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1.发明公开
公开(公告)号：KR20180072786A
公开(公告)日：2018-06-29
申请号：KR20187014403
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PETER MARIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM PIETER
IPC: G03F1/62 , G03F1/66 , G03F7/20 , H01L21/027
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: 리소그래피장치를위한펠리클을제조하는방법들이개시된다. 일배치에서, 상기방법은기판의평탄한표면상에적어도하나의그래핀층을증착하는단계를포함한다. 상기기판은제1기판부및 제2기판부를포함한다. 상기방법은상기적어도하나의그래핀층으로부터프리스탠딩막을형성하기위해상기제1기판부를제거하는단계를더 포함한다. 상기프리스탠딩막은상기제2기판부에의해지지된다.
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公开(公告)号：KR20180030673A
公开(公告)日：2018-03-23
申请号：KR20187004729
申请日：2016-07-04
Applicant: ASML NETHERLANDS BV
IPC: G03F1/62 , G03F1/80 , G03F7/20 , H01L21/02 , H01L21/027
CPC classification number: G03F1/62 , G03F7/70916
Abstract: EUV 리소그래피를위한멤브레인조립체를제조하는방법이개시되며, 상기방법은: 평면기판및 적어도하나의멤브레인층을포함한스택을제공하는단계 -상기평면기판은내부구역및 내부구역주위의보더구역을포함함- ; 및평면기판의내부구역을선택적으로제거하는단계를포함한다. 멤브레인조립체는: 적어도하나의멤브레인층으로부터형성되는멤브레인; 및멤브레인을유지하는보더를포함하고, 보더는평면기판의보더구역으로부터형성된다. 스택에는평면기판의내부구역을선택적으로제거하는단계동안보더구역을기계적으로보호하도록구성되는기계적보호재료가제공된다.
Abstract translation: 公开了一种用于制造用于EUV光刻的膜组件的方法，该方法包括：提供包括平面衬底和至少一个膜层的叠层，该平面衬底包括围绕内部区域和内部区域的边界区域 - ; 并有选择地去除平面衬底的内部区域。 膜组件包括：由至少一个膜层形成的膜; 以及用于保持膜的边界，其中边界由平坦基板的边界区域形成。 该堆叠设置有机械保护材料，该机械保护材料被配置为在选择性地移除平面衬底的内部区域的步骤期间机械地保护边界区域。
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3.发明申请
公开(公告)号：WO2017067813A3
公开(公告)日：2017-06-01
申请号：PCT/EP2016074280
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PÉTER MÁRIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
Abstract translation: 公开了制造用于光刻设备的薄膜的方法。 在一种布置中，该方法包括在衬底（6）的平坦表面（4）上沉积至少一个石墨烯层（2）。 衬底包括第一衬底部分和第二衬底部分（12）。 该方法进一步包括移除第一衬底部分以从该至少一个石墨烯层形成独立膜（14）。 独立式膜由第二基底部分支撑。
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公开(公告)号：IL312111A
公开(公告)日：2024-06-01
申请号：IL31211124
申请日：2024-04-11
Applicant: ASML NETHERLANDS BV , BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA , DONMEZ NOYAN INCI , GIESBERS ADRIANUS JOHANNES MARIA , HOUWELING ZOMER SILVESTER , KLEIN ALEXANDER LUDWIG , KLOOTWIJK JOHAN HENDRIK , REININK JOHAN , VAN DE GOOR TIM WILLEM JOHAN , VAN DER WOORD TIES WOUTER , VERMEULEN PAUL ALEXANDER
Inventor： BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA , DONMEZ NOYAN INCI , GIESBERS ADRIANUS JOHANNES MARIA , HOUWELING ZOMER SILVESTER , KLEIN ALEXANDER LUDWIG , KLOOTWIJK JOHAN HENDRIK , REININK JOHAN , VAN DE GOOR TIM WILLEM JOHAN , VAN DER WOORD TIES WOUTER , VERMEULEN PAUL ALEXANDER
Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.
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公开(公告)号：CA3116145A1
公开(公告)日：2020-04-23
申请号：CA3116145
申请日：2019-10-02
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , BALTUSSEN SANDER , DE GRAAF DENNIS , FRANKEN JOHANNES CHRISTIAAN LEONARDUS , GIESBERS ADRIANUS JOHANNES MARIA , KLEIN ALEXANDER LUDWIG , KLOOTWIJK JOHAN HENDRIK , KNAPEN PETER SIMON ANTONIUS , KURGANOVA EVGENIA , KUZNETSOV ALEXEY SERGEEVICH , NOTENBOOM ARNOUD WILLEM , VALEFI MAHDIAR , VAN DE KERKHOF MARCUS ADRIANUS , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER WOORD TIES WOUTER , WONDERGEM HENDRIKUS JAN , ZDRAVKOV ALEKSANDAR NIKOLOV
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.
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Patent Agency Ranking
公开(公告)号：CA3066546A1
公开(公告)日：2018-12-20
申请号：CA3066546
申请日：2018-06-08
Applicant: ASML NETHERLANDS BV
Inventor： VLES DAVID FERDINAND , ANDE CHAITANYA KRISHNA , DE GROOT ANTONIUS FRANCISCUS JOHANNES , GIESBERS ADRIANUS JOHANNES MARIA , JANSSEN JOHANNES JOSEPH , JANSSEN PAUL , KLOOTWIJK JOHAN HENDRIK , KNAPEN PETER SIMON ANTONIUS , KURGANOVA EVGENIA , MEIJER MARCEL PETER , MEIJERINK WOUTER ROGIER , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , OLSMAN RAYMOND , PATEL HRISHIKESH , PETER MARIA , VAN DEN BOSCH GERRIT , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WONDERGEM HENDRIKUS JAN , ZDRAVKOV ALEXANDAR NIKOLOV
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：CA3008939A1
公开(公告)日：2017-06-22
申请号：CA3008939
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV
Inventor： JANSSEN PAUL , KLOOTWIJK JOHAN HENDRIK , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , ZDRAVKOV ALEXANDAR NIKOLOV
Abstract: Methods of manufacturing a membrane assembly are disclosed. In one arrangement, a stack comprises a planar substrate and at least one membrane layer. The planar substrate comprises an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are selectively removed. The membrane assembly after removal comprises: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region of the planar substrate, an edge section around the border, the edge section formed from the edge region of the planar substrate, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region of the planar substrate. The method further comprises separating the edge section from the border by cutting or breaking the bridge.
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公开(公告)号：CA3002702A1
公开(公告)日：2017-04-27
申请号：CA3002702
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PETER MARIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
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公开(公告)号：CA3235933A1
公开(公告)日：2023-04-27
申请号：CA3235933
申请日：2022-10-07
Applicant: ASML NETHERLANDS BV
Inventor： DONMEZ NOYAN INCI , VAN DER WOORD TIES WOUTER , REININK JOHAN , VAN DE GOOR TIM WILLEM JOHAN , KLEIN ALEXANDER LUDWIG , HOUWELING ZOMER SILVESTER , VERMEULEN PAUL ALEXANDER , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA
IPC: G03F1/62
Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.
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公开(公告)号：CA3081777A1
公开(公告)日：2019-05-09
申请号：CA3081777
申请日：2018-11-05
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , KURGANOVA EVGENIA , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , SJMAENOK LEONID AIZIKOVITSJ , VAN DER WOORD TIES WOUTER , VLES DAVID FERDINAND
IPC: G03F1/62
Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
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