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    SYSTEM FOR DIRECTLY MEASURING THE DEPTH OF A HIGH ASPECT RATIO ETCHED FEATURE ON A WAFER
    92.
    发明公开
    SYSTEM FOR DIRECTLY MEASURING THE DEPTH OF A HIGH ASPECT RATIO ETCHED FEATURE ON A WAFER 审中-公开
    SYSTEM FOR在晶圆深度蚀刻的特征宽高比高的直接测定

    公开(公告)号：EP2446468A4

    公开(公告)日：2016-01-20

    申请号：EP10792434

    申请日：2010-06-14

    Applicant: RUDOLPH TECHNOLOGIES INC

    Inventor： MARX DAVID S ,  GRANT DAVID L

    IPC: H01L21/66 ,  G01B11/22

    CPC classification number: G01B11/22 ,  G01B2210/56

    Abstract: A system (10) for directly measuring the depth of a high aspect ratio etched feature on a wafer (80) that includes an etched surface (82) and a non-etched surface (84). The system (10) utilizes an infrared reflectometer (12) that in a preferred embodiment includes a swept laser (14), a fiber circulator (16), a photodetector (22) and a combination collimator (18) and an objective lens (20). From the objective lens (20) a focused incident light (23) is produced that is applied to the non-etched surface (84) of the wafer (80). From the wafer (80) is produced a reflected light (25) that is processed through the reflectometer (12) and applied to an ADC (24) where a corresponding digital data signal (29) is produced. The digital data signal (29) is applied to a computer (30) that, in combination with software (32), measures the depth of the etched feature that is then viewed on a display (34).

    DUAL PHOTO-ACOUSTIC AND RESISTIVITY MEASUREMENT SYSTEM
    93.
    发明公开
    DUAL PHOTO-ACOUSTIC AND RESISTIVITY MEASUREMENT SYSTEM 审中-公开
    双光声和电阻率测量系统

    公开(公告)号：EP1869430A2

    公开(公告)日：2007-12-26

    申请号：EP06739420.5

    申请日：2006-03-22

    Applicant: RUDOLPH TECHNOLOGIES, INC.

    Inventor： WOLF, R., Gregory

    IPC: G01N21/00

    CPC classification number: G01R31/2858 ,  G01N21/1702 ,  G01N21/9501 ,  G01N2021/1706 ,  G01R31/2831 ,  G01R31/311

    Abstract: A measurement system for measuring aspects of a wafer combines an apparatus for performing a conductivity measurement, such as a four-point probe system, with apparatus for performing an optical measurement, such as a photoacoustic measurement system. Results are obtained and combined to provide comprehensive data sets describing the characteristics of the thin film substrate therein.

    Abstract translation: 用于测量晶片方面的测量系统将用于执行电导率测量的装置（诸如四点探针系统）与用于执行光学测量的装置（诸如光声测量系统）组合。 结果被获得并被组合以提供描述其中的薄膜基板的特性的综合数据集。

    BLADE FOR SUBSTRATE EDGE PROTECTION DURING PHOTOLITHOGRAPHY
    96.
    发明公开
    BLADE FOR SUBSTRATE EDGE PROTECTION DURING PHOTOLITHOGRAPHY 审中-公开
    刀片基材边缘时的光刻

    公开(公告)号：EP2904457A1

    公开(公告)日：2015-08-12

    申请号：EP13776905.5

    申请日：2013-10-02

    Applicant: RUDOLPH TECHNOLOGIES, INC.

    Inventor： GARDNER, Steven, D. ,  DONAHER, J., Casey

    IPC: G03F7/20

    CPC classification number: G03F7/70733 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/707

    Abstract: An apparatus protects a portion of a peripheral region (310) of a photoresist-coated surface of a substrate (308) from light exposure. The apparatus includes a blade (502, 512, 522, 532) that can move, or that can move and rotate, and a drive assembly (504, 514, 524, 534) operably coupled to the blade. In response to at least one first drive force generated by the drive assembly, the blade translates, rotates, or translates and rotates, such that the blade is disposed above a portion of the peripheral region. In response to at least one second drive force generated by the drive assembly, the blade translates, rotates, or rotates and translates, such that the blade is not disposed above a portion of the peripheral region. In a step-and-repeat lithographic system, the blade covers a portion of the peripheral region, and the adjacent portion of the substrate is exposed to light.

    MULTIPLE-BLADE DEVICE FOR SUBSTRATE EDGE PROTECTION DURING PHOTOLITHOGRAPHY
    97.
    发明公开
    MULTIPLE-BLADE DEVICE FOR SUBSTRATE EDGE PROTECTION DURING PHOTOLITHOGRAPHY 审中-公开
    VORRICHTUNG MIT MEHREREN KLINGENFÜRSUBSTRATKANTENSCHUTZWÄHRENDEINER PHOTOLITHOGRAFIE

    公开(公告)号：EP2904456A1

    公开(公告)日：2015-08-12

    申请号：EP13774915.6

    申请日：2013-10-02

    Applicant: RUDOLPH TECHNOLOGIES, INC.

    Inventor： GREER, James ,  VALOIS, Michael, H. ,  DONAHER, Casey, J.

    IPC: G03F7/20

    CPC classification number: G03F7/70733 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/707

    Abstract: An apparatus (1100) for protecting at least a portion of a peripheral region of a photoresist-coated surface of a substrate from light exposure. The apparatus includes two or more movable blades (1102) and a drive assembly (1112, 1114) operably coupled to the movable blades. In response to at least one first drive force generated by the drive assembly, the movable blades translate such that the movable blades are disposed above at least a portion of the peripheral region. In response to at least one second drive force generated by the drive assembly, the movable blades translate such that the movable blades are not disposed above a portion of the peripheral region.

    Abstract translation: 一种装置保护基底（308）的光致抗蚀剂涂覆的表面的外围区域（310）的一部分免受曝光。 该装置包括可移动或可以移动和旋转的叶片（502,512,522,532）以及可操作地联接到叶片的驱动组件（504,514,524,534）。 响应于由驱动组件产生的至少一个第一驱动力，叶片平移，旋转或平移和旋转，使得叶片设置在周边区域的一部分上方。 响应于由驱动组件产生的至少一个第二驱动力，叶片平移，旋转或旋转和平移，使得叶片不设置在周边区域的一部分上方。 在步进重复光刻系统中，刀片覆盖周边区域的一部分，并且衬底的相邻部分暴露于光。

    POSITION SENSITIVE DETECTION OPTIMIZATION
    98.
    发明公开
    POSITION SENSITIVE DETECTION OPTIMIZATION 审中-公开
    位置敏感的检测优化

    公开(公告)号：EP2668477A1

    公开(公告)日：2013-12-04

    申请号：EP12739797.4

    申请日：2012-01-27

    Applicant: Rudolph Technologies, Inc.

    Inventor： MEHENDALE, Manjusha ,  KOTELYANSKII, Michael ,  MUKUNDHAN, Priya ,  COLGAN, Michael ,  ZHOU, Wei

    IPC: G01J1/44

    Abstract: An automatically adjustable method for use in opto-acoustic metrology or other types of metrology operations is described. The method includes modifying the operation of a metrology system that uses a PSD style sensor arrangement. The method may be used to quickly adjust the operation of a metrology system to ensure that the data obtained therefrom are of the desired quality. Further, the method is useful in searching for and optimizing data that is or can be correlated to substrate or sample features or characteristics that of interest. Apparatus and computer readable media are also described.

    METHOD AND APPARATUS FOR INCREASING SIGNAL TO NOISE RATIO IN A PHOTOACOUSTIC FILM THICKNESS MEASUREMENT SYSTEM
    100.
    发明公开
    METHOD AND APPARATUS FOR INCREASING SIGNAL TO NOISE RATIO IN A PHOTOACOUSTIC FILM THICKNESS MEASUREMENT SYSTEM 有权
    方法和装置提高了信号/噪声比光声薄膜厚度测量系统

    公开(公告)号：EP1417450A4

    公开(公告)日：2009-06-10

    申请号：EP02775693

    申请日：2002-07-12

    Applicant: RUDOLPH TECHNOLOGIES INC

    Inventor： MORATH CHRISTOPHER ,  STONER ROBERT J

    IPC: G01B11/06 ,  G01B11/28

    CPC classification number: G01B11/0666 ,  G01B11/28 ,  G01N21/1702 ,  G01N2021/1706

    Abstract: An apparatus for improving the signal to noise ratio of measurements of the thickness of layers in a thin film stack uses a photoacoustic measurement system that includes a time differentiation system for inducing a delay in pump beam pulses. The time differentiation system uses, among other things, a birefringent element and other elements to control the polarization of pump beam pulses. Use of the apparatus involves applying a time varying voltage to an electro-optic modulator driver and setting a time differentiation step; or, in another embodiment, applying a time varying voltage to an electro-optic modulator to induce a fixed time delay delta-t between a vertically polarized pulse and a horizontally polarized pulse. The high frequency operation of the system provides for improved determinations of film thickness.

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