A VDMOS transistor protected against overvoltages between source and gate
    5.
    发明公开
    A VDMOS transistor protected against overvoltages between source and gate 失效
    一种集成电路,包括一个VDMOS晶体管,其对源极和栅极之间的过电压保护

    公开(公告)号:EP0936674A1

    公开(公告)日:1999-08-18

    申请号:EP98830056.2

    申请日:1998-02-10

    CPC classification number: H01L27/0251 H01L29/0619 H01L29/7809 H01L29/7811

    Abstract: The n-channel VDMOS transistor described is formed in an n-type active region of an integrated circuit with junction isolation. To prevent over-voltages between source and gate which could damage or destroy the gate dielectric, a p-channel MOS transistor is formed in the same active region (13) and has its gate electrode connected to the gate electrode (17) of the VDMOS transistor, its source region in common with the source region (9) of the VDMOS transistor, and its drain region (30, 31) connected to the p-type junction-isolation region (14). The p-channel MOS transistor has a threshold voltage below the breakdown voltage of the gate dielectric of the VDMOS transistor so that it acts as a voltage limiter.

    Abstract translation: 描述n沟道晶体管VDMOS与结隔离集成电路的n型有源区中形成。 为了防止源极和栅极,从而损坏或破坏栅极电介质之间的过电压,p沟道MOS晶体管以相同的有源区域(13)形成,并且具有VDMOS的连接到栅极电极(17)的栅电极 晶体管,连接到p型结隔离区(14)与所述VDMOS晶体管的源极区域(9)共同其源极区域,漏极区域(30,31)。 p沟道MOS晶体管具有VDMOS晶体管的栅极电介质的击穿电压低于阈值电压,从而没它充当电压限制器。

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