公开(公告)号：KR1020080012780A

公开(公告)日：2008-02-12

申请号：KR1020070077698

申请日：2007-08-02

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 다나카히로시 ,  히로시로고우키치 ,  후미히로가미무라

IPC: G03F7/34

CPC classification number: B01F3/088 ,  B01F3/0861 ,  B01F3/0865 ,  B01F5/10 ,  B01F15/00253 ,  B01F15/00331 ,  B01F15/00396 ,  B01F15/0243 ,  B01F15/0412 ,  B01F15/0437 ,  B01F15/06 ,  B01F2015/062 ,  B01F2215/0036 ,  B01J19/24 ,  B01J2219/00103 ,  B01J2219/24 ,  C01B15/08 ,  C11D3/3947 ,  C11D11/0047 ,  H01L21/67057

Abstract: A method for mixing a chemical liquid, and an apparatus for mixing a chemical liquid are provided to allow the Caro's acid effective for the stripping of resist from a substrate to be generated when sulfuric acid and oxygenated water (hydrogen peroxide) are mixed. A method for mixing a chemical liquid comprises the steps of preparing an inner bath(10), an outer bath(12), a return pipe(14), and a return pump(16); filling the inner bath with sulfuric acid fully and allowing the sulfuric acid overflown from the inner bath to flow into the outer bath; flowing oxygenated water to the outer bath; and operating the return pump when the oxygenated water is supplied and flowing the oxygenated water and sulfuric acid of the outer bath into the inner bath simultaneously, thereby mixing oxygenated water and sulfuric acid.

Abstract translation: 提供了混合化学液体的方法和用于混合化学液体的装置，以允许当硫酸和氧化水（过氧化氢）混合时，Caro的酸有效地从基底剥离抗蚀剂。 一种混合化学液体的方法包括制备内浴（10），外浴（12），回流管（14）和回流泵（16）的步骤。 用硫酸充分填充内浴，并允许内浴溢出的硫酸流入外槽; 将含氧水流入外浴; 并且在供给氧合水并使外部浴的含氧水和硫酸同时流入内部浴池的同时操作回流泵，从而混合氧化水和硫酸。

公开(公告)号：KR1020070111973A

公开(公告)日：2007-11-22

申请号：KR1020070039728

申请日：2007-04-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 와타나베츠카사 ,  신도나오키 ,  히로시로고우키치 ,  가미카와유지

IPC: H01L21/302 ,  H01L21/304

CPC classification number: H01L21/67057 ,  H01L21/67051

Abstract: A substrate cleaning method, a substrate cleaning apparatus and a program storage medium are provided to remove particles adhering to a substrate to be cleaned by immersing the substrate in a cleaning liquid and generating ultrasonic waves in the cleaning liquid. A substrate is immersed in a cleaning liquid in a cleaning tank(12). Ultrasonic waves are applied to the cleaning liquid contained in the cleaning tank while the cleaning liquid is being supplied into the cleaning tank, wherein a region in the cleaning tank toward which the cleaning liquid is supplied is varied with respect to a vertical level in the step of applying ultrasonic waves in the cleaning liquid while the cleaning liquid is being supplied into the cleaning tank.

Abstract translation: 提供基板清洗方法，基板清洁装置和程序存储介质，以通过将基板浸入清洗液中并在清洗液中产生超声波来去除附着在待清洁基板上的颗粒。 将基板浸入清洗槽（12）中的清洗液中。 当清洁液被供给到清洗槽中时，将超声波施加到清洗槽中所含的清洗液体，其中，清洗槽中供应清洗液体的区域相对于步骤 当清洗液被供给到清洗槽中时，在清洗液中施加超声波。