrate; and detecting changes in the intensity distribution of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
Abstract translation: 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括：在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布的变化已经从衬底的表面反射以获得指示柔性衬底的表面的形貌的信息。
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公开(公告)号：CA3008477A1
公开(公告)日：2017-06-22
申请号：CA3008477
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： VLES DAVID FERDINAND , ABEGG ERIK ACHILLES , BENDIKSEN AAGE , BROUNS DERK SERVATIUS GERTRUDA , GOVIL PRADEEP K , JANSSEN PAUL , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WILEY JAMES NORMAN
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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Patent Agency Ranking
公开(公告)号：CA2954307C
公开(公告)日：2022-08-30
申请号：CA2954307
申请日：2015-07-02
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY ALEXANDROVICH , BANINE VADIM YEVGENYEVICH , BENSCHOP JOZEF PETRUS HENRICUS , BOOGAARD ARJEN , DHALLUIN FLORIAN DIDIER ALBIN , KUZNETSOV ALEXEY SERGEEVICH , PETER MARIA , SCACCABAROZZI LUIGI , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , YAKUNIN ANDREI MIKHAILOVICH
Abstract: Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 1017 cm-3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.
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公开(公告)号：CA2954307A1
公开(公告)日：2016-01-07
申请号：CA2954307
申请日：2015-07-02
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY ALEXANDROVICH , BANINE VADIM YEVGENYEVICH , BENSCHOP JOZEF PETRUS HENRICUS , BOOGAARD ARJEN , DHALLUIN FLORIAN DIDIER ALBIN , KUZNETSOV ALEXEY SERGEEVICH , PETER MARIA , SCACCABAROZZI LUIGI , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , YAKUNIN ANDREI MIKHAILOVICH
Abstract: Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 1017 cm-3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.
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公开(公告)号：CA3066546A1
公开(公告)日：2018-12-20
申请号：CA3066546
申请日：2018-06-08
Applicant: ASML NETHERLANDS BV
Inventor： VLES DAVID FERDINAND , ANDE CHAITANYA KRISHNA , DE GROOT ANTONIUS FRANCISCUS JOHANNES , GIESBERS ADRIANUS JOHANNES MARIA , JANSSEN JOHANNES JOSEPH , JANSSEN PAUL , KLOOTWIJK JOHAN HENDRIK , KNAPEN PETER SIMON ANTONIUS , KURGANOVA EVGENIA , MEIJER MARCEL PETER , MEIJERINK WOUTER ROGIER , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , OLSMAN RAYMOND , PATEL HRISHIKESH , PETER MARIA , VAN DEN BOSCH GERRIT , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WONDERGEM HENDRIKUS JAN , ZDRAVKOV ALEXANDAR NIKOLOV
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：CA3002702A1
公开(公告)日：2017-04-27
申请号：CA3002702
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PETER MARIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
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公开(公告)号：CA3081777A1
公开(公告)日：2019-05-09
申请号：CA3081777
申请日：2018-11-05
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , KURGANOVA EVGENIA , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , SJMAENOK LEONID AIZIKOVITSJ , VAN DER WOORD TIES WOUTER , VLES DAVID FERDINAND
IPC: G03F1/62
Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
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