Abstract:
A semiconductor electronic device is described comprising a die (2) of semiconductor material having a plurality of contact pads (3,8) electrically connected to a support for example through interposition of contact wires, said plurality of contact pads (3,8) comprising signal pads (8) and power pads (3), the device being characterised in that said signal pads (8) are implemented on the die (2) of semiconductor material with a mutual pitch (P2) lower than the pitch (P1) between said power pads (3), and in that the upper metallic layer of the signal pads is thinner than that of the power pads.
Abstract:
The n-channel VDMOS transistor described is formed in an n-type active region of an integrated circuit with junction isolation. To prevent over-voltages between source and gate which could damage or destroy the gate dielectric, a p-channel MOS transistor is formed in the same active region (13) and has its gate electrode connected to the gate electrode (17) of the VDMOS transistor, its source region in common with the source region (9) of the VDMOS transistor, and its drain region (30, 31) connected to the p-type junction-isolation region (14). The p-channel MOS transistor has a threshold voltage below the breakdown voltage of the gate dielectric of the VDMOS transistor so that it acts as a voltage limiter.