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    Sputter device.
    1.
    发明公开
    Sputter device. 失效
    雾化。

    公开(公告)号：EP0205874A2

    公开(公告)日：1986-12-30

    申请号：EP86106446

    申请日：1986-05-13

    Applicant: IBM

    Inventor： CUOMO JEROME JOHN ,  KAUFMAN HAROLD RICHARD ,  ROSSNAGEL STEPHEN MARK

    IPC: C23F4/00 ,  C23C14/35 ,  H01J37/34

    CPC classification number: H01J37/3405

    Abstract: A plasma sputter etching/deposition system comprising an electron-emitting hollow cathode arc- source 20 combined with a conventional plasma sputter etching/deposition system such as a magnetron 13, 17. The electrons emitted are coupled into the intrinsic high energy, e.g., magnetic filed 15 and are accelerated by the plasma potential and cause a significant increase plasma density. The resultant combination allows much greater sputtering/deposition efficiency than was possible with previous devices. According to a further aspect of the invention, switched operation is possible, whereby etching may vary from isotropic to anisotropic. A side discharge hollow cathode structure - (not shown) is also described for enhancing certain sputtering/deposition processes, wherein electrons may be emitted from one or more openings at the side of a hollow cathode chamber to achieve more uniform electron emission in a large process chamber.

    4.
    发明专利
    未知

    公开(公告)号：DE69206087D1

    公开(公告)日：1995-12-21

    申请号：DE69206087

    申请日：1992-08-14

    Applicant: IBM

    Inventor： CUOMO JEROME JOHN ,  GUARNIERI CHARLES RICHARD ,  HOENIG BRUCE ALBERT ,  SEKI HAKIME ,  SPEIDELL JAMES LOUIS ,  WHITEHAIR STANELY JOSEPH

    IPC: C23C16/01 ,  G02B1/10 ,  C23C16/00 ,  G02B5/30

    Abstract: Optical elements, and methods for fabricating them, are described wherein each element includes a free standing (self supporting) polycrystalline continuous thin film of diamond (101) combined with a non-hydrogenated amorphous diamond like carbon (DLC) film having a high percentage of sp bonding (104). These elements may be designed to have optically smooth surfaces, have wide optical transmission ranges (for example, be transparent across the infrared portion of the spectrum), and exhibit exceptional durability characteristics. Optical instruments that include such elements are also described, along with the derivative benefits, such as improved operating performance and lower maintenance requirements, realized using the novel optical elements. In particular, a polarization Michaelson interferometer (PMI) is taught which is operative over the entire range from far infrared into the visible portion of the spectrum without requiring the exchange of beam splitters or beam polarizers. These performance benefits are achieved as a result of the transmission characteristics of the novel optical elements associated with the PMI.

    7.
    发明专利
    未知

    公开(公告)号：DE3689428D1

    公开(公告)日：1994-02-03

    申请号：DE3689428

    申请日：1986-04-08

    Applicant: IBM

    Inventor： CUOMO JEROME JOHN ,  KAUFMAN HAROLD RICHARD ,  ROSSNAGEL STEPHEN MARK

    IPC: H01J37/077 ,  H01J1/02 ,  H01J3/02 ,  H01J37/073

    Abstract: A high current density hollow cathode electron beam source for use in various E-beam apparatus is described. Bombardment of an electron emissive surface within the hollow cathode by energetic gas ions causes electrons to be emitted by secondary emission rather than thermionic emission effects. Once initialized by an external ionization voltage the device is essentially self sustaining and operates near room temperature, rather than at thermionic emission temperatures, and with reduced voltages. … The drawing shows the hollow cathode into which plasma gas is introduced via port 40 and the electron beam exits via aperture 36 to grid 58. Ionization of the gas is initiated by voltage source 54 and the electron beam is sustained by voltage 57.

    COPPER TEXTURING PROCESS
    8.
    发明专利
    COPPER TEXTURING PROCESS 未知

    公开(公告)号：DE3366120D1

    公开(公告)日：1986-10-16

    申请号：DE3366120

    申请日：1983-10-21

    Applicant: IBM

    Inventor： CUOMO JEROME JOHN ,  LEARY PAMELA ANNE ,  YEE DENNIS SEK-ON

    IPC: B05D3/04 ,  C23C8/36 ,  C23F4/00 ,  H05K3/38 ,  C23C14/34 ,  C23C16/28 ,  C23C16/50 ,  C23F1/00

    Abstract: A room-temperature dry process for texturing the exposed copper surface of copper-polyester laminate, to improve adhesion of coatings to the copper surface through mechanical as well as chemical bonding, involves placing the laminate sample in a chamber, in which an iodine plasma is then produced by evacuating the chamber and backfilling with iodine and applying an RF potential. The iodine plasma includes both positive and negative iodine ions. Unprotected surface areas of the copper form a copper iodine; when the copper iodide is removed, the remaining surface is highly textured. The associated polyester is not damaged. The copper iodide is conveniently removed by a 10% hydrochloric acid solution which has no damaging effects on the associated polyester or on the metallic copper.

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