Abstract:
A method of manufacturing a multilayer printed wiring board includes forming a first interlaminar resin insulating layer, a first conductor circuit on the first interlaminar resin insulating layer, a second interlaminar resin insulating layer, opening portions in the second interlaminar resin insulating layer to expose a face of the first conductor circuit, an electroless plating film on the second interlaminar resin insulating layer and the exposed face, and a plating resist on the electroless plating film. The method further includes substituting the electroless plating film with a thin film conductor layer, having a lower ion tendency than the electroless plating film, and a metal of the exposed face, forming an electroplating film including the metal on a portion of the electroless plating film and the thin film conductor layer, stripping the plating resist, and removing the electroless plating film exposed by the stripping.
Abstract:
A circuit board and a method for fabricating the same are disclosed. The circuit board includes: a carrier board having a circuit layer formed on at least one surface thereof; a first dielectric layer formed on the carrier board and having first openings for exposing a part of the circuit layer; conductive vias formed in the first openings; a second dielectric layer formed on the first dielectric layer and having second and third openings formed therein, wherein the second openings correspond to the first openings for exposing the conductive vias; and a multi-layered metal electroless plating circuit layer formed in the second and third openings for electrically connecting the circuit layer of the carrier board via the conductive vias, thereby allowing the multi-layered metal electroless plating circuit layer to be embedded into the first and second dielectric layers to enhance the bonding strength therebetween and increase the reliability of the circuit board and facilitate formation of fine circuits.
Abstract:
To produce a wiring substrate by employing a semi-additive method, the invention provides a production method of a wiring substrate, and a wiring substrate, that suppress the formation of undercut of an electrolytic copper plating layer during base etching and capable of ultra-fine wiring of a line/space size of 25/25 μm or below and further 10/10 μm or below. When producing a wiring substrate, the method of the invention includes the steps of applying electroless copper plating to a surface of a substrate made of a resin having an electric insulating property to form an electroless copper plating layer; applying a resist pattern exposing a portion for forming a wiring pattern on the surface of the electroless copper plating layer; plating metals different from copper or alloys containing at least one kind of the metals to the exposed portion to form an etching barrier plating layer; plating an etching barrier metal to form an etching barrier metal plating layer; applying electrolytic copper plating to the surface of the etching barrier metal plating layer to form wiring having a conductor layer including an electroless copper plating layer, the etching barrier metal plating layer and the electrolytic copper plating layer and the electrolytic copper plating layer; removing the resist pattern; and etching and removing the electroless copper plating layer exposed on the surface to form a wiring pattern.
Abstract:
Narrow conductors and narrow spaces therebetween, typically two or three mils wide, are fabricated on outer layers of a printed wiring board with built-up areas such as plated-through holes or conductors of widths greater than two or three mils. Gold is deposited over a copper clad substrate in a pattern defining the desired circuitry. Thereafter, solder is placed at the built-up areas and, using both the solder and the gold as resist or masks, the exposed copper is removed by etching. An organic resist material is used in lieu of solder when the built-up area comprises wide conductors or leads, e.g., power busses.
Abstract:
The heat shock resistance of plated through holes in printed circuit assemblies is significantly increased by using as the through hole plating a special multi-layered arrangement comprising at least two layers of an electrically conductive metal in combination with at least one intermediate layer of a different electrically conductive metal. In preferred embodiments, the through hole plating comprises at least two layers of a stressed metal together with at least one intermediate layer of a metal having a stress in counteraction to that of one or more of the other metal layers. These through hole platings are capable of exposure to conditions of heat shock, such as encountered during high temperature soldering, without developing cracks resulting in breaks in the conducting pathways and failures.
Abstract:
A circuit board includes a base layer, a seed layer formed on the base layer, and a first electrode layer formed on the seed layer. The seed layer is formed of a metal oxide with a thickness of 100 to 400 Å. The circuit board may further include an insulation layer formed on the first electrode layer and a second electrode layer formed on the insulation layer.
Abstract:
This disclosure relates to a radio frequency (RF) transmission line for high performance RF applications. The RF transmission line includes a bonding layer having a bonding surface and configured to receive an RF signal, a barrier layer proximate the bonding layer, a diffusion barrier layer proximate the bonding layer and configured to prevent contaminant from entering the bonding layer, and a conductive layer proximate the diffusion barrier layer. The diffusion barrier layer has a thickness that allows the received RF signal to penetrate the diffusion barrier layer to the conductive layer. The diffusion barrier layer can be a nickel layer.
Abstract:
Disclosed is a method for manufacturing a circuit board, including preparing a substrate having a resin layer and a stop layer, forming at least one conduction hole penetrating the resin layer and stopping at the stop layer, forming a first metal layer through a sputtering process, forming a second metal layer on the first metal layer through a chemical plating process, forming a third metal layer having a circuit pattern, exposing part of the second metal layer and filling up the conduction hole through an electroplating process, and etching the second metal layer and the first metal layer under the second metal layer to expose the resin layer under the first metal layer. Since the first metal layer provides excellent surface properties, the second and third metal layers are well fixed and stable. The etched circuit pattern has a line width/pitch less than 10 μm for fine line width/pitch.
Abstract:
In a light-emitting device (30), a wiring pattern including conductor wirings (160, 165) and electrodes (170, 180) is formed on a substrate (110), and an Au layer (120) is formed on the wiring pattern.
Abstract:
Provided is a printed circuit board, including: a circuit pattern or a base pattern formed on an insulating layer; and a plurality of metal layers formed on the circuit pattern or the base pattern, wherein the metal layers includes: a silver metal layer formed of a metal material including silver; a first palladium metal layer formed at a lower part of the silver metal layer; and a second palladium metal layer formed at an upper part of the silver metal layer.