公开(公告)号：US3458312A

公开(公告)日：1969-07-29

申请号：US3458312D

申请日：1966-09-19

Applicant: IBM

Inventor： SRINIVASAN RANGASWAMY

IPC: C07C45/72 ,  C08G2/00 ,  G03F7/038 ,  G03C1/68 ,  G03F7/10

CPC classification number: G03F7/038 ,  C07C45/72 ,  C08G16/00 ,  C08G16/0206 ,  Y10S522/91

公开(公告)号：US3427241A

公开(公告)日：1969-02-11

申请号：US3427241D

申请日：1964-11-09

Applicant: IBM

Inventor： SRINIVASAN RANGASWAMY

IPC: C07C4/00 ,  C07C5/31 ,  C07C3/24 ,  C07C13/06 ,  C07C13/34

CPC classification number: C07C5/31 ,  C07C4/00 ,  C07C2601/04 ,  C07C2602/14 ,  Y10S204/912 ,  Y10S204/914 ,  C07C13/06 ,  C07C13/34

公开(公告)号：US3616361A

公开(公告)日：1971-10-26

申请号：US3616361D

申请日：1969-07-28

Applicant: IBM

Inventor： PICONE JANE M ,  SRINIVASAN RANGASWAMY

IPC: C07C47/293 ,  B01J19/12 ,  C07C45/00 ,  C07C47/28 ,  C07C67/00 ,  B01J1/10

CPC classification number: C07C45/60 ,  Y10S204/912 ,  C07C47/293 ,  C07C47/37

Abstract: THE CYCLOBUTANE CARBOXALDEHYDES THUS PRODUCED CAN BE UTILIZED AS HIGH-ENERGY FUELS. They can also be used as monomeric starting materials for preparing rigid polymers of the type shown and described in the publication to W. W. Moyes, et al., Journal Polymer Science, 1, 29 (1963).

Cyclobutane carboxaldehydes having the general formula: WHERE R1 and R2 can be H, CH3, OC2H5 and CHO, are prepared from a 3,4 dihydro-(2H)-pyran and its derivatives. A pyran derivative is exposed to actinic radiation for a time sufficient to cause the photoisomerization thereof into the corresponding cyclobutane carboxaldehydes. The reaction may be characterized as:

公开(公告)号：US3535137A

公开(公告)日：1970-10-20

申请号：US3535137D

申请日：1967-01-13

Applicant: IBM

Inventor： HALLER IVAN ,  HATZAKIS MICHAEL ,  SRINIVASAN RANGASWAMY

IPC: G03F7/039 ,  H01L21/00 ,  H01L23/29 ,  B44D1/50

CPC classification number: H01L21/00 ,  G03F7/039 ,  H01L23/293 ,  H01L2924/0002 ,  H01L2924/00

公开(公告)号：US3647656A

公开(公告)日：1972-03-07

申请号：US3647656D

申请日：1969-04-09

Applicant: IBM

Inventor： SRINIVASAN RANGASWAMY ,  HIRAOKA HIROYUKI

IPC: C07D315/00 ,  B01J1/10

CPC classification number: C07D315/00 ,  Y10S204/90

Abstract: 2-(O=),3-R-2,3-DIHYDROFURAN

ALPHA SUBSTITUTED B,$ UNSATURATED LACTONES HAVING THE GENERAL FORMULA

WHERE R IS AN ALKYL OR AROMATIC GROUP, IS PREPARED. AN ALKYL OR AROMATIC SUBSTITUTED ALKOXYFURAN IS IRRADIATED IN THE PRESENCE OF ACTINIC RADIATION EITHER IN THE VAPOR PHASE OF IN SOLUTION.

公开(公告)号：US3480441A

公开(公告)日：1969-11-25

申请号：US3480441D

申请日：1966-08-09

Applicant: IBM

Inventor： SRINIVASAN RANGASWAMY

IPC: C08J3/00 ,  C08L21/00 ,  C08L23/16 ,  C08L23/22 ,  G03F7/038 ,  G03C1/68

CPC classification number: G03F7/038 ,  C08J3/005 ,  C08J2321/00 ,  C08L9/00 ,  C08L9/06 ,  C08L21/00 ,  C08L23/22 ,  Y10S430/108 ,  C08L2666/08 ,  C08L21/02 ,  C08L9/08

公开(公告)号：AU598135B2

公开(公告)日：1990-06-14

申请号：AU1761588

申请日：1988-06-10

Applicant: IBM

Inventor： BLUM SAMUEL EMIL ,  SRINIVASAN RANGASWAMY ,  WYNNE JAMES JEFFREY

IPC: A61B17/00 ,  A61B18/20 ,  A61B18/26 ,  A61C1/00 ,  A61C17/00 ,  A61F9/008 ,  A61N5/06 ,  A61C15/00 ,  A61B17/32 ,  A61C3/00

公开(公告)号：CA1238690A

公开(公告)日：1988-06-28

申请号：CA440660

申请日：1983-11-08

Applicant: IBM

Inventor： BLUM SAMUEL E ,  SRINIVASAN RANGASWAMY ,  WYNNE JAMES J

IPC: A61B17/00 ,  A61B18/20 ,  A61B18/26 ,  A61C1/00 ,  A61C17/00 ,  A61F9/008 ,  A61N5/06 ,  A61B17/36

Abstract: YO982-087 FAR ULTRAVIOLET SURGICAL AND DENTAL PROCEDURES A method and apparatus are described for photoetching organic biological matter without requiring heat as the dominant etching mechanism. Farultraviolet radiation of wavelengths less than 200 nm are used to selectively remove organic biological material, where the radiation has an energy fluence sufficiently great to cause ablative photodecomposition. Either continuous wave or pulse radiation can be used, a suitable ultraviolet light source being an ArF excimer laser having an output at 193 nm. The exposed biological material is ablatively photodecomposed without heating or damage to the rest of the organic material. Medical and dental applications include the removal of damaged or unhealthy tissue from bone, removal of skin lesions, cutting or sectioning healthy tissue, and the treatment of decayed teeth.

公开(公告)号：CA1225362A

公开(公告)日：1987-08-11

申请号：CA436856

申请日：1983-09-16

Applicant: IBM

Inventor： BLUM SAMUEL E ,  BROWN KAREN H ,  SRINIVASAN RANGASWAMY

IPC: C01B33/113 ,  B01J19/12 ,  C01B33/12 ,  C04B41/50 ,  C04B41/87 ,  H01L21/316 ,  C23C20/08

Abstract: PROCESS FOR DEPOSITING METALLIC COPPER Metallic copper is deposited on a substrate by a process which involves confining the vapor of a fluorinated organic copper compound in an enclosed chamber containing the substrate, and decomposing the copper compound by means of irradiation with light.

公开(公告)号：DE3585018D1

公开(公告)日：1992-02-06

申请号：DE3585018

申请日：1985-10-17

Applicant: IBM

Inventor： BAUM THOMAS HALL ,  SRINIVASAN RANGASWAMY

IPC: H05K3/10 ,  C23C18/16 ,  H01L21/48 ,  H05K1/03 ,  H05K3/18 ,  G03F7/004

Abstract: An improved technique is described for the formation of conducting patterns on substrates. This technique has particular utility in the provision of "seeding" layers which are often used as catalysis for electroless deposition of an overlying metal layer. The seed layer is provided by casting a polymer containing a seed constituent onto a substrate, after which the polymer is ablatively photodecomposed by far UV radiation of wavelengths less than 400 nm and sufficient energy fluence to create ablative photodecomposition. This exposes the seed constituent in the polymer in the irradiated areas. Electroless plating of a metal can then occur, the plating being limited to only those areas which have been selectively exposed by the laser irradiation. Thus, a seed layer is prepared by dry processing, in contrast with previous techniques using plating solutions to provide the seed layer.