-
公开(公告)号：KR20200130289A
公开(公告)日：2020-11-18
申请号：KR20207025911
申请日：2019-02-07
Applicant: ASML NETHERLANDS BV
Inventor： KURGANOVA EVGENIA , GIESBERS ADRIANUS JOHANNES MARIA , KLEIN ALEXANDER LUDWIG , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN ZWOL PIETER JAN , VLES DAVID FERDINAND , VOLLEBREGT STEN , VOORTHUIJZEN WILLEM PIETER
IPC: B01J21/18 , B01J23/28 , B01J23/30 , B01J23/652 , B01J23/883 , B01J23/885 , B01J27/22 , B01J35/00 , B01J37/02 , G03F1/62 , G03F7/20
Abstract: 몰리브덴을포함하는제 1 층; 베이스층; 및중간층을포함하고, 중간층은베이스층과제 1 층사이에배치되는촉매가개시된다. 또한, 촉매를제조하는방법및 그래핀을합성하는방법, 본명세서에개시된촉매또는방법을사용하여생성되는펠리클, 및이러한펠리클을포함하는리소그래피장치가개시된다.
-
公开(公告)号：KR20210007971A
公开(公告)日：2021-01-20
申请号：KR20207031906
申请日：2019-04-12
Applicant: ASML NETHERLANDS BV
Inventor： DE GRAAF DENNIS , BEAUDRY RICHARD , BIRON MAXIME , JANSSEN PAUL , KATER THIJS , KORNELSEN KEVIN , KUIJKEN MICHAEL ALFRED JOSEPHUS , KUNTZEL JAN HENDRIK WILLEM , MARTEL STEPHANE , NASALEVICH MAXIM ALEKSANDROVICH , SALMASO GUIDO , VAN ZWOL PIETER JAN
Abstract: 한면의마스크및 반대면의적어도하나의층을포함한웨이퍼가설명되며, 마스크는적어도하나의층이실질적으로없는반대면의적어도일부분위에놓이는적어도하나의스크라이브라인을포함한다. 또한, 한면의마스크및 반대면의적어도하나의층을포함한웨이퍼를제공하는단계, 마스크에서스크라이브라인을정의하는단계, 및적어도부분적으로스크라이브라인위에놓이는적어도하나의층의부분을선택적으로제거하는단계를포함하는펠리클제조방법, 및펠리클코어를제공하는단계, 및비-산화환경에서펠리클코어의적어도하나의면으로부터적어도일부재료를제거하는단계를포함하는펠리클제조방법이설명된다. 여하한의실시형태에서, 펠리클은금속질화물층을포함할수 있다.
-
3.发明公开
公开(公告)号：KR20180072786A
公开(公告)日：2018-06-29
申请号：KR20187014403
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PETER MARIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM PIETER
IPC: G03F1/62 , G03F1/66 , G03F7/20 , H01L21/027
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: 리소그래피장치를위한펠리클을제조하는방법들이개시된다. 일배치에서, 상기방법은기판의평탄한표면상에적어도하나의그래핀층을증착하는단계를포함한다. 상기기판은제1기판부및 제2기판부를포함한다. 상기방법은상기적어도하나의그래핀층으로부터프리스탠딩막을형성하기위해상기제1기판부를제거하는단계를더 포함한다. 상기프리스탠딩막은상기제2기판부에의해지지된다.
-
4.发明申请
公开(公告)号：WO2017067813A3
公开(公告)日：2017-06-01
申请号：PCT/EP2016074280
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PÉTER MÁRIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
Abstract translation: 公开了制造用于光刻设备的薄膜的方法。 在一种布置中，该方法包括在衬底（6）的平坦表面（4）上沉积至少一个石墨烯层（2）。 衬底包括第一衬底部分和第二衬底部分（12）。 该方法进一步包括移除第一衬底部分以从该至少一个石墨烯层形成独立膜（14）。 独立式膜由第二基底部分支撑。
-
公开(公告)号：CA3008477A1
公开(公告)日：2017-06-22
申请号：CA3008477
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： VLES DAVID FERDINAND , ABEGG ERIK ACHILLES , BENDIKSEN AAGE , BROUNS DERK SERVATIUS GERTRUDA , GOVIL PRADEEP K , JANSSEN PAUL , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WILEY JAMES NORMAN
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
-
Patent Agency Ranking
公开(公告)号：CA3081777A1
公开(公告)日：2019-05-09
申请号：CA3081777
申请日：2018-11-05
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , KURGANOVA EVGENIA , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , SJMAENOK LEONID AIZIKOVITSJ , VAN DER WOORD TIES WOUTER , VLES DAVID FERDINAND
IPC: G03F1/62
Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
-
公开(公告)号：CA3066546A1
公开(公告)日：2018-12-20
申请号：CA3066546
申请日：2018-06-08
Applicant: ASML NETHERLANDS BV
Inventor： VLES DAVID FERDINAND , ANDE CHAITANYA KRISHNA , DE GROOT ANTONIUS FRANCISCUS JOHANNES , GIESBERS ADRIANUS JOHANNES MARIA , JANSSEN JOHANNES JOSEPH , JANSSEN PAUL , KLOOTWIJK JOHAN HENDRIK , KNAPEN PETER SIMON ANTONIUS , KURGANOVA EVGENIA , MEIJER MARCEL PETER , MEIJERINK WOUTER ROGIER , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , OLSMAN RAYMOND , PATEL HRISHIKESH , PETER MARIA , VAN DEN BOSCH GERRIT , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WONDERGEM HENDRIKUS JAN , ZDRAVKOV ALEXANDAR NIKOLOV
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
-
公开(公告)号：CA3002702A1
公开(公告)日：2017-04-27
申请号：CA3002702
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PETER MARIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
-
公开(公告)号：CA3104593A1
公开(公告)日：2019-12-26
申请号：CA3104593
申请日：2019-05-29
Applicant: ASML NETHERLANDS BV
Inventor： NASALEVICH MAXIM ALEKSANDROVICH , KLEIN ALEXANDER LUDWIG , KURGANOVA EVGENIA , NOTENBOOM ARNOUD WILLEM , VAN ZWOL PIETER-JAN , VLES DAVID FERDINAND
Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.
-
公开(公告)号：CA3099013A1
公开(公告)日：2019-11-07
申请号：CA3099013
申请日：2019-04-12
Applicant: ASML NETHERLANDS BV
Inventor： DE GRAAF DENNIS , BEAUDRY RICHARD , BIRON MAXIME , JANSSEN PAUL , KATER THIJS , KORNELSEN KEVIN , KUIJKEN MICHAEL ALFRED JOSEPHUS , KUNTZEL JAN HENDRIK WILLEM , MARTEL STEPHANE , NASALEVICH MAXIM ALEKSANDROVICH , SALMASO GUIDO , VAN ZWOL PIETER-JAN
Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.
-
-
-
-
-
-
-
-
-
Search Results
11
records
(took 0.027 seconds)
