公开(公告)号：IL312111A

公开(公告)日：2024-06-01

申请号：IL31211124

申请日：2024-04-11

Applicant: ASML NETHERLANDS BV ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Inventor： BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：CA3116145A1

公开(公告)日：2020-04-23

申请号：CA3116145

申请日：2019-10-02

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  BALTUSSEN SANDER ,  DE GRAAF DENNIS ,  FRANKEN JOHANNES CHRISTIAAN LEONARDUS ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  KNAPEN PETER SIMON ANTONIUS ,  KURGANOVA EVGENIA ,  KUZNETSOV ALEXEY SERGEEVICH ,  NOTENBOOM ARNOUD WILLEM ,  VALEFI MAHDIAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER WOORD TIES WOUTER ,  WONDERGEM HENDRIKUS JAN ,  ZDRAVKOV ALEKSANDAR NIKOLOV

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.

公开(公告)号：CA3149349A1

公开(公告)日：2021-03-04

申请号：CA3149349

申请日：2020-08-20

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  BALTUSSEN SANDER ,  BANINE VADIM YEVGENYEVICH ,  DOLGOV ALEXANDR ,  DONMEZ NOYAN INCI ,  HOUWELING ZOMER SILVESTER ,  NOTENBOOM ARNOUD WILLEM ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER ,  VLES DAVID FERDINAND ,  VORONINA VICTORIA ,  YEGEN HALIL GOKAY

IPC: G03F1/62 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.

公开(公告)号：CA3148137A1

公开(公告)日：2021-02-04

申请号：CA3148137

申请日：2020-07-24

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN PAUL ,  BIRON MAXIME ,  DONMEZ NOYAN INCI ,  FERRE LLIN LOURDES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  KUNTZEL JAN HENDRIK WILLEM ,  NOTENBOOM ARNOUD WILLEM ,  ROLLIER ANNE-SOPHIE ,  VAN DER WOORD TIES WOUTER ,  VAN ZWOL PIETER-JAN

IPC: G03F1/62

Abstract: A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly comprising a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus comprising such pellicles.

公开(公告)号：CA3235933A1

公开(公告)日：2023-04-27

申请号：CA3235933

申请日：2022-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DONMEZ NOYAN INCI ,  VAN DER WOORD TIES WOUTER ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  KLEIN ALEXANDER LUDWIG ,  HOUWELING ZOMER SILVESTER ,  VERMEULEN PAUL ALEXANDER ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA

IPC: G03F1/62

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：CA3081777A1

公开(公告)日：2019-05-09

申请号：CA3081777

申请日：2018-11-05

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  KURGANOVA EVGENIA ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  PETER MARIA ,  SJMAENOK LEONID AIZIKOVITSJ ,  VAN DER WOORD TIES WOUTER ,  VLES DAVID FERDINAND

IPC: G03F1/62

Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.