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公开(公告)号:DE3382340D1
公开(公告)日:1991-08-22
申请号:DE3382340
申请日:1983-08-02
Applicant: IBM
Inventor: FREEOUF JOHN LAWRENCE , JACKSON THOMAS NELSON , LAUX STEVEN ERIC , WOODALL JERRY MAC PHERSON
IPC: H01L29/80 , H01L21/338 , H01L29/772 , H01L29/812
Abstract: A semiconductor device employing two-dimensional space charge modulation in a semiconductor body 1 has an approximately Debye length wide ohmic contact 3 and a rectifying contact 2 positioned within a Debye length of the contact 3. Electrical conduction between the contact 3 and a remotely positioned contact 4 is controlled by the potential applied to the rectifying contact 2.
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公开(公告)号:DE3379091D1
公开(公告)日:1989-03-02
申请号:DE3379091
申请日:1983-02-01
Applicant: IBM
Inventor: JACKSON THOMAS NELSON , WOODALL JERRY MAC PHERSON
IPC: H01L29/73 , H01L21/331 , H01L21/338 , H01L29/205 , H01L29/76 , H01L29/778 , H01L29/80 , H01L29/812 , H01L29/10 , H01L29/72
Abstract: A majority carrier ballistic conduction transistor is fabricated with a built-indifference in barrier height ( DIAMETER a, DIAMETER b) between the emitter/base and collector/base interfaces by employing surface Fermi level pinning in a crystalline structure with three coplanar regions of different semiconductor materials. The central region base 3 has a thickness of the order of the mean free path of en electron. The materials of the external regions (2, 4) are such that there is a mismatch between the crystal spacing of the external regions and the central region which causes the Fermi level of the material in the central region to be pinned in the region of the conduction band at the interfaces with the external regions and the material of the external regions is selected so that the surface Fermi level is pinned in the forbidden region. A monocrystalline structure having an emitter region (2) of GaAs, a base region (3) of InAs or W 100Ato 500Athick and a collector region (4) of GainAs provides switching in the range of 10 seconds.
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公开(公告)号:DE3783162D1
公开(公告)日:1993-02-04
申请号:DE3783162
申请日:1987-05-26
Applicant: IBM
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公开(公告)号:DE3584994D1
公开(公告)日:1992-02-06
申请号:DE3584994
申请日:1985-06-14
Applicant: IBM
Inventor: BINNIG GERD KARL DR , FEENSTRA RANDALL MEINDERT , HODGSON RODNEY TREVOR , ROHRER HEINRICH DR , WOODALL JERRY MAC PHERSON
IPC: H01L21/3205 , C23C16/04 , H01J37/317 , H01J37/32 , H01L21/00
Abstract: The formation of lines (2) of the order of 0,8 nanometers wide is achieved using a tunneling current through a gas (6) that changes to provide a residue that is the basis of the line (2). The tunneling current energy is tuned to the energy required to dissociate the gas (6). The radius of the tunnel tip (3) and the tip (3)-to-substrate (1) distance (S) are of the order of less than ten nanometers.
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公开(公告)号:DE1274232B
公开(公告)日:1968-08-01
申请号:DEJ0034082
申请日:1967-07-07
Applicant: IBM
Inventor: RUPPRECHT HANS STEPHEN , WOODALL JERRY MAC PHERSON
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公开(公告)号:DE2964744D1
公开(公告)日:1983-03-17
申请号:DE2964744
申请日:1979-11-06
Applicant: IBM
Inventor: HODGSON RODNEY TREVOR , HOVEL HAROLD JOHN , WOODALL JERRY MAC PHERSON
IPC: H01L31/04 , H01L31/055 , H01L31/06
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