公开(公告)号：KR20200130289A

公开(公告)日：2020-11-18

申请号：KR20207025911

申请日：2019-02-07

Applicant: ASML NETHERLANDS BV

Inventor： KURGANOVA EVGENIA ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLEIN ALEXANDER LUDWIG ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  PETER MARIA ,  VAN ZWOL PIETER JAN ,  VLES DAVID FERDINAND ,  VOLLEBREGT STEN ,  VOORTHUIJZEN WILLEM PIETER

IPC: B01J21/18 ,  B01J23/28 ,  B01J23/30 ,  B01J23/652 ,  B01J23/883 ,  B01J23/885 ,  B01J27/22 ,  B01J35/00 ,  B01J37/02 ,  G03F1/62 ,  G03F7/20

Abstract: 몰리브덴을포함하는제 1 층; 베이스층; 및중간층을포함하고, 중간층은베이스층과제 1 층사이에배치되는촉매가개시된다. 또한, 촉매를제조하는방법및 그래핀을합성하는방법, 본명세서에개시된촉매또는방법을사용하여생성되는펠리클, 및이러한펠리클을포함하는리소그래피장치가개시된다.

公开(公告)号：CA3104593A1

公开(公告)日：2019-12-26

申请号：CA3104593

申请日：2019-05-29

Applicant: ASML NETHERLANDS BV

Inventor： NASALEVICH MAXIM ALEKSANDROVICH ,  KLEIN ALEXANDER LUDWIG ,  KURGANOVA EVGENIA ,  NOTENBOOM ARNOUD WILLEM ,  VAN ZWOL PIETER-JAN ,  VLES DAVID FERDINAND

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.

公开(公告)号：CA3081777A1

公开(公告)日：2019-05-09

申请号：CA3081777

申请日：2018-11-05

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  KURGANOVA EVGENIA ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  PETER MARIA ,  SJMAENOK LEONID AIZIKOVITSJ ,  VAN DER WOORD TIES WOUTER ,  VLES DAVID FERDINAND

IPC: G03F1/62

Abstract: A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.

公开(公告)号：IL312104A

公开(公告)日：2024-06-01

申请号：IL31210424

申请日：2024-04-11

Applicant: ASML NETHERLANDS BV ,  BAKKER TIES JAN WILLEM ,  DE VRIES GOSSE CHARLES ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ENGEL MICHAEL ,  HILDENBRAND VOLKER DIRK ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KURGANOVA EVGENIA ,  LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES ,  VAN DER HAM RONALD ,  VAN LIPZIG JEROEN PETERUS JOHANNES ,  VERMEULEN PAUL ALEXANDER ,  WOLF ABRAHAM JAN

Inventor： BAKKER TIES JAN WILLEM ,  DE VRIES GOSSE CHARLES ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ENGEL MICHAEL ,  HILDENBRAND VOLKER DIRK ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KURGANOVA EVGENIA ,  LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES ,  VAN DER HAM RONALD ,  VAN LIPZIG JEROEN PETERUS JOHANNES ,  VERMEULEN PAUL ALEXANDER ,  WOLF ABRAHAM JAN

Abstract: A lithographic apparatus comprises: an illumination system; a support structure; a substrate table; a projection system and a heating system. The illumination system is configured to condition a radiation beam. The support structure is constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system. The substrate table is constructed to support a substrate. The projection system is configured to receive the radiation beam from the reticle - pellicle assembly and to project it onto the substrate. The heating system is operable to heat a pellicle of the reticle - pellicle assembly supported by the support structure. A method for using a reticle - pellicle assembly comprises: illuminating the reticle - pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle - pellicle assembly using a separate heat source.

公开(公告)号：CA3116145A1

公开(公告)日：2020-04-23

申请号：CA3116145

申请日：2019-10-02

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  BALTUSSEN SANDER ,  DE GRAAF DENNIS ,  FRANKEN JOHANNES CHRISTIAAN LEONARDUS ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  KNAPEN PETER SIMON ANTONIUS ,  KURGANOVA EVGENIA ,  KUZNETSOV ALEXEY SERGEEVICH ,  NOTENBOOM ARNOUD WILLEM ,  VALEFI MAHDIAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER WOORD TIES WOUTER ,  WONDERGEM HENDRIKUS JAN ,  ZDRAVKOV ALEKSANDAR NIKOLOV

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.

公开(公告)号：CA3066546A1

公开(公告)日：2018-12-20

申请号：CA3066546

申请日：2018-06-08

Applicant: ASML NETHERLANDS BV

Inventor： VLES DAVID FERDINAND ,  ANDE CHAITANYA KRISHNA ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  JANSSEN JOHANNES JOSEPH ,  JANSSEN PAUL ,  KLOOTWIJK JOHAN HENDRIK ,  KNAPEN PETER SIMON ANTONIUS ,  KURGANOVA EVGENIA ,  MEIJER MARCEL PETER ,  MEIJERINK WOUTER ROGIER ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  OLSMAN RAYMOND ,  PATEL HRISHIKESH ,  PETER MARIA ,  VAN DEN BOSCH GERRIT ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VOORTHUIJZEN WILLEM-PIETER ,  WONDERGEM HENDRIKUS JAN ,  ZDRAVKOV ALEXANDAR NIKOLOV

IPC: G03F1/62 ,  G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.