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    PARTICLE BEAM DEVICE AND METHOD FOR USE IN A PARTICLE BEAM DEVICE
    101.
    发明申请
    PARTICLE BEAM DEVICE AND METHOD FOR USE IN A PARTICLE BEAM DEVICE 有权
    颗粒束装置和用于颗粒束装置的方法

    公开(公告)号：US20120305765A1

    公开(公告)日：2012-12-06

    申请号：US13589461

    申请日：2012-08-20

    Applicant: Ulrike ZEILE ,  Andreas SCHERTEL

    Inventor： Ulrike ZEILE ,  Andreas SCHERTEL

    IPC: H01J37/26

    CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J37/3056 ,  H01J2237/201 ,  H01J2237/20207 ,  H01J2237/206 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: A particle beam device includes a movable carrier element with at least one receiving element for receiving a specimen and in which the receiving element is situated on the carrier element. In various embodiments, the receiving element may be situated removably on the carrier element and/or multiple receiving elements may be situated on the carrier element in such a way that a movement of the carrier element causes a movement of the multiple receiving elements in the same spatial direction or around the same axis. The carrier element may be movable in three spatial directions situated perpendicular to one another and rotatable around a first axis which is parallel to an optical axis of the particle beam device and around a second axis which is situated perpendicular to the optical axis. A method for using the particle beam device in connection with specimen study and preparation is also disclosed.

    Abstract translation: 粒子束装置包括具有至少一个用于接收样本的接收元件的可移动的载体元件，并且其中接收元件位于载体元件上。 在各种实施例中，接收元件可以可拆卸地位于载体元件上和/或多个接收元件可以位于载体元件上，使得载体元件的移动导致多个接收元件在同一移动中的移动 空间方向或围绕同一轴线。 载体元件可以在三个空间方向上移动，该三个空间方向彼此垂直并可围绕平行于粒子束装置的光轴并围绕垂直于光轴定位的第二轴线的第一轴线旋转。 还公开了与样品研究和制备相关的使用粒子束装置的方法。

    Ion implantation apparatus, substrate clamping mechanism, and ion implantation method
    102.
    发明授权
    Ion implantation apparatus, substrate clamping mechanism, and ion implantation method 有权
    离子注入装置，衬底夹持机构和离子注入方法

    公开(公告)号：US08063388B2

    公开(公告)日：2011-11-22

    申请号：US12702779

    申请日：2010-02-09

    Applicant: Hidenori Takahashi

    Inventor： Hidenori Takahashi

    IPC: H01J37/20 ,  H01J37/08

    CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/204 ,  H01J2237/31701 ,  H01L21/68728 ,  H01L21/68771

    Abstract: Provided is an ion implantation apparatus including a disk which rotates about a first axis, a pad which is rotatable about a second axis on the disk, and on which a substrate is placed with a holder attached to a circumference of the substrate, the holder including a weight, fixing pins which are each fixedly provided on a portion on the disk around the pad, a sliding piece which slides, by its own centrifugal force, on the disk with a rotational movement of the disk and thereby clamps the holder in cooperation with the fixing pins, and an ion beam generator which irradiates the substrate with ion beams.

    Abstract translation: 本发明提供了一种离子注入装置，其包括围绕第一轴线旋转的盘，可绕盘的第二轴线旋转的衬垫，并且其上放置基板并具有附接到衬底周围的保持器，所述保持器包括 一个重量，固定销固定地设置在盘周围的盘上的一部分上，滑块通过其自身的离心力在盘的旋转运动下滑动在盘上，从而与支架配合地夹持支架 固定销以及用离子束照射衬底的离子束发生器。

    Ion implantation apparatus and a method
    103.
    发明授权
    Ion implantation apparatus and a method 有权
    离子注入装置及方法

    公开(公告)号：US07989784B2

    公开(公告)日：2011-08-02

    申请号：US12494270

    申请日：2009-06-30

    Applicant: Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick ,  Kenneth Harry Purser

    Inventor： Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick ,  Kenneth Harry Purser

    IPC: H01J37/317 ,  H01J37/20

    CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/08 ,  H01J37/20 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/166 ,  H01J2237/2001 ,  H01J2237/2006 ,  H01J2237/201 ,  H01J2237/202

    Abstract: A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source providing an extracted ribbon beam having at least 100 mm major cross-sectional diameter. The ribbon beam may be passed through a 90° bending magnet which bends the beam in the plane of the ribbon. The magnet provides intensity correction across the ribbon to compensate for the dependency on the radial distance from the wheel axis of the speed at which parts of the wafers pass through the ribbon beam.

    Abstract translation: 用于从硅晶片剥离硅的氢离子注入机使用大的扫描轮，围绕其周边承载50个以上的晶圆并围绕一个轴线旋转。 在一个实施例中，车轮的旋转轴线是固定的，并且带状的氢离子束被向下指向车轮的周缘。 带状束在轮上的晶片的整个径向宽度上延伸。 光束由离子源产生，提供具有至少100mm主横截面直径的抽出的带状束。 带状光束可以穿过将光束弯曲在色带平面中的90°弯曲磁体。 磁体在色带上提供强度校正，以补偿从轮轴的径向距离对晶片的一部分通过带状束的速度的依赖性。

    E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same
    104.
    发明授权
    E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same 有权
    用于同时照射多个光掩模的电子束光刻系统和使用其制造光掩模的方法

    公开(公告)号：US07723702B2

    公开(公告)日：2010-05-25

    申请号：US11656467

    申请日：2007-01-23

    Applicant: Je-bum Yoon ,  Cha-won Koh ,  Myoung-ho Jung ,  Gi-sung Yeo ,  Sang-jin Kim

    Inventor： Je-bum Yoon ,  Cha-won Koh ,  Myoung-ho Jung ,  Gi-sung Yeo ,  Sang-jin Kim

    IPC: G21G5/00

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/201 ,  H01J2237/31774

    Abstract: Disclosed is an E-beam lithography system for synchronously irradiating surfaces of a plurality of substrates. The E-beam lithography system may include a loading unit loading and unloading substrates, an alignment chamber aligning the substrates, a transfer chamber transferring the substrates from the loading unit or chambers, a lithography chamber radiating one or more electron beams onto the substrates, and a vacuum chamber creating a vacuum in the chambers. A stage may be installed in the lithography chamber such that the substrates may be mounted on the stage and radiated with one or more electron beams.

    Abstract translation: 公开了一种用于同时照射多个基板的表面的电子束光刻系统。 电子束光刻系统可以包括加载单元装载和卸载基板，对准基板的对准室，从加载单元或室转移基板的传送室，将一个或多个电子束辐射到基板上的光刻室，以及 在室中产生真空的真空室。 平台可以安装在光刻室中，使得基板可以安装在平台上并用一个或多个电子束辐射。

    Device for preparing microscopy samples
    108.
    发明授权
    Device for preparing microscopy samples 有权
    显微镜样品制备装置

    公开(公告)号：US07544953B2

    公开(公告)日：2009-06-09

    申请号：US11752570

    申请日：2007-05-23

    Applicant: Steven L. Goodman

    Inventor： Steven L. Goodman

    IPC: G01N1/31 ,  G01N1/36 ,  B01L3/00

    CPC classification number: G01N1/31 ,  B01L3/0275 ,  B01L3/502 ,  B01L2300/042 ,  B01L2300/0609 ,  B01L2300/0681 ,  G01N1/36 ,  G01N2035/0427 ,  G01N2035/1048 ,  G02B21/34 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/201

    Abstract: A device, method and system for preparing and storing samples for microscopic analysis is disclosed. The device provides a reservoir that can be attached to a displacement pipette thereby filling the reservoir with reagents desired for preparing the samples for microscopic analysis. In some embodiments, the specimen may be contained on a transmission electron microscope (TEM) grid. In other embodiments, the sample may be a light microscope (LM) specimen or a scanning electron microscope (SEM) specimen. In yet another embodiment, the invention provides a method of preparing samples for microscopic examination including a device for preparing TEM grids with, a device for preparing TEM, SEM or LM specimens with and a device for storing both grids and specimens in. In yet another embodiment, the invention provides a system for tracking the preparation, analysis and histological evaluation of multiple samples while also providing for their long term storage.

    Abstract translation: 公开了用于制备和存储用于显微镜分析的样品的装置，方法和系统。 该装置提供一个可以连接到移液移液管的储液器，从而用准备用于显微镜分析的样品所需的试剂填充储存器。 在一些实施例中，样品可以包含在透射电子显微镜（TEM）网格上。 在其他实施方案中，样品可以是光学显微镜（LM）样品或扫描电子显微镜（SEM）样品。 在另一个实施方案中，本发明提供了一种制备用于显微镜检查的样品的方法，包括用于制备TEM格栅的装置，用于制备TEM，SEM或LM样品的装置以及用于储存两个栅格和标本的装置。另外 本发明提供了一种用于跟踪多个样品的制备，分析和组织学评估的系统，同时还提供其长期储存。

    SYSTEM AND METHODS FOR PREPARING MICROSCOPY SAMPLES
    110.
    发明申请
    SYSTEM AND METHODS FOR PREPARING MICROSCOPY SAMPLES 有权
    用于制备微观样品的系统和方法

    公开(公告)号：US20080068706A1

    公开(公告)日：2008-03-20

    申请号：US11752239

    申请日：2007-05-22

    Applicant: Steven L. Goodman

    Inventor： Steven L. Goodman

    IPC: G02B21/00

    CPC classification number: G01N1/31 ,  B01L3/0275 ,  B01L3/502 ,  B01L2300/042 ,  B01L2300/0609 ,  B01L2300/0681 ,  G01N1/36 ,  G01N2035/0427 ,  G01N2035/1048 ,  G02B21/34 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/201

    Abstract: A device, method and system for preparing and storing samples for microscopic analysis is disclosed. The device provides a reservoir that can be attached to a displacement pipette thereby filling the reservoir with reagents desired for preparing the samples for microscopic analysis. In some embodiments, the specimen may be contained on a transmission electron microscope (TEM) grid. In other embodiments, the sample may be a light microscope (LM) specimen or a scanning electron microscope (SEM) specimen. In yet another embodiment, the invention provides a method of preparing samples for microscopic examination including a device for preparing TEM grids with, a device for preparing TEM, SEM or LM specimens with and a device for storing both grids and specimens in. In yet another embodiment, the invention provides a system for tracking the preparation, analysis and histological evaluation of multiple samples while also providing for their long term storage.

    Abstract translation: 公开了用于制备和存储用于显微镜分析的样品的装置，方法和系统。 该装置提供一个可以连接到移液移液管的储液器，从而用准备用于显微镜分析的样品所需的试剂填充储存器。 在一些实施例中，样品可以包含在透射电子显微镜（TEM）网格上。 在其他实施方案中，样品可以是光学显微镜（LM）样品或扫描电子显微镜（SEM）样品。 在另一个实施方案中，本发明提供了一种制备用于显微镜检查的样品的方法，包括用于制备TEM格栅的装置，用于制备TEM，SEM或LM样品的装置以及用于储存两个栅格和标本的装置。另外 本发明提供了一种用于跟踪多个样品的制备，分析和组织学评估的系统，同时还提供其长期储存。

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