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    Illumination apparatus and inspection apparatus for sample
    1.
    发明专利
    Illumination apparatus and inspection apparatus for sample 有权
    照明装置和样品检验装置

    公开(公告)号：JP2011107149A

    公开(公告)日：2011-06-02

    申请号：JP2010290415

    申请日：2010-12-27

    Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー コーポレイション

    Inventor： VAEZ-IRAVANI MEHDI ,  ZHAO GUOHENG ,  STOKOWSKI STANLEY E

    IPC: G01N21/84 ,  G01N21/956 ,  G02B6/00 ,  G02B6/04 ,  G02B6/32 ,  G02B27/48 ,  G03F1/08 ,  H01L21/027

    CPC classification number: G02B27/48 ,  G02B6/0001 ,  G02B6/04

    Abstract: PROBLEM TO BE SOLVED: To provide a method for illuminating a sample during a sample inspection, for example, for finding defects, and to provide an apparatus for the method. SOLUTION: The illumination apparatus includes optical fiber bundles with respective first ends and second ends in a certain aspect. The illumination apparatus further includes an illumination selector so as to output one or more selected incident beams from the second ends corresponding to one or more fibers, by selectively transmitting one or more incident beams to the first ends corresponding to one or more selected incident beams. The illumination apparatus includes a lens arrangement for receiving one or more selected incident beams selected from one or more second ends corresponding to the fibers to introduce the selected incident beams toward the sample. The lens arrangement and the fibers are constituted with respect to one another so that the imaging plane of the sample is imaged at a second end of the fiber. The incident beams are laser beam in an aspect. In a specific exemplary application, the sample is selected from the group consisting of a semiconductor device, a semiconductor wafer, and a semiconductor reticle. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供在样品检查期间照亮样品的方法，例如用于发现缺陷，并提供该方法的装置。 解决方案：照明装置包括在某一方面具有各自的第一端和第二端的光纤束。 照明装置还包括照明选择器，以便通过选择性地将一个或多个入射光束选择性地传输到对应于一个或多个所选入射光束的第一端，输出来自对应于一个或多个光纤的第二端的一个或多个选定入射光束。 照明装置包括透镜装置，用于接收从与纤维相对应的一个或多个第二端中选择的一个或多个选定的入射光束，以将选定的入射光束引向样品。 透镜布置和光纤相对于彼此构成，使得样品的成像平面在光纤的第二端成像。 入射光束是一方面的激光束。 在具体的示例性应用中，样品选自半导体器件，半导体晶片和半导体掩模版。 版权所有（C）2011，JPO＆INPIT

    METHOD AND APPARATUS FOR INSPECTING A REFLECTIVE LITHOGRAPHIC MASK BLANK AND IMPROVING MASK QUALITY
    3.
    发明申请
    METHOD AND APPARATUS FOR INSPECTING A REFLECTIVE LITHOGRAPHIC MASK BLANK AND IMPROVING MASK QUALITY 审中-公开
    用于检查反射层状掩蔽层并提高掩蔽质量的方法和装置

    公开(公告)号：WO2012125581A3

    公开(公告)日：2012-12-27

    申请号：PCT/US2012028812

    申请日：2012-03-12

    Applicant: KLA TENCOR CORP ,  XIONG YALIN ,  STOKOWSKI STANLEY E

    Inventor： XIONG YALIN ,  STOKOWSKI STANLEY E

    IPC: G03F1/22 ,  G03F1/72 ,  G03F1/84

    CPC classification number: G03F1/24 ,  G03F1/72 ,  G03F1/84

    Abstract: An EUV integrated circuit fabrication method and system EUV that includes blank inspection, defect characterization, simulation, pattern compensation, modification of the mask writer database, inspection and simulation of patterned masks, and patterned mask repair. The system performs blank inspection to identify defects at multiple focal planes within the blank. The mask can be relocated on the blank and alterations to the pattern can be developed to compensate for the defects prior to prior to patterning the mask. Once the mask has been patterned, the reticle is inspected to identify any additional or remaining defects that were not picked up during blank inspection or fully mitigated through pattern compensation. The patterned reticle can then be repaired prior to integrated circuit fabrication.

    Abstract translation: EUV集成电路制造方法和系统EUV包括空白检查，缺陷表征，模拟，图案补偿，掩模写入器数据库的修改，图案化掩模的检查和模拟以及图案化掩模修复。 系统执行空白检查以识别空白中多个焦平面上的缺陷。 掩模可以重新定位在坯件上，并且可以开发对图案的改变以在图案化掩模之前补偿缺陷。 一旦掩模被图案化，检查掩模版以识别在空白检查期间未被拾取的任何附加或剩余的缺陷，或通过图案补偿完全减轻。 然后可以在集成电路制造之前修复图案化的掩模版。

    EFFICIENT PHASE DEFECT DETECTION SYSTEM AND METHOD
    4.
    发明申请
    EFFICIENT PHASE DEFECT DETECTION SYSTEM AND METHOD 审中-公开
    有效的相位缺陷检测系统及方法

    公开(公告)号：WO02091026A3

    公开(公告)日：2003-04-03

    申请号：PCT/US0214173

    申请日：2002-05-02

    Applicant: KLA TENCOR CORP

    Inventor： KRANTZ MATTHIAS C ,  WIHL MARK JOSEPH ,  STOKOWSKI STANLEY E

    IPC: G01N21/956 ,  G03F1/26 ,  G03F1/84 ,  G01N21/88

    CPC classification number: G03F1/84 ,  G01N21/95607 ,  G03F1/26

    Abstract: Inspection of photomasks for defects in phase-shifters is enhanced using optical techniques based on multiple modified radiation collection techniques, which allows allow for errors in phase-shifters to be more accurately detected. The system includes an illumination system (105), at least on collection system (107R, 107T), and a data analysis section (108). In one embodiment, the intensities of two slightly defocused images of phase objects corresponding to the same photomask location are compared. In a second embodiment, radiation having two Zernike point spread functions is used to obtain two slightly different phase sensitive images. Data collected and analyzed by the data analysis section (108) using this method provides much greater sensitivity to phase objects and errors in phase objects than prior art inspection systems. Embodiments include both scanning-type and projector type optical architectures and may utilize radiation transmitted or reflected by a sample.

    Abstract translation: 使用基于多个改进的辐射采集技术的光学技术来增强对移相器中的缺陷的光掩模的检查，这允许更精确地检测移相器中的错误。 该系统包括至少在收集系统（107R，107T）和数据分析部分（108）上的照明系统（105）。 在一个实施例中，比较对应于相同光掩模位置的相位物体的两个稍微散焦的图像的强度。 在第二实施例中，使用具有两个泽尼克点扩散函数的辐射来获得两个稍微不同的相位敏感图像。 使用这种方法由数据分析部分（108）收集和分析的数据比现有技术的检查系统对相位对象和相位对象的误差提供了更大的灵敏度。 实施例包括扫描型和投影仪型光学架构，并且可以利用由样本传输或反射的辐射。

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