DEVICES HAVING AN ELECTRON EMITTING STRUCTURE
    93.
    发明申请
    DEVICES HAVING AN ELECTRON EMITTING STRUCTURE 审中-公开
    具有电子发射结构的装置

    公开(公告)号:US20150092923A1

    公开(公告)日:2015-04-02

    申请号:US14385503

    申请日:2013-03-14

    Abstract: The disclosure relates to an image capture device comprising an electron receiving construct and an electron emitting construct, and further comprising an inner gap providing an unobstructed space between the electron emitting construct and the electron receiving construct. The disclosure further relates to an x-ray emitting device comprising an x-ray emitting construct and an electron emitting construct, said x-ray emitting construct comprising an anode, the anode being an x-ray target, wherein the x-ray emitting device may comprise an inner gap providing an unobstructed space between the electron emitting construct and the x-ray emitting construct. The disclosure further relates to an x-ray imaging system comprising an image capture device and an x-ray emitting device.

    Abstract translation: 本公开涉及包括电子接收构造体和电子发射构造物的图像捕获装置,并且还包括在电子发射构造体和电子接收构造体之间提供无障碍空间的内部间隙。 本发明还涉及一种包括x射线发射结构和电子发射结构的x射线发射器件,所述x射线发射结构包括阳极,阳极是x射线靶,其中x射线发射器件 可以包括提供电子发射构造体和x射线发射结构之间的无障碍空间的内部间隙。 本公开还涉及包括图像捕获装置和x射线发射装置的X射线成像系统。

    Ion beam system and method of operating ion beam system
    94.
    发明授权
    Ion beam system and method of operating ion beam system 有权
    离子束系统和操作离子束系统的方法

    公开(公告)号:US08710451B2

    公开(公告)日:2014-04-29

    申请号:US13251174

    申请日:2011-09-30

    Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having a plurality of first defection electrodes 51a, 51b, 51c and a plurality of second deflection electrodes 52a, 52b, 52c wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plurality of second deflection electrodes such that electric deflection fields between the plurality of second deflection electrodes and the plurality of opposite first deflection electrodes have a common orientation. The ion beam system has a high kinetic energy mode in which a distribution of the electric deflection fields has a greater width, and a low kinetic energy mode in which a distribution of the electric deflection fields has a smaller width.

    Abstract translation: 离子束系统包括电压供应系统7和具有多个第一偏移电极51a,51b,51c和多个第二偏转电极52a,52b,52c的至少一个光束偏转器39,其中电压供应系统被配置为供应 对多个第二偏转电极的不同的可调偏转电压使得多个第二偏转电极和多个相对的第一偏转电极之间的电偏转场具有共同的取向。 离子束系统具有高动能模式,其中电偏转场的分布具有较大的宽度,以及低动能模式,其中电偏转场的分布具有较小的宽度。

    Method and apparatus for improved uniformity control with dynamic beam shaping
    95.
    发明授权
    Method and apparatus for improved uniformity control with dynamic beam shaping 有权
    用于改进动态光束成形的均匀性控制的方法和装置

    公开(公告)号:US08653486B2

    公开(公告)日:2014-02-18

    申请号:US13713251

    申请日:2012-12-13

    Inventor: Edward C. Eisner

    Abstract: The present invention relates to a method and apparatus for varying the cross-sectional shape of an ion beam, as the ion beam is scanned over the surface of a workpiece, to generate a time-averaged ion beam having an improved ion beam current profile uniformity. In one embodiment, the cross-sectional shape of an ion beam is varied as the ion beam moves across the surface of the workpiece. The different cross-sectional shapes of the ion beam respectively have different beam profiles (e.g., having peaks at different locations along the beam profile), so that rapidly changing the cross-sectional shape of the ion beam results in a smoothing of the beam current profile (e.g., reduction of peaks associated with individual beam profiles) that the workpiece is exposed to. The resulting smoothed beam current profile provides for improved uniformity of the beam current and improved workpiece dose uniformity.

    Abstract translation: 本发明涉及一种用于在离子束在工件的表面上扫描时改变离子束截面形状的方法和装置,以产生具有改进的离子束电流分布均匀性的时间平均离子束 。 在一个实施例中,离子束的横截面形状随着离子束移动穿过工件表面而变化。 离子束的不同横截面形状分别具有不同的光束轮廓(例如,沿着光束轮廓在不同位置处具有峰值),使得快速改变离子束的横截面形状导致光束电流的平滑 工件暴露于的轮廓(例如,减小与各个梁轮廓相关联的峰)。 所得到的平滑光束电流分布提供了改进的束电流均匀性和改进的工件剂量均匀性。

    FIELD EMISSION X-RAY TUBE AND METHOD OF FOCUSING ELECTRON BEAM USING THE SAME
    96.
    发明申请
    FIELD EMISSION X-RAY TUBE AND METHOD OF FOCUSING ELECTRON BEAM USING THE SAME 有权
    现场排放X射线管及使用该方法聚焦电子束的方法

    公开(公告)号:US20130336459A1

    公开(公告)日:2013-12-19

    申请号:US13829130

    申请日:2013-03-14

    Abstract: Provided is a field emission X-ray tube. The field emission X-ray tube includes a cathode electrode provided on one end of a vacuum container, including a field emission emitter; a gate electrode provided inside the vacuum container to be adjacent to the cathode electrode, including a first opening; a focusing electrode electrically connected to the gate electrode and provided on one surface of the gate electrode to be farther from the cathode electrode than the gate electrode while including a second opening with a greater width than that of the first opening; and an anode electrode provided inside the vacuum container on another end thereof in a direction where the vacuum container is extended. A height of the focusing electrode is identical to the width of the second opening, and wherein the width of the first opening is ⅓ or less of the second opening.

    Abstract translation: 提供场发射X射线管。 场发射X射线管包括设置在真空容器的一端的阴极,包括场致发射体; 设置在所述真空容器内的与所述阴极电极相邻的栅电极,包括第一开口; 电极连接到所述栅电极并且设置在所述栅电极的一个表面上以比所述栅电极更远离所述阴极的聚焦电极,同时包括具有比所述第一开口的宽度更大的第二开口; 以及在真空容器延伸的方向的另一端设置在真空容器的内部的阳极电极。 聚焦电极的高度与第二开口的宽度相同,并且其中第一开口的宽度是第二开口的1/3以下。

    SYSTEM AND METHOD FOR AUTOMATED CYCLOTRON PROCEDURES
    97.
    发明申请
    SYSTEM AND METHOD FOR AUTOMATED CYCLOTRON PROCEDURES 有权
    自动循环程序的系统和方法

    公开(公告)号:US20130303824A1

    公开(公告)日:2013-11-14

    申请号:US13887071

    申请日:2013-05-03

    Abstract: Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization of a cyclotron after overnight or maintenance imposed shutdown. In one embodiment, five independent cyclotron system states are defined and the transition between one state to another may be automated, e.g., by the control system of the cyclotron. According to these embodiments, it is thereby possible to achieve beam operation after shutdown with minimal manual input. By applying an automatic procedure, all active devices of the cyclotron (e.g., RF system, extraction deflectors, ion source) are respectively ramped to predefined parameters.

    Abstract translation: 提供系统和方法来执行有效的自动回旋加速器初始化,校准和波束调整。 提供了一个过程,允许自动化过夜后的回旋加速器的初始化或维护关闭。 在一个实施例中,定义了五个独立的回旋加速器系统状态,并且一个状态与另一个状态之间的转换可以例如由回旋加速器的控制系统自动化。 根据这些实施例,由此可以在最少的手动输入之后实现停机后的光束操作。 通过应用自动程序,回旋加速器的所有有源装置(例如,RF系统,提取偏转器,离子源)分别斜坡到预定参数。

    SYSTEM AND METHOD FOR AUTOMATED CYCLOTRON PROCEDURES
    99.
    发明申请
    SYSTEM AND METHOD FOR AUTOMATED CYCLOTRON PROCEDURES 有权
    自动循环程序的系统和方法

    公开(公告)号:US20120223246A1

    公开(公告)日:2012-09-06

    申请号:US13225045

    申请日:2011-09-02

    Abstract: Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization of a cyclotron after overnight or maintenance imposed shutdown. In one embodiment, five independent cyclotron system states are defined and the transition between one state to another may be automated, e.g., by the control system of the cyclotron. According to these embodiments, it is thereby possible to achieve beam operation after shutdown with minimal manual input. By applying an automatic procedure, all active devices of the cyclotron (e.g., RF system, extraction deflectors, ion source) are respectively ramped to predefined parameters.

    Abstract translation: 提供系统和方法来执行有效的自动回旋加速器初始化,校准和波束调整。 提供了一个过程,允许自动化过夜后的回旋加速器的初始化或维护关闭。 在一个实施例中,定义了五个独立的回旋加速器系统状态,并且一个状态与另一个状态之间的转换可以例如由回旋加速器的控制系统自动化。 根据这些实施例,由此可以在最少的手动输入之后实现停机后的光束操作。 通过应用自动程序,回旋加速器的所有有源装置(例如,RF系统,提取偏转器,离子源)分别斜坡到预定参数。

    Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same
    100.
    发明授权
    Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same 有权
    用多微柱和多微柱控制电子束的方法

    公开(公告)号:US08173978B2

    公开(公告)日:2012-05-08

    申请号:US11571695

    申请日:2005-07-05

    Abstract: Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n×m matrix. A voltage is uniformly or differentially applied to each electron emitter or extractor. The same control voltage or different voltages are applied to a region at coordinates in a control division area of each extractor to deflect the electron beams. Lens layers not corresponding to the extractors are collectively or individually controlled so as to efficiently control the electron beams of the unit microcolumn. Further, a multi-microcolumn using the method is provided.

    Abstract translation: 提供了一种用于控制多微柱中的电子束的方法,其中具有电子发射器,透镜和偏转器的单元微柱以n×m矩阵排列。 电压均匀或差分施加到每个电子发射器或提取器。 将相同的控制电压或不同的电压施加到每个提取器的控制分割区域中的坐标处的区域以偏转电子束。 不对应于提取器的透镜层被集体地或单独地控制,以便有效地控制单元微柱的电子束。 此外,提供了使用该方法的多微柱。

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