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    CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR OPERATING THE SAME
    91.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR OPERATING THE SAME 审中-公开
    充电颗粒光束装置及其操作方法

    公开(公告)号：WO2004066331A2

    公开(公告)日：2004-08-05

    申请号：PCT/EP2004/000370

    申请日：2004-01-19

    Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  ADAMEC, Pavel ,  DEGENHARDT, Ralf ,  FEUERBAUM, Hans-Peter ,  MUNACK, Harry ,  WINKLER, Dieter

    Inventor： ADAMEC, Pavel ,  DEGENHARDT, Ralf ,  FEUERBAUM, Hans-Peter ,  MUNACK, Harry ,  WINKLER, Dieter

    IPC: H01J

    CPC classification number: H01J37/285 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/049 ,  H01J2237/2855 ,  H01J2237/2857

    Abstract: A charged particle beam apparatus is provided which comprises a charged particle source (1) for producing a primary beam of charged particles, aperture means (2) for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample (8) as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample (8), a condenser lens (3) for condensing said primary beam of charged particles, scanning means (5) for deflecting said primary beam of charged particles, an objective lens (6) for focusing said condensed primary beam, a sectorized detector (7) for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

    Abstract translation: 提供带电粒子束装置，其包括用于产生带电粒子的一次束的带电粒子源（1），用于准直所述带电粒子的一次束的孔口装置（2），其中所述孔口装置适于在准直 的所述主光束适合于样品（8）的串行成像的宽度以及所述主光束的准直到适合于所述样品（8）的平行成像的宽度;聚光透镜（3），用于冷凝所述主光束 带电粒子束，用于偏转所述带电粒子的一次束的扫描装置（5），用于聚焦所述冷凝的主光束的物镜（6），用于检测次级带电粒子的扇形检测器（7）。 此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

    MULTIPLE ELECTRON BEAM DEVICE
    92.
    发明申请
    MULTIPLE ELECTRON BEAM DEVICE 审中-公开
    多电子束装置

    公开(公告)号：WO2003032361A1

    公开(公告)日：2003-04-17

    申请号：PCT/EP2002/011135

    申请日：2002-10-04

    Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  WINKLER, Dieter ,  ADAMEC, Pavel ,  GÖHL, Achim ,  BANZHOF, Helmut

    Inventor： WINKLER, Dieter ,  ADAMEC, Pavel ,  GÖHL, Achim ,  BANZHOF, Helmut

    IPC: H01J37/304

    CPC classification number: H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/216 ,  H01J2237/2446 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/3045

    Abstract: The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.

    Abstract translation: 本发明提供了用于用具有电子束源阵列（3）的一次电子束（14）探测或构造非透明样品（20）以产生多个一次电子束（14）的电子多光束装置（1）， 具有电子传感器段（12a）的电子传感器（12），用于检测一次电子束（14）的电子和至少一个阳极（7）以将一次电子束（14）引向电子传感器（12）。 电子传感器（12）用于检查一次电子束（14），校准一次电子束（14）的位置，并可能在探测之前或之后校准一次电子束的最终聚焦长度（13）和电流 构造不透明样品（20）的上表面（20a）。 此外，提供了检查一次电子束（14），调整最终聚焦长度（13）和校准多个电子束装置（1）的方法。

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