Abstract:
A method and apparatus for testing unpackaged semiconductor dice includes a mother board (10) and a plurality of interconnects (12) mounted on the mother board (10) and adapted to establish a temporary electrical connection with the dice (14). The interconnects (12) can be formed with a silicon substrate (20) and raised contact members (16) for contacting the bond pads (22) of a die (14). Alternately the interconnects (16) can be formed with micro bump contact members (16) mounted on an insulating film (74). The mother board (10) allows each die (14) to be tested separately for speed and functionality and to also be burn-in tested in parallel using standard burn-in ovens. In an alternate embodiment testing is performed using a mother board/daughter board arrangement. Each daughter board (82) includes interconnects (12) that allow the dice (14) to be tested individually for speed and functionality. Multiple daughter boards (82) can then be mounted to the mother board (10) for burn-in testing using standard burn-in ovens.
Abstract:
A programmable non-volatile memory device includes a memory array of addressable memory cells and multiple redundant memory cells for replacing defective memory cells in the memory array. To program the memory device, data is written to one or more of the addressable memory cells in the memory array. In the event that the data is not validly written into the address memory cells, repeated attempts are made to program the same memory cells. The memory device includes a counter for counting the number of times the same memory cells are accessed for programming purposes. When a predetermined number of such programming cycles is achieved, the address memory cells are determined to be defective. A redundancy address matching circuit is enabled at this point to replace the defective memory cells with redundant memory cells that can be validly programmed. The memory device subsequently routes the data to the redundant memory cells instead of the defective memory cells. A system including a programming machine and the programmable non-volatile memory device, and methods for programming such memory devices, are also disclosed.
Abstract:
A method of forming a transistor in a peripheral circuit of a random access memory device (DRAM) or a static random access memory device (SRAM) wherein a transistor gate, capacitor electrode or other component in the memory cell array is formed simultaneously with the formation of a transistor gate in the periphery.
Abstract:
An integrated circuit memory device is designed for high speed data access and for compatibility with existing memory systems. An address strobe signal is used to latch a first address. During a burst access cycle the address is incremented internal to the device with additional address strobe transitions. A new memory address is only required at the beginning of each burst access. Read/Write commands are issued once per burst access eliminating the need to toggle the Read/Write control line at the device cycle frequency. A transition of the Read/Write control line during a burst access is used to terminate the burst access, reset the burst length counter and initialize the device for another burst access. Write cycle times are maximized to allow for increases in burst mode operating frequencies.
Abstract:
This invention is a process for manufacturing dynamic random access memories using stacked container capacitor cells in a split-polysilicon CMOS manufacturing flow. The split-polysilicon flow denotes that N-channel and P-channel transistor gates are formed from a single conductive layer (typically a doped polysilicon layer) using separate masking steps. The focus of this invention is a CMOS manufacturing process flow which permits P-channel source/drain doping subsequent to capacitor formation. A main feature of the process is the deposition and planarization of a thick insulative mold layer subsequent to N-channel device patterning, but prior to P-channel device patterning. In one embodiment of the process, portions of this insulative layer overlying the P-channel transistor regions are removed during the storage-node contact etch. Thus, a low-aspect-ratio etch can be employed to pattern P-channel devices, and a blanket P+ implant may be performed without implanting the P-type impurity into source/drain regions of the N-channel devices. Another important feature of the invention is the incorporation of P-channel gate sidewall spacers and offset P-channel implants into the process flow.
Abstract:
A multi-port memory device includes a row-column array, a random access port, a plurality of bidirectional serial access memory (SAM) ports, and a switching network for coupling SAM ports to sets of columns. A column is defined as a number of memory cells sharing a sense amplifier. Sets of columns are defined in one rectangular region or among several rectangular regions of the array. The switching network selectively couples each SAM port with each set, each set with each other set, and each SAM port with each other SAM port. A video random access memory (VRAM) or a multi-port dynamic random access memory (DRAM) of the present invention provides increased flexibility in smaller die area.
Abstract:
For use in a semiconductor circuit device, a uniquely-arranged tri-state output buffer (12) responds to a control signal generated in the semiconductor circuit device and a below-ground voltage level at an output terminal to prevent wasted drain current and substrate current, and reduce capacitance at the pull-up node driving the output terminal. The output buffer includes a power supply signal providing at least one voltage level with respect to common; an output terminal; a first circuit responding to the control signal by providing a first control voltage on a pull-up node; and a second circuit responding to the control signal by providing a second control voltage on a pull-down node. Further, the output buffer includes a pull-up transistor (60), responsive to the voltage on the pull-up node and coupled between the power supply signal and the output terminal; a pull-down transistor (50), responsive to the voltage on the pull-down node and coupled between common and the output terminal.
Abstract:
To compensate for leakage current resulting from parasitic resistance, an integrated circuit device includes a boosting current pump (30) to continuously boost the input of an NMOS output circuit (24) so long as the output circuit is providing a logic high output signal. The NMOS output circuit (24) has an input for receiving an input signal and an output for driving at least one output signal line. An oscillation circuit (22) provides an oscillating digital signal to the boosting current pump (30). The pump (30) responds to the oscillating digital signal and to the input signal being in one of two predetermined states to provide additional current at the input of the NMOS output circuit (24) to compensate for the leakage current.
Abstract:
A memory register file array addressable in both word and doubleword format has memory cells of a feedback-type latch variety, having at least two tri-state inverter paths (WP1 and WP2) for the input of data, and at least two tri-state inverter paths (RP1, RP2 and RP3) for the output of data. A tri-state inverter (53) provides the feedback within each array cell. This feedback inverter is tri-stated during each write operation, thus increasing circuit speed and permitting simultaneous read and write operations to be performed on the same cell during a single machine cycle. Error correction is performed during format decode and format operations so that error correction code (ECC) syndrome bit generation can occur in parallel with formatting. Improved clocking operations maintain symmetry of the register file clock signals and provide high clock skew tolerance. Tri-state isolation buffers (4, 5, 6, 7, 8 and 9) are used to reduce read access time.
Abstract:
An output driver circuit is described which offers control and logic level adjustment for high speed data communications in a synchronous memory such as a synchronous dynamic random access memory (SDRAM). Level adjustment is obtained by resistive division between a termination resistor and controllable impedances between an output node and VDD and VSS power supplies. Control functions include slew rate modification of the signal at the output node, by sequentially turning on or off output transistors in response to a transition in an input signal. Different schemes of weighting the output transistors obtain different characteristics of the output signal. Load matching circuitry and voltage level forcing circuitry are described for improving high frequency operation.