Regionally thinned microstructures for microbolometers
    141.
    发明授权
    Regionally thinned microstructures for microbolometers 失效
    用于微电表的局部变薄的微结构

    公开(公告)号:US07303997B1

    公开(公告)日:2007-12-04

    申请号:US11544591

    申请日:2006-10-10

    Abstract: Microbolometers with regionally thinned microbridges are produced by depositing a thin film (0.6 μm) of silicon nitride on a silicon substrate, forming microbridges on the substrate, etching the thin film to define windows in a pixel area, thinning the windows, releasing the silicon nitride, depositing a conductive YBaCuO film on the bridges, depositing a conductive film (Au) on the YBaCuO film, and removing selected areas of the YBaCuO and conductive films.

    Abstract translation: 通过在硅衬底上沉积氮化硅薄膜(0.6μm),在衬底上形成微桥,蚀刻薄膜以限定像素区中的窗口,使窗户变薄,释放氮化硅,从而产生具有区域薄化微桥的微伏热计 在桥上沉积导电YBaCuO膜,在YBaCuO膜上沉积导电膜(Au),并去除YBaCuO和导电膜的选定区域。

    Thermal displacement element and radiation detector using the element
    142.
    发明授权
    Thermal displacement element and radiation detector using the element 有权
    热位移元件和辐射探测器使用该元件

    公开(公告)号:US06835932B2

    公开(公告)日:2004-12-28

    申请号:US10129338

    申请日:2002-05-03

    Abstract: A thermal displacement element comprises a substrate, and a supported member supported on the substrate. The supported member includes first and second displacement portions, a heat separating portion exhibiting a high thermal resistance and a radiation absorbing portion receiving the radiation and converting it into heat. Each of the first and second displacement portions has at least two layers of different materials having different expansion coefficients and stacked on each other. The first displacement portion is mechanically continuous to the substrate without through the heat separating portion. The radiation absorbing portion and the second displacement portion are mechanically continuous to the substrate through the heat separating portion and the first displacement portion. The second displacement portion is thermally connected to the radiation absorbing portion. A radiation detecting device comprises a thermal displacement element and a displacement reading member fixed to the second displacement portion of the thermal displacement element and used for obtaining a predetermined change corresponding to a displacement in the second displacement portion.

    Method for the fabrication of suspended porous silicon microstructures and application in gas sensors
    143.
    发明申请
    Method for the fabrication of suspended porous silicon microstructures and application in gas sensors 审中-公开
    用于制造悬浮多孔硅微结构的方法和在气体传感器中的应用

    公开(公告)号:US20040195096A1

    公开(公告)日:2004-10-07

    申请号:US10485940

    申请日:2004-01-30

    Abstract: This invention provides a front side silicon micromachining process for the fabrication of suspended Porous Silicon membranes in the form of bridges or cantilevers and of thermal sensor devices employing these membranes. The fabrication of the suspended Porous Silicon membranes comprises the following steps: (a) formation of a Porous Silicon layer (2) in, at least one, predefined area of a Silicon substrate (1), (b) definition of etch windows (5) around or inside said Porous Silicon layer (2) using standard photolithography and (c) selective etching of the silicon substrate (1), underneath the Porous Silicon layer (2), by using dry etching techniques to provide release of the Porous Silicon membrane and to form a cavity (6) under the said Porous Silicon layer. Furthermore, the present invention provides a method for the fabrication of thermal sensors based on Porous Silicon membranes with minimal thermal losses, since the proposed methodology combines the advantages that result from the low thermal conductivity of Porous Silicon and the use of suspended membranes. Moreover, the front-side micromachining process proposed in the present invention simplifies the fabrication process. Various types of thermal sensor devices, such as calorimetric-type gas sensors, conductometric type gas sensors and thermal conductivity sensors are described utilizing the proposed methodology.

    Abstract translation: 本发明提供了前桥硅微加工工艺,用于制造桥梁或悬臂形式的悬浮多孔硅膜以及采用这些膜的热传感器装置。 悬浮的多孔硅膜的制造包括以下步骤:(a)在硅衬底(1)的至少一个预定区域中形成多孔硅层(2),(b)蚀刻窗口(5) )使用标准光刻法和(c)在多孔硅层(2)下方的硅衬底(1)的选择性蚀刻,通过使用干蚀刻技术提供多孔硅膜(2)的多孔硅膜 并在所述多孔硅层下方形成空腔(6)。 此外,本发明提供了一种用于制造基于具有最小热损失的多孔硅膜的热传感器的方法,因为所提出的方法结合了多孔硅的低热导率和悬浮膜的使用所产生的优点。 此外,本发明中提出的前侧微加工工艺简化了制造工艺。 使用所提出的方法来描述各种类型的热传感器装置,例如量热式气体传感器,电导型气体传感器和导热传感器。

    Optical MEMS based monitoring system

    公开(公告)号:US11999612B2

    公开(公告)日:2024-06-04

    申请号:US17525950

    申请日:2021-11-14

    Applicant: Naiqian Han

    Inventor: Naiqian Han

    Abstract: Provided is an optical micro-electro-mechanical system (MEMS) based monitoring system, comprising: a broadband light source, a tunable optical filter (TOF), an optical etalon, a plurality of optical receivers, a plurality of optical couplers, and a plurality of optical MEM sensors; the TOF is configured to capture a transmission, reflection or interference spectrum of the optical MEMS sensors; wherein the peak or depression wavelength in the transmission, reflection or interference spectrum corresponds to a parameter of the pressure, temperature or stress, and the peak or depression wavelength can be obtained by comparing the spectrum with the periodic spectrum of the optical etalon, the optical etalon has an absolute wavelength mark; and the optical MEMS sensor comprises an optical MEMS resonator. The parameter of the pressure, temperature or stress can be obtained by the peak or depression wavelength in the transmission, the reflection or the interference spectrum of the optical MEMS sensor.

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