113.
    发明专利
    未知

    公开(公告)号:AT286517T

    公开(公告)日:2005-01-15

    申请号:AT01101085

    申请日:2001-01-18

    Applicant: BASF AG

    Abstract: A water dispersible, radiation curable polyurethane comprises organic aliphatic or alicyclic polyisocyanates, cycloaliphatic diols and/or cycloaliphatic diamines, compounds having at least one isocyanate reactive group and at least one radically polymerizable unsaturated group and compounds having at least one isocyanate reactive group and at least one dispersion aiding group. A water dispersible, radiation curable polyurethane (I) comprises: (A) organic aliphatic or alicyclic polyisocyanates; (B) cycloaliphatic diols and/or cycloaliphatic diamines; (C) compounds having at least one isocyanate reactive group and at least one radically polymerizable unsaturated group; (D) compounds having at least one isocyanate reactive group and at least one dispersion aiding group; (E) optionally compounds having at least two isocyanate reactive groups having a mol. wt. of less than 1000 g/mol; (F) optionally compounds having at least one isocyanate reactive group that are different to (A)-(D). Independent claims are included for: (i) a polyurethane dispersion (II) comprising the polyurethane (I) and optionally 0-10 wt.% of a photochemical and/or thermal initiator and 0-10 wt.% of a UV absorber and a HALS compound; (ii) a process for the coating of substrates by application of the polyurethane dispersion (II), optionally containing conventional paint additives, onto a substrate and curing by means of electron irradiation or UV light under oxygen, or preferably under inert gas; (iii) the resulting coated substrate.

    115.
    发明专利
    未知

    公开(公告)号:ES2212662T3

    公开(公告)日:2004-07-16

    申请号:ES99964568

    申请日:1999-12-14

    Applicant: BASF AG

    Abstract: Compounds having isocyanate groups with or without blocking, allophanate groups and free-radically polymerizable C-C double bonds, the C-C double bonds being in activated form by virtue of a carbonyl group attached directly to them or by virtue of an oxygen atom in ether function (activated double bonds), derived from polyisocyanates and alcohols A which in addition to the alcohol group also carry an activated double bond (compounds I). The invention additionally relates to radiation-curable formulations and coating compositions comprising the compounds I, to methods for coating using these substances, and to coated articles produced using these methods. Furthermore, the invention relates to the use of the compounds I in radiation-curable compositions such as in casting compositions, dental compounds, composite materials, sealing compounds, adhesives, troweling compounds, printing inks, in photostructurable compositions such as solder resists, photoresists, photopolymeric printing plates, and stereolithography resins.

    119.
    发明专利
    未知

    公开(公告)号:ES2176665T3

    公开(公告)日:2002-12-01

    申请号:ES97900552

    申请日:1997-01-02

    Applicant: BASF AG

    Abstract: The invention concerns radiation-hardenable coatings processed from melt, solution or dispersion and containing as binders copolymers comprising the following: a) at least one monomer of either the general formula (I) CH2 = C(R )-CO-OR , in which R stands for H, CH3 or C2H5 and R stands for H, CnH2n+1, n being 1-30, an alicyclic, araliphatic or heterocyclic group, a hydroxyalkyl-, alkoxyalkyl-, glycidyl- or aminoalkyl group, or of the general formula (II) CH2 = C(R )-CO-NR R , in which R stands for H or CH3, R and R can be identical or different and stand for H, CH2OH, CnH2n+1, n being 1-30, or CH2OR , R standing for CmH2m+1 and m being 1-12; and b) at least one copolymerisable ethylenically unsaturated organic compound of general formula (A), in which R' and R'' can be identical or different and stand for H or CpH2p+1, p being 1-6, cycloalkyl, aryl or aralkyl, and R''' stands for an acryloyl, methacryloyl, ethacryloyl or cinnamyloyl group and this compound can be partially replaced by one or more other copolymerisable ethylenically unsaturated organic compounds different from (a) and (b).

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