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公开(公告)号：KR20200130289A
公开(公告)日：2020-11-18
申请号：KR20207025911
申请日：2019-02-07
Applicant: ASML NETHERLANDS BV
Inventor： KURGANOVA EVGENIA , GIESBERS ADRIANUS JOHANNES MARIA , KLEIN ALEXANDER LUDWIG , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN ZWOL PIETER JAN , VLES DAVID FERDINAND , VOLLEBREGT STEN , VOORTHUIJZEN WILLEM PIETER
IPC: B01J21/18 , B01J23/28 , B01J23/30 , B01J23/652 , B01J23/883 , B01J23/885 , B01J27/22 , B01J35/00 , B01J37/02 , G03F1/62 , G03F7/20
Abstract: 몰리브덴을포함하는제 1 층; 베이스층; 및중간층을포함하고, 중간층은베이스층과제 1 층사이에배치되는촉매가개시된다. 또한, 촉매를제조하는방법및 그래핀을합성하는방법, 본명세서에개시된촉매또는방법을사용하여생성되는펠리클, 및이러한펠리클을포함하는리소그래피장치가개시된다.
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2.发明公开
公开(公告)号：KR20180072786A
公开(公告)日：2018-06-29
申请号：KR20187014403
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PETER MARIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM PIETER
IPC: G03F1/62 , G03F1/66 , G03F7/20 , H01L21/027
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: 리소그래피장치를위한펠리클을제조하는방법들이개시된다. 일배치에서, 상기방법은기판의평탄한표면상에적어도하나의그래핀층을증착하는단계를포함한다. 상기기판은제1기판부및 제2기판부를포함한다. 상기방법은상기적어도하나의그래핀층으로부터프리스탠딩막을형성하기위해상기제1기판부를제거하는단계를더 포함한다. 상기프리스탠딩막은상기제2기판부에의해지지된다.
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3.发明申请
公开(公告)号：WO2017067813A3
公开(公告)日：2017-06-01
申请号：PCT/EP2016074280
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PÉTER MÁRIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
Abstract translation: 公开了制造用于光刻设备的薄膜的方法。 在一种布置中，该方法包括在衬底（6）的平坦表面（4）上沉积至少一个石墨烯层（2）。 衬底包括第一衬底部分和第二衬底部分（12）。 该方法进一步包括移除第一衬底部分以从该至少一个石墨烯层形成独立膜（14）。 独立式膜由第二基底部分支撑。
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公开(公告)号：CA3008477A1
公开(公告)日：2017-06-22
申请号：CA3008477
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： VLES DAVID FERDINAND , ABEGG ERIK ACHILLES , BENDIKSEN AAGE , BROUNS DERK SERVATIUS GERTRUDA , GOVIL PRADEEP K , JANSSEN PAUL , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WILEY JAMES NORMAN
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：CA3066546A1
公开(公告)日：2018-12-20
申请号：CA3066546
申请日：2018-06-08
Applicant: ASML NETHERLANDS BV
Inventor： VLES DAVID FERDINAND , ANDE CHAITANYA KRISHNA , DE GROOT ANTONIUS FRANCISCUS JOHANNES , GIESBERS ADRIANUS JOHANNES MARIA , JANSSEN JOHANNES JOSEPH , JANSSEN PAUL , KLOOTWIJK JOHAN HENDRIK , KNAPEN PETER SIMON ANTONIUS , KURGANOVA EVGENIA , MEIJER MARCEL PETER , MEIJERINK WOUTER ROGIER , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , OLSMAN RAYMOND , PATEL HRISHIKESH , PETER MARIA , VAN DEN BOSCH GERRIT , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WONDERGEM HENDRIKUS JAN , ZDRAVKOV ALEXANDAR NIKOLOV
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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Patent Agency Ranking
公开(公告)号：CA3002702A1
公开(公告)日：2017-04-27
申请号：CA3002702
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PETER MARIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
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公开(公告)号：CA3081777A1
公开(公告)日：2019-05-09
申请号：CA3081777
申请日：2018-11-05
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , KURGANOVA EVGENIA , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , SJMAENOK LEONID AIZIKOVITSJ , VAN DER WOORD TIES WOUTER , VLES DAVID FERDINAND
IPC: G03F1/62
Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
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公开(公告)号：CA3008050A1
公开(公告)日：2017-06-22
申请号：CA3008050
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV
Inventor： BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KAMALI MOHAMMAD REZA , PETER MARIA , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
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公开(公告)号：CA3149349A1
公开(公告)日：2021-03-04
申请号：CA3149349
申请日：2020-08-20
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , BALTUSSEN SANDER , BANINE VADIM YEVGENYEVICH , DOLGOV ALEXANDR , DONMEZ NOYAN INCI , HOUWELING ZOMER SILVESTER , NOTENBOOM ARNOUD WILLEM , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER WOORD TIES WOUTER , VERMEULEN PAUL ALEXANDER , VLES DAVID FERDINAND , VORONINA VICTORIA , YEGEN HALIL GOKAY
IPC: G03F1/62 , C01B32/158 , D01F9/12 , D01F11/12 , G03F7/20
Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.
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公开(公告)号：CA3104593A1
公开(公告)日：2019-12-26
申请号：CA3104593
申请日：2019-05-29
Applicant: ASML NETHERLANDS BV
Inventor： NASALEVICH MAXIM ALEKSANDROVICH , KLEIN ALEXANDER LUDWIG , KURGANOVA EVGENIA , NOTENBOOM ARNOUD WILLEM , VAN ZWOL PIETER-JAN , VLES DAVID FERDINAND
Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.
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