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    2.
    发明专利
    未知

    公开(公告)号：AT198590T

    公开(公告)日：2001-01-15

    申请号：AT96110449

    申请日：1996-06-28

    Applicant: BASF AG

    Inventor： REICH WOLFGANG DR ,  BECK ERICH DR ,  JAEGER ULRICH DR ,  SCHWALM REINHOLD DR

    IPC: C07C68/02 ,  C07C69/96 ,  C08F2/48 ,  C08F2/50 ,  C08F20/26 ,  C08F20/28

    Abstract: Radiation-curable (meth)acrylates (I) are claimed, which are obtd. by reacting: (i) acylphenyl chloroformates of formula (II) with: (ii) hydroxy (meth)acrylates (III) contg. free hydroxy gp(s). and (meth)acryl gps. in the molecule: R-C(=O)-R (II) R = 1-4 C alkyl, aryl or R ; R = a substd. phenyl gp. of formula (IV); R - R = H, 1-4 C alkyl, 1-4 C alkoxy, OH, phenyl, SH, SCH3, SC2H5, F, Cl, Br, CN, COOH, COO-(1-17 C alkyl), COO-(5-10 C aryl), CF3, N(alkyl)2, N(alkyl)(aryl), N(aryl)2, N , or N H(alkyl)2A ; A = an anion; alkyl, aryl = 1-10 C alkyl and 5-10 C aryl, unless otherwise indicated; and 1-3 R - R gps. = -O-C(=O)-Cl. Also claimed are: (a) a process for the prodn. of radiation curable (meth)acrylate; and (b) use of radiation curable (meth)acrylate in radiation curable compsns..

    5.
    发明专利
    未知

    公开(公告)号：DE59402794D1

    公开(公告)日：1997-06-26

    申请号：DE59402794

    申请日：1994-02-25

    Applicant: BASF AG

    Inventor： FUNHOFF DIRK DR ,  SCHWALM REINHOLD DR ,  BINDER HORST

    IPC: C08K5/375 ,  C08K5/42 ,  C09D125/02 ,  C09D125/18 ,  C09D143/04 ,  G03F7/004 ,  G03F7/029 ,  G03F7/032 ,  G03F7/039 ,  H01L21/027

    Abstract: The invention relates to positive-working, radiation-sensitive mixtures essentially comprising (a1) an organic binder containing acid-labile groups which is insoluble in water, but becomes soluble in aqueous alkaline solutions on treatment with acid, or (a2.1) a polymeric binder which is insoluble in water, but soluble in aqueous alkaline solutions and (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by treatment with acid, and (b) an organic compound which produces an acid on exposure to actinic radiation and which additionally contain (c) a strongly basic, organic compound containing hydroxyl, alkoxy or phenoxy anions. These mixtures are suitable for the production of relief structures of improved contrast.

    6.
    发明专利
    未知

    公开(公告)号：DE19533607A1

    公开(公告)日：1997-03-13

    申请号：DE19533607

    申请日：1995-09-11

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  FUNHOFF DIRK DR ,  BINDER HORST

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F7/00

    Abstract: Positive-working radiation-sensitive mixt. is based on (a) polymer(s) contg. acid-labile gps., which are insol. in water and rendered soluble in aq. alkaline soln. by acid; (b) organic photo-acid(s); and (c) other organic cpd(s)., in which (a) comprises 35-70 mole-% 4-hydroxystyrene units (I), 30-50 mole-% 4-tetrahydropyran-2-yloxystyrene units (II) and 0-15 mole-% 4-vinylcyclohexanol units (III); (b) is 2-methyl-4-hydroxy-5-isopropyl-phenyl-dimethylsulphonium triflate (IV); and (c) is an organic ammonium deriv. (V) of (IV) or an analogue. In the formulae, R', R", R'" = 1-4 C alkyl; or R', R" = CH2 gps. linked to a 5-membered ring.

    7.
    发明专利
    未知

    公开(公告)号：DE19524812A1

    公开(公告)日：1997-01-09

    申请号：DE19524812

    申请日：1995-07-07

    Applicant: BASF AG

    Inventor： REICH WOLFGANG DR ,  BECK ERICH DR ,  JAEGER ULRICH DR ,  SCHWALM REINHOLD DR

    IPC: C07C68/02 ,  C07C69/96 ,  C08F2/48 ,  C08F2/50 ,  C08F20/26 ,  C08F20/28 ,  C08F8/00 ,  C08F20/20 ,  C07C229/30 ,  C07C68/00 ,  C07C227/06 ,  C07D319/12

    Abstract: Radiation-curable (meth)acrylates (I) are claimed, which are obtd. by reacting: (i) acylphenyl chloroformates of formula (II) with: (ii) hydroxy (meth)acrylates (III) contg. free hydroxy gp(s). and (meth)acryl gps. in the molecule: R-C(=O)-R (II) R = 1-4 C alkyl, aryl or R ; R = a substd. phenyl gp. of formula (IV); R - R = H, 1-4 C alkyl, 1-4 C alkoxy, OH, phenyl, SH, SCH3, SC2H5, F, Cl, Br, CN, COOH, COO-(1-17 C alkyl), COO-(5-10 C aryl), CF3, N(alkyl)2, N(alkyl)(aryl), N(aryl)2, N , or N H(alkyl)2A ; A = an anion; alkyl, aryl = 1-10 C alkyl and 5-10 C aryl, unless otherwise indicated; and 1-3 R - R gps. = -O-C(=O)-Cl. Also claimed are: (a) a process for the prodn. of radiation curable (meth)acrylate; and (b) use of radiation curable (meth)acrylate in radiation curable compsns..

    10.
    发明专利
    未知

    公开(公告)号：DE58906471D1

    公开(公告)日：1994-02-03

    申请号：DE58906471

    申请日：1989-05-10

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

    IPC: G03F7/023 ,  C08F8/00 ,  C08F12/22 ,  C08G8/28 ,  C08G8/36 ,  C08K5/372 ,  C08L25/18 ,  C08L61/08 ,  C09D125/18 ,  C09D161/08 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

    Abstract: The invention relates to positive-and negative-working radiation-sensitive mixtures and to processes for the formation of relief patterns. The radiation-sensitive mixtures contain a polymeric binder and an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid, and one additional grouping which forms a strong acid under the action of radiation, the polymeric binders used being reaction products of polymers containing phenolic hydroxyl groups with dihydropyran or alkyl vinyl ethers. These radiation-sensitive mixtures are particularly suitable for the formation of relief patterns.

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