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公开(公告)号：KR1020100109163A
公开(公告)日：2010-10-08
申请号：KR1020090027622
申请日：2009-03-31
Applicant: 삼성전자주식회사
IPC: H01L21/8247 , H01L27/115
CPC classification number: H01L45/1616 , H01L45/06 , H01L45/1233 , H01L45/144 , H01L45/1683 , H01L45/143
Abstract: PURPOSE: A method of forming a phase change memory device is provided to supply electrical bit to a phase change device by forming a void in the phase change memory cell. CONSTITUTION: A first to third source gas(G1-G3) are inserted into a process chamber. The first source gas has a germanium precursor. A second source gas has an antimony precursor. A third source gas has a tellurium precursor. A reaction gas is inserted into a process chamber during the time of inserting the first to the third gas. A purge gas is inserted into the process chamber during the time of inserting the first to the third gas. A phase change material layer is filled into the opening the inter-layer insulating film of the semiconductor substrate.
Abstract translation: 目的：提供形成相变存储器件的方法，通过在相变存储器单元中形成空隙来向相变器件提供电位。 构成：将第一至第三源气体（G1-G3）插入处理室。 第一源气体具有锗前体。 第二源气体具有锑前体。 第三源气体具有碲前体。 在插入第一至第三气体期间，将反应气体插入处理室。 在插入第一至第三气体期间，将吹扫气体插入处理室。 将相变材料层填充到半导体衬底的层间绝缘膜的开口中。
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公开(公告)号：KR1020080102778A
公开(公告)日：2008-11-26
申请号：KR1020070049661
申请日：2007-05-22
Applicant: 삼성전자주식회사
Inventor： 함정윤 , 블라디미르우라자에브 , 정진하 , 노지마히데오
CPC classification number: C02F1/469 , C02F1/42 , C02F1/4693 , C02F1/4695
Abstract: A water softening apparatus for acidity water generated in the acidity water production room to a depletion chamber is provided to remove precipitate which is precipitated in the positive transparent film and anion transparent film by supplying the acidity water to the depletion chamber. A chamber(10) forms the flow channel in which the water passes in inside. A negative electrode(14) installed at the inner one side of the chamber, applies negative power source. The positive electrode installed at the inner other side of the chamber, applies positive power source. The positive membrane is installed between the positive electrode and negative electrode by turns, and selectively passes positive and negative ion.
Abstract translation: 在酸性水生产室中向耗尽室产生的酸性水的水软化装置被提供以通过将酸性水供给到耗尽室来除去沉积在阳性透明膜和阴离子透明膜中的沉淀物。 一个室（10）形成水流入内部的流动通道。 安装在室内侧的负极（14）施加负电源。 安装在室内的另一侧的正电极施加正电源。 正极片轮流安装在正极和负极之间，并选择性地通过正离子和负离子。
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公开(公告)号：KR1020080102077A
公开(公告)日：2008-11-24
申请号：KR1020070048419
申请日：2007-05-18
Applicant: 삼성전자주식회사
Inventor： 함정윤 , 블라디미르우라자에브 , 정진하 , 노지마히데오
CPC classification number: C02F1/42 , C02F1/001 , C02F1/46 , C02F2307/10
Abstract: An EDI(Electro DeIonization) type water softener is provided to increase a process amount drastically by increasing absorption and movement speed of ion even though particles of ion exchange resin are large. An ion exchange material(20) is filled between a positive ion exchange membrane(11) and an anion exchange membrane(12) of a room which removes salt. Concentration rooms(R1~R7) are installed on external sides of the positive ion and anion exchange membranes. The room for removing salt and the concentration room are arranged in stack structure. A cathode and an anode are respectively in an external side of the stack structure. Ion exchange material is made by ion exchange resin. Ion absorption efficiency is large in the inside of the ion exchange material. And the Ion absorption efficiency is small in the external side of the ion exchange material.
Abstract translation: 提供了EDI（Electro DeIonization）型软水器，即使离子交换树脂的颗粒大，也通过增加离子的吸收和移动速度来显着增加处理量。 离子交换材料（20）填充在去除盐的房间的正离子交换膜（11）和阴离子交换膜（12）之间。 浓缩室（R1〜R7）安装在正离子和阴离子交换膜的外侧。 清除盐和浓缩室的房间以堆叠结构排列。 阴极和阳极分别位于堆叠结构的外侧。 离子交换材料由离子交换树脂制成。 离子吸收效率在离子交换材料的内部较大。 并且在离子交换材料的外侧的离子吸收效率小。
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公开(公告)号：KR101977801B1
公开(公告)日：2019-08-28
申请号：KR1020110085039
申请日：2011-08-25
Applicant: 삼성전자주식회사
Inventor： 최진 , 정진하 , 블라디미르우라자에브 , 이혜연
IPC: H01L21/027 , G03F1/36 , G03F1/00 , G03F7/20
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Patent Agency Ranking
公开(公告)号：KR1020140114086A
公开(公告)日：2014-09-26
申请号：KR1020130028382
申请日：2013-03-18
Applicant: 삼성전자주식회사
Inventor： 정원영 , 강성욱 , 블라디미르우라자에브
CPC classification number: D06F37/26 , D06F37/10 , D06F37/28 , D06F37/30 , D06F39/028 , D06F39/088 , D06F39/14 , E05Y2900/312 , Y02B40/50
Abstract: Provided is a drum type washing machine which can swiftly reduce humidity within a tub by increasing the height difference between opened holes arranged on a back side of a cabinet and increasing a flux of air flowing in from the outside of the cabinet, passing the inside of the tub, and flowing out of the cabinet. The drum type washing machine having a cabinet and a tub arranged to house washing water within the cabinet, comprises a first opened hole arranged at a lower part of the back side of the cabinet to make the air flow into the tub from the outside of the cabinet; a second opened hole arranged at an upper part of the back side of the cabinet to discharge the air within the tub out of the cabinet; and first and second connection pipes connecting the first opened hole and the second opened hole to the tub, respectively, wherein the first opened hole is arranged to be positioned lower than the second hole and is arranged to be positioned lower than a lower end of the tub.
Abstract translation: 提供了一种滚筒式洗衣机，其可以通过增加布置在机柜背面的打开的孔之间的高度差，并增加从机壳外部流入的空气通量，从而迅速降低浴缸内的湿度， 浴缸，并从柜子流出。 滚筒式洗衣机具有机柜和洗衣盆，该机壳和浴盆布置成在机柜内容纳洗涤水，包括布置在机柜后侧下部的第一开孔，以使空气从外部流入浴缸 内阁; 第二打开孔，布置在机壳的后侧的上部，以将桶内的空气排出机柜; 以及分别将第一开孔和第二开孔连接到桶的第一和第二连接管，其中第一开孔布置成位于比第二孔低的位置，并且布置成位于比下端低 浴缸。
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公开(公告)号：KR1020130027609A
公开(公告)日：2013-03-18
申请号：KR1020110046577
申请日：2011-05-18
Applicant: 삼성전자주식회사
Inventor： 최진 , 정진하 , 블라디미르우라자에브 , 이혜연
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F1/78 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3026 , H01J37/3174 , H01J2237/0455 , H01J2237/30472 , H01J2237/31776 , H01L21/0274 , G03F7/2063 , H01L21/0337
Abstract: PURPOSE: An exposure system, a photomask, and a wafer manufactured by the same are provided to form a desirable pattern without a limit by combining various types of shots even through a linewidth of a photomask pattern is not constant. CONSTITUTION: A beam generator(200) provides a source beam(110a). An exposure stage(300) includes a base(310) including photosensitive materials for an exposure process and a base stage(360) mounting the base. A beam forming unit(400) forms the source beam with a preset shape and a preset size. The beam forming unit includes a first beam shaper(410), a first deflector(420), a second beam shaper(435), and a second deflector(440). The first beam shaper changes the source beam to a first forming beam(110b). The second beam shaper changes the first forming beam into a second forming beam(110c).
Abstract translation: 目的：即使通过光掩模图案的线宽不均匀地组合各种类型的镜头，也提供曝光系统，光掩模和由其制造的晶片以形成期望的图案而不受限制。 构成：光束发生器（200）提供源光束（110a）。 曝光台（300）包括包括用于曝光处理的感光材料的底座（310）和安装底座的底座（360）。 光束形成单元（400）以预设的形状和预设的尺寸形成源光束。 光束形成单元包括第一光束整形器（410），第一偏转器（420），第二光束整形器（435）和第二偏转器（440）。 第一光束整形器将源光束改变为第一成形光束（110b）。 第二光束整形器将第一成形光束改变成第二成形光束（110c）。
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公开(公告)号：KR101052782B1
公开(公告)日：2011-07-29
申请号：KR1020070034406
申请日：2007-04-06
Applicant: 삼성전자주식회사
Inventor： 신영식 , 블라디미르우라자에브 , 정진하 , 임정수 , 손봉수
CPC classification number: F25D23/12 , F25D17/065 , F25D2317/061 , F25D2317/0665 , F25D2400/02 , F25D2400/06 , F25D2700/08 , F25D2700/121 , F25D2700/16
Abstract: 개시된 본 발명에 의한 냉장고는 과냉각실을 갖는 본체와, 과냉각실로 냉기를 공급하기 위한 냉각장치와, 과냉각실에 놓인 식품이 동결되기 시작할 때 방출되는 전자기파를 감지하기 위한 전자기파 감지센서와, 과냉각실에 놓인 식품이 동결되지 못하도록 식품에 에너지를 인가하는 에너지 공급수단과, 전자기파 감지센서로부터 감지신호를 전송받아 에너지 공급수단을 작동시키는 제어장치를 포함하는 것을 특징으로 한다. 이러한 본 발명에 의하면, 과냉각 상태의 음료가 동결되기 시작할 때 음료에서 방출되는 전자기파를 감지하고, 이때 해당 음료에 에너지를 인가함으로써 음료를 과냉각 상태로 안정적으로 유지시킬 수 있다.
냉장고, 과냉각, 동결, 전자기파, 전자기파 감지센서Abstract translation: 根据本冰箱公开的本发明是一种电磁波传感器和过冷室以检测电磁波，食物被放置在冷却装置上，以及用于与过冷却室供应所述主体上的过冷室中，冷却空气室过冷发射它开始冻结 接收食物放置在能量供给装置，用于从被冻结将能量施加到食品和，转递电磁波传感器的感测信号的特征在于，用于操作的能量供应装置的控制装置。 根据本发明，有可能开始当饮料被冻结过冷状态检测由饮料所发射的电磁波，并在这种情况下仍保持稳定在过冷状态将能量施加到饮料的饮料。
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公开(公告)号：KR1020080101195A
公开(公告)日：2008-11-21
申请号：KR1020070047615
申请日：2007-05-16
Applicant: 삼성전자주식회사
Inventor： 함정윤 , 블라디미르우라자에브 , 정진하 , 노지마히데오
IPC: C02F1/44 , B01D61/02 , C02F1/72 , C02F103/00
CPC classification number: C02F1/44 , B01D61/02 , C02F1/72 , C02F2103/007
Abstract: A water purification device and a water purification method thereof are provided to improve of permeability of a water molecule by dropping the pressure at the portion at which water penetrating a reverse osmosis membrane exists. A reservoir tank(10) embodies a reverse osmosis membrane(1), and a first reservoir unit(11) and a second reservoir(12) are classified at the reservoir tank, and the first reservoir keeps the water before purification by the reverse osmosis membrane. The second reservoir keeps the water after the purification. A pressure enhancement unit(20) sucks the inner air of the second reservoir to increase the amount of the purified water.
Abstract translation: 提供一种水净化装置及其水净化方法，其通过降低穿透反渗透膜的水分的压力来提高水分子的渗透性。 储罐（10）体现反渗透膜（1），第一贮存器单元（11）和第二储存器（12）分类在储存箱中，第一储存器通过反渗透保持净化前的水 膜。 第二个储层在净化后保持水分。 压力增强单元（20）吸收第二储存器的内部空气以增加净化水的量。
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公开(公告)号：KR1020140109133A
公开(公告)日：2014-09-15
申请号：KR1020130023460
申请日：2013-03-05
Applicant: 삼성전자주식회사
Inventor： 박기연 , 최재형 , 블라디미르우라자에브 , 정진하
IPC: H01L21/8242 , H01L27/108
CPC classification number: H01L27/1085 , H01L21/283 , H01L21/311 , H01L21/76802 , H01L27/108 , H01L27/10852 , H01L28/60 , H01L28/92
Abstract: Provided are a semiconductor device and a method of fabricating the same. The method of fabricating the semiconductor device comprises the steps of: forming a molding film onto a semiconductor substrate; forming a storage electrode passing through the molding film; exposing a part of the storage electrode by partially etching the molding film; forming a sacrificed oxide film by oxidizing the exposed part of the storage electrode; removing the partially etched molding film and the sacrificed oxide film; forming a capacitor dielectric onto the substrate thereby the molding film and the sacrificed oxide are removed; and forming a plate electrode onto the capacitor dielectric.
Abstract translation: 提供半导体器件及其制造方法。 制造半导体器件的方法包括以下步骤：在半导体衬底上形成成型膜; 形成通过所述成型膜的储存电极; 通过部分蚀刻成型膜来暴露存储电极的一部分; 通过氧化存储电极的暴露部分形成牺牲氧化膜; 去除部分蚀刻的模制薄膜和牺牲的氧化膜; 在基板上形成电容器电介质，由此去除模制膜和牺牲的氧化物; 以及在所述电容器电介质上形成平板电极。
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