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    RADIATION-SENSITIVE MIXTURE
    3.
    发明专利
    RADIATION-SENSITIVE MIXTURE 失效

    公开(公告)号：JPH03102356A

    公开(公告)日：1991-04-26

    申请号：JP21729290

    申请日：1990-08-20

    Applicant: BASF AG

    Inventor： FURIIDORITSUHI ZAITSU ,  EERITSUHI BETSUKU ,  YOOAHIMU ROOZAA ,  EREONOORE BIYUSHIYUGESU ,  GIYUNTAA SHIYURUTSU ,  TOOMASU TSUBUETSUTSU

    IPC: C08G18/28 ,  C08G18/32 ,  C08K5/09 ,  C08L33/02 ,  C08L35/00 ,  C08L75/02 ,  G03F7/027 ,  G03F7/038 ,  G03F7/039

    Abstract: PURPOSE: To enhance the photosensitivity and the development processability of a photosensitive layer and to render additional posttreatment unnecessary by using the mixture including a specified ureido-containing reaction product. CONSTITUTION: This mixture comprises the ureido-containing reaction product (A), and an ethylenically mono- or poly-unsaturated organic compound and a photopolymerization initiator or its composition to be selectively added, and the like. The compound (A) to be used is prepared by mixing a di- or poly- isocyanate compound and an organic compound having a primary or secondary amino group (a), and a hydroxy-group-having compound to be selectively added in a specified proportion and allowing each to react with each other, and as the compound (a), the compounds of the formula as shown on the right and the like are preferably, used and in the formula, R is an alkylene or arylene group and the like; R' is an H atom or an alkyl group or the like; and X is an O or S atom or the like.

    MANUFACTURE OF NEGATIVE RELIEF COPY
    4.
    发明专利
    MANUFACTURE OF NEGATIVE RELIEF COPY 失效

    公开(公告)号：JPH04226457A

    公开(公告)日：1992-08-17

    申请号：JP8834491

    申请日：1991-04-19

    Applicant: BASF AG

    Inventor： YOOAHIMU ROOZAA

    IPC: G03F7/004 ,  G03F7/022 ,  G03F7/023

    Abstract: PURPOSE: To produce a negative relief copy capable of preparing a reversible printing plate having the best required characteristic. CONSTITUTION: In a production of the negative relief copy, a reaction product from a) 50-99wt.% condensate of an oligomer or polymer obtained from a1 ) 0.5-1mol alkyl and/or alkoxy-substd. 1-3 valent hydroxybenzol, a2 ) 0-0.5mol phenol and a3 ) 0.5-1.5mol 1-12C carbonyl compd. and b) 1-50wt.% 1,2- naphtoquinone-2-diazide-4-sulfonic acid or -carboxylic acid or functional deriv. of these acid are incorporated in a photosensitive layer of a recording plate.

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