METHOD AND APPARATUS FOR USING AN ARRAY OF GRATING LIGHT VALVES TO PRODUCE MULTICOLOR OPTICAL IMAGES
    111.
    发明申请
    METHOD AND APPARATUS FOR USING AN ARRAY OF GRATING LIGHT VALVES TO PRODUCE MULTICOLOR OPTICAL IMAGES 审中-公开
    使用光栅阵列生成多光子光学图像的方法和装置

    公开(公告)号:WO1997026569A2

    公开(公告)日:1997-07-24

    申请号:PCT/US1997000854

    申请日:1997-01-17

    CPC classification number: B81B3/001 B81C2201/115 G02B5/1828 G02B26/0808

    Abstract: A multicolor optical image-generating device comprised of an array of grating light valves (GLVs) organized to form light-modulating pixel units for spatially modulating incident rays of light. The pixel units are comprised of three subpixel components each including a plurality of elongated, equally spaced apart reflective grating elements arranged parallel to each other with their light-reflective surfaces also parallel to each other. Each subpixel component includes means for supporting the grating elements in relation to one another, and means for moving alternate elements relative to the other elements and between a first configuration wherein the component acts to reflect incident rays of light as a plane mirror, and a second configuration wherein the component diffracts the incident rays of light as they are reflected from the grating elements. The three subpixel components of each pixel unit are designed such that when red, green and blue light sources are trained on the array, colored light diffracted by particular subpixel components operating in the second configuration will be directed through a viewing aperture, and light simply reflected from particular subpixel components operating in the first configuration will not be directed through the viewing aperture.

    Abstract translation: 一种多色光学图像产生装置,包括被组织以形成用于空间调制入射光线的光调制像素单元的光栅光阀阵列(GLV)。 像素单元由三个子像素部件组成,每个子像素部件包括彼此平行布置的多个细长的等间隔开的反射光栅元件,其光反射表面也彼此平行。 每个子像素部件包括用于相对于彼此支撑光栅元件的装置,以及用于相对于其它元件移动交替元件的装置,以及用于将入射光线反射为平面镜的第一配置之间的第一配置,以及第二 配置,其中所述分量在入射光线从所述光栅元件反射时衍射。 每个像素单元的三个子像素分量被设计成使得当在阵列上训练红色,绿色和蓝色光源时,由在第二配置中操作的特定子像素分量衍射的彩色光将被引导通过观察孔,并且光简单地反射 来自在第一配置中操作的特定子像素组件将不被引导通过观察孔。

    DEFORMABLE GRATING APPARATUS INCLUDING STICTION PREVENTION MEANS
    112.
    发明申请
    DEFORMABLE GRATING APPARATUS INCLUDING STICTION PREVENTION MEANS 审中-公开
    不可磨损的装置,包括防止手段

    公开(公告)号:WO1996027810A1

    公开(公告)日:1996-09-12

    申请号:PCT/US1995002963

    申请日:1995-03-07

    CPC classification number: B81B3/001 B81C2201/115 G02B5/1828 G02B26/0808

    Abstract: A modulator for modulating incident light, the modulator comprising a plurality of equally spaced elements (116), each including a light reflective planar surface. The elements are parallel to each other with their light reflective surfaces parallel to each other. The modulator includes means for moving the elements relative to one another between a first configuration wherein the modulator reflects the incident light as a plane mirror, and a second configuration wherein the modulator diffracts the incident rays of light as they are reflected. At least one of the facing surfaces (114) (110) of the elements and underlying substrate (108) is configured to reduce any tendency to stick as they are pulled together. The light reflective surfaces of the elements remain parallel to each other in both the first and the second configurations and the perperdicular spacing between the reflective surfaces of adjacent elements is equal to m/4 times the wavelength of the incident light, wherein m = an even whole number or zero when the elements are in the first configuration and m = an odd number when the elements are in the second configuration.

    Abstract translation: 一种用于调制入射光的调制器,所述调制器包括多个等间隔的元件(116),每个元件包括光反射平面。 元件彼此平行,其光反射表面彼此平行。 调制器包括用于在第一配置之间相对于彼此移动元件的装置,其中调制器将入射光反射为平面镜,以及第二配置,其中调制器在入射的光线被反射时衍射。 元件和下面的衬底(108)的面向表面(114)(110)中的至少一个被配置成在被拉在一起时减少任何粘着的倾向。 元件的光反射表面在第一和第二构造中保持彼此平行,并且相邻元件的反射表面之间的周向间隔等于入射光的波长的m / 4倍,其中m =偶数 当元素处于第一配置时,整数或零,并且当元素处于第二配置时m =奇数。

    A SILICON MICROPHONE WITH HIGH-ASPECT-RATIO CORRUGATED DIAPHRAGM AND A PACKAGE WITH THE SAME
    113.
    发明申请
    A SILICON MICROPHONE WITH HIGH-ASPECT-RATIO CORRUGATED DIAPHRAGM AND A PACKAGE WITH THE SAME 审中-公开
    具有高比例矫正膜片的硅胶片及其相关包装

    公开(公告)号:WO2016008106A1

    公开(公告)日:2016-01-21

    申请号:PCT/CN2014/082266

    申请日:2014-07-15

    Applicant: GOERTEK INC.

    Abstract: A silicon microphone (10) with a high-aspect-ratio corrugated diaphragm (200). The microphone (10) comprises a compliant diaphragm (200) on which at least one ring-shaped corrugation (210) is formed in the vicinity of the edge of the diaphragm (200) which is fixed to the substrate (100), wherein the depth of the corrugation (210) to the thickness of the diaphragm (200) is larger than 5:1, preferably 20:1, and the walls of the corrugation (210) are inclined to the surface of the diaphragm (200) at an angle in the range of 80º to 100º. The microphone (10) with a high-aspect-ratio corrugated diaphragm (200) can achieve a consistent and optimal sensitivity and reduce impact applied thereto in a drop test so that the performances, the reproducibility, the reliability and the yield can be improved.

    Abstract translation: 一种具有高纵横比波纹膜片(200)的硅麦克风(10)。 麦克风(10)包括柔性隔膜(200),在膜片(200)的边缘附近形成有至少一个环形波纹(210),所述波纹固定在基板(100)上,其中 波纹(210)的深度与隔膜(200)的厚度大于5:1,优选为20:1,并且波纹(210)的壁在隔膜(200)的表面处以 角度范围为80º至100º。 具有高纵横比的波纹状隔膜(200)的麦克风(10)可以实现一致和最佳的灵敏度并降低在跌落试验中施加的冲击,从而可以提高性能,再现性,可靠性和产量。

    VERFAHREN ZUM HERSTELLEN EINES VERSIEGELTEN MIKROMECHANISCHEN BAUELEMENTS
    114.
    发明申请
    VERFAHREN ZUM HERSTELLEN EINES VERSIEGELTEN MIKROMECHANISCHEN BAUELEMENTS 审中-公开
    一种用于生产密封的微机械零件

    公开(公告)号:WO2015120939A1

    公开(公告)日:2015-08-20

    申请号:PCT/EP2014/078998

    申请日:2014-12-22

    Abstract: Verfahren zum Herstellen eines mikromechanischen Bauelements (100), aufweisend die Schritte: - Ausbilden einer Zugangsöffnung (7) in einem MEMS-Element (5) oder in einem Kappenelement (6) des Bauelements (100); - Verbinden des MEMS-Elements (5) mit dem Kappenelement (6), wobei zwischen dem MEMS-Element (5) und dem Kappenelement (6) wenigstens eine Kaverne (8a, 8b) ausgebildet wird; und - Verschließen der Zugangsöffnung (7) zur wenigstens einen Kaverne (8a, 8b) unter einer definierten Atmosphäre mittels eines Lasers (9).

    Abstract translation: 一种用于制造微机械部件(100),包括以下步骤的方法: - 形成的进入开口(7)中的MEMS元件(5)或在设备(100)的盖元件(6); - 与盖部件(6),连接所述MEMS元件(5),其中所述MEMS元件(5)和(6)(8A,8B)形成在盖部件之间的至少一个腔; 和 - 通过激光(9)的装置关闭所述进入开口(7),用于在至少一个空腔(8A,8B)定义的气氛下进行。

    METHOD FOR FABRICATING NANO-SCALE PATTERNED SURFACES
    115.
    发明申请
    METHOD FOR FABRICATING NANO-SCALE PATTERNED SURFACES 审中-公开
    用于制作纳米尺度图形表面的方法

    公开(公告)号:WO2009113063A3

    公开(公告)日:2010-08-19

    申请号:PCT/IL2009000269

    申请日:2009-03-10

    Abstract: A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super- hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.

    Abstract translation: 提出了一种具有纳米级表面粗糙度的基板的制造方法。 该方法包括:图案化基板的表面以产生光敏材料的间隔开的区域的阵列; 对所述图案化表面施加可控制的蚀刻,所述可控蚀刻具有预定的持续时间,以便形成具有纳米尺度特征的图案; 并去除感光材料,从而产生具有纳米级表面粗糙度的结构。 用疏水性分子对这样的纳米级粗糙表面进行硅烷化,导致产生了以接触角大和倾斜角大的特征的超疏水特性。 而且,在纳米级粗糙度表面上沉积光活性材料导致光电阴极具有增强的光电转换率。 该方法还提供对入射光的偏振不敏感的光电阴极的制造。

    METHOD AND APPARATUS FOR USING AN ARRAY OF GRATING LIGHT VALVES TO PRODUCE MULTICOLOR OPTICAL IMAGES
    118.
    发明申请
    METHOD AND APPARATUS FOR USING AN ARRAY OF GRATING LIGHT VALVES TO PRODUCE MULTICOLOR OPTICAL IMAGES 审中-公开
    使用光栅阵列生成多光子光学图像的方法和装置

    公开(公告)号:WO9726569A3

    公开(公告)日:1997-10-09

    申请号:PCT/US9700854

    申请日:1997-01-17

    CPC classification number: B81B3/001 B81C2201/115 G02B5/1828 G02B26/0808

    Abstract: A multicolor optical image-generating device comprised of an array of grating light valves (GLVs) organized to form light-modulating pixel units for spatially modulating incident rays of light. The pixel units are comprised of three subpixel components each including a plurality of elongated, equally spaced apart reflective grating elements arranged parallel to each other with their light-reflective surfaces also parallel to each other. Each subpixel component includes means for supporting the grating elements in relation to one another, and means for moving alternate elements relative to the other elements and between a first configuration wherein the component acts to reflect incident rays of light as a plane mirror, and a second configuration wherein the component diffracts the incident rays of light as they are reflected from the grating elements. The three subpixel components of each pixel unit are designed such that when red, green and blue light sources are trained on the array, colored light diffracted by particular subpixel components operating in the second configuration will be directed through a viewing aperture, and light simply reflected from particular subpixel components operating in the first configuration will not be directed through the viewing aperture.

    Reducing MEMS stiction by deposition of nanoclusters
    120.
    发明授权
    Reducing MEMS stiction by deposition of nanoclusters 有权
    责任的减少MEMS通过纳米团簇沉积

    公开(公告)号:EP2746218B1

    公开(公告)日:2016-09-28

    申请号:EP13196317.5

    申请日:2013-12-09

    Abstract: A method for reducing stiction in a MEMS device by decreasing surface area between two surfaces that can come into close contact is provided. Reduction in contact surface area is achieved by increasing surface roughness of one or both of the surfaces. The increased roughness is provided by forming a micro-masking layer on a sacrificial layer used in formation of the MEMS device, and then etching the surface of the sacrificial layer. The micro-masking layer can be formed using nanoclusters (520). When a next portion of the MEMS device is formed on the sacrificial layer (810), this portion will take on the roughness characteristics imparted on the sacrificial layer by the etch process. The rougher surface (910) decreases the surface area available for contact in the MEMS device and, in turn, decreases the area through which stiction can be imparted.

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