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Patent Agency Ranking
公开(公告)号：KR101197177B1
公开(公告)日：2012-11-02
申请号：KR1020100020656
申请日：2010-03-09
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/7075 , G03F7/0035 , G03F7/168 , G03F7/2041 , G03F7/40 , G03F7/70341 , H01L21/6715 , H01L21/6719 , H01L21/67742
Abstract: 기판에 레지스트 패턴을 연속하여 복수 회 형성하기 위한 도포 현상 장치에서 기판의 파티클 오염을 방지하는 것이다. 기판에 대하여 적어도 측면부를 발수 모듈에서 발수 처리하는 단계 및 도포 모듈에서 전체 면에 제 1 레지스트 도포를 행하는 단계의 일방 및 타방을 실행하고, 노광 장치에서 제 1 액침 노광이 행해진 후에 현상 모듈에서 제 1 현상을 행하는 단계와, 그 후 도포 모듈에서 전체 면에 제 2 레지스트 도포를 행하는 단계와, 상기 노광 장치에서 제 2 액침 노광이 행해진 후에 현상 모듈에서 제 2 현상을 행하는 단계를 실행하도록 기판 반송 수단 및 각 모듈의 동작을 제어하는 제어부와, 제 1 현상 종료 후로부터 제 2 액침 노광이 행해질 때까지의 동안에 기판의 측면부를 발수 처리하기 위한 기판 측면부 발수 모듈을 구비하도록 도포 현상 장치를 구성한다.
Abstract translation: 涂料和显影装置具有：包括在基材上进行防水处理的防水模块的处理块，涂布模块和显影模块; 衬底侧表面部分防水模块，用于在衬底的侧表面上进行防水处理; 以及控制单元，其控制所述模块的操作，以执行至少在基板的侧表面部分执行防水处理的步骤，并在所述基板的整个表面上执行第一抗蚀剂涂层; 在进行第一次浸液曝光之后执行第一显影; 在整个表面上进行第二抗蚀剂涂层，并且在执行第二浸液曝光之后执行第二显影，并且进一步执行在第一显影之后的基板的侧表面部分上进行防水处理的步骤 执行第二次曝光。
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公开(公告)号：KR1020100103375A
公开(公告)日：2010-09-27
申请号：KR1020100020656
申请日：2010-03-09
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/7075 , G03F7/0035 , G03F7/168 , G03F7/2041 , G03F7/40 , G03F7/70341 , H01L21/6715 , H01L21/6719 , H01L21/67742 , G03F7/16 , G03F7/70733 , G03F7/70916
Abstract: PURPOSE: A coating and developing apparatus, a coating and developing method and a storage media are provided to prevent liquid for an immersing exposure process from flowing into the rear side of a substrate by installing a water-repellent module on the lateral side of the substrate. CONSTITUTION: A plurality of substrates(W) is contained in a carrier(20) including a carrier block(C1). A processing block(C2) processes substrates which are drawn from the carrier. The processing block includes a water-repellent module and a coating module. The water-repellent module implements a water-repellent process with respect to the substrates. Resist is coated on the substrate in the coating module.
Abstract translation: 目的：提供一种涂覆和显影装置，涂覆和显影方法以及存储介质，以防止浸渍曝光过程中的液体流入基板的后侧，在基板的侧面上安装防水模块 。 构成：在包括载体块（C1）的载体（20）中包含多个基板（W）。 处理块（C2）处理从载体拉出的基板。 处理块包括防水模块和涂覆模块。 防水模块相对于基材实施防水处理。 抗蚀剂涂覆在涂层模块中的基底上。
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公开(公告)号：KR100876128B1
公开(公告)日：2008-12-29
申请号：KR1020020050805
申请日：2002-08-27
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/6715 , G03D3/06 , G03F7/3021
Abstract: In a developing processing of a wafer having a resist film low in the dissolving rate in a developing solution formed thereon and subjected to an exposure treatment, a developing solution of a low concentration is supplied first onto a wafer and the wafer is left to stand for a prescribed time to permit a developing reaction to proceed, followed by further supplying a developing solution having a concentration higher than that of the developing solution supplied first onto the wafer, leaving the substrate to stand and subsequently rinsing the wafer, thereby improving the uniformity of the line width in the central portion and the peripheral portion of the wafer.
Abstract translation: 在具有在其上形成的显影液中的溶解速率低的抗蚀剂膜并进行曝光处理的晶片的显影处理中，首先将低浓度的显影液供应到晶片上并且将晶片放置 进行规定的时间以允许显影反应进行，随后进一步将浓度高于首先供给的显影溶液的浓度的显影液供给到晶片上，留下基板并随后漂洗晶片，由此提高晶片的均匀性 晶片中央部分和周边部分的线宽。
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公开(公告)号：KR1020070026056A
公开(公告)日：2007-03-08
申请号：KR1020060081611
申请日：2006-08-28
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/304
CPC classification number: H01L21/67051
Abstract: A substrate cleaning apparatus and a substrate cleaning method are provided to dry completely a substrate without the existence of water marks by using a driving unit. A substrate cleaning apparatus includes a substrate holding unit, a cleaning solution nozzle, and a first driving unit. The substrate holding unit is used for keeping a substrate in a leveling state and rotating the substrate. The cleaning nozzle(5) is used for supplying a cleaning solution onto an upper surface of the substrate. The first driving unit is used for moving the cleaning nozzle from a center portion of the substrate to a peripheral portion.
Abstract translation: 提供基板清洗装置和基板清洗方法，通过使用驱动单元完全干燥基板而不存在水痕。 基板清洗装置包括基板保持单元，清洗溶液喷嘴和第一驱动单元。 基板保持单元用于将基板保持在调平状态并旋转基板。 清洁喷嘴（5）用于将清洁溶液供应到基板的上表面上。 第一驱动单元用于将清洁喷嘴从基板的中心部分移动到周边部分。
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公开(公告)号：KR1020030019138A
公开(公告)日：2003-03-06
申请号：KR1020020050805
申请日：2002-08-27
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/6715 , G03D3/06 , G03F7/3021
Abstract: PURPOSE: A method for developing processing and an apparatus for supplying developing solution are to provide an appropriate method for a developing processing conforming to the characteristics of the resist material relative to the developing solution. CONSTITUTION: A method for a developing processing of a resist film comprises steps of adjusting the concentration of a developing solution in accordance with the characteristics of the resist film and applying a developing processing to the resist film using the concentration-adjusted developing solution.
Abstract translation: 目的：开发处理方法和提供显影液的设备是提供一种适用于与抗蚀剂材料相对于显影液的特性一致的显影处理的方法。 构成：抗蚀剂膜的显影处理方法包括根据抗蚀剂膜的特性调节显影液的浓度并使用浓度调节显影液对抗蚀剂膜进行显影处理的步骤。
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