公开(公告)号：KR101087583B1

公开(公告)日：2011-11-29

申请号：KR1020090117520

申请日：2009-12-01

Applicant: 한국전기연구원

Inventor： 김종문 ,  오현석 ,  김현택 ,  전정우 ,  정성일

IPC: H01L21/027

CPC classification number: H02K7/09 ,  G03F7/70716 ,  H02K21/12 ,  H02K41/031 ,  H02K2201/15 ,  H02K2201/18

Abstract: PURPOSE: An electromagnetic holder device for an exposing device is provided to improve processing performance by decreasing the length of a mover by removing the chuck part of a magnetic levitation stage mover. CONSTITUTION: A rotating side electromagnet holder(16) is arranged on the upper side of a rotating side mover(11). A rotating side mover includes a rotating side permanent magnet(10). The rotating side electromagnet holder is comprised of a core(14a) and a coil(15a). The rotating side electromagnet holder controls the current to lift the rotating side mover and the transferring side mover up and down. The rotating side electromagnet holder includes a bracket(18a) which connects a core to a transfer stage.

公开(公告)号：KR101146915B1

公开(公告)日：2012-05-22

申请号：KR1020090115095

申请日：2009-11-26

Applicant: 한국전기연구원

Inventor： 김종문 ,  오현석 ,  김현택 ,  전정우 ,  정성일

IPC: H01L21/677 ,  H01L21/20 ,  B65G49/06 ,  C23C14/00

Abstract: PURPOSE: A horizontal contactless deposition apparatus is provided to be easily loaded on a base by a roller of a load lock chamber, thereby increasing the efficiency of a deposition process. CONSTITUTION: A deposition chamber(8) performs a deposition process. A conveyor(9) conveys a substrate in the deposition chamber. A base(10) is formed on the bottom of the deposition chamber. A first support unit is made of a permanent magnet(60) and a magnetic plate(50). A second support unit is formed between the base and the conveyor.

公开(公告)号：KR101117199B1

公开(公告)日：2012-03-07

申请号：KR1020090124537

申请日：2009-12-15

Applicant: 한국전기연구원

Inventor： 전정우 ,  오현석 ,  미티카카라이아니 ,  정성일 ,  김현택 ,  이창린 ,  김종문

IPC: H01L21/68 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/24 ,  G03F7/703 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70791 ,  G03F7/70816 ,  G03F7/70825 ,  G03F7/70841 ,  H01L21/68

Abstract: 본발명은자기부상원리로원통을부상하여비접촉으로회전및 축방향으로이송시키면서원통표면에직접나노미터크기의패턴을새길수 있는새로운형태의스테이지와원통표면에빛을조사하는광원을구현함으로써, 나노미터크기의오차로위치를능동제어할수 있는등 기계가공에의한오차및 외란을실시간적으로보정할수 있고, 결국대형크기의원통표면에나노미터크기의패턴을효율적으로가공할수 있는한편, 스테이지와조합되어광원과원통표면사이를부분적으로진공환경이유지되도록하는차동진공수단을구현함으로써, X선이나전자빔, 그리고극자외선(EUV)과같은광원을적용할수 있는원통형자기부상스테이지및 노광장치를제공한다.

公开(公告)号：KR101087584B1

公开(公告)日：2011-11-29

申请号：KR1020090123745

申请日：2009-12-14

Applicant: 한국전기연구원

Inventor： 김판겸 ,  오현석 ,  정성일 ,  김현택 ,  전정우 ,  김종문

IPC: H01L21/027

CPC classification number: H02K21/12 ,  G03F7/18 ,  H02K7/09 ,  H02K16/00 ,  H02K41/031 ,  H02K2201/15 ,  H02K2201/18

Abstract: PURPOSE: A coating apparatus for a cylindrical substrate using magnetic levitation is provided to perform thin coating with high accuracy over the area of the cylindrical structure by rotating a substrate fixing unit in contactless through magnetic levitation. CONSTITUTION: A base unit(20) comprises a coil assembly. The base unit supports a substrate fixing unit from a lower part without contacting it and is rotatable. A magnetic levitating type substrate fixing unit comprises a magnetism assembly(12) which is arranged on the coil assembly. A cylindrical substrate(1) is mounted in the magnetic levitating type substrate fixture A nozzle unit(30) ejects a coating solution through a nozzle on the surface of the cylindrical substrate which is magnetically levitated and rotated.

公开(公告)号：KR1020110058357A

公开(公告)日：2011-06-01

申请号：KR1020090115109

申请日：2009-11-26

Applicant: 한국전기연구원

Inventor： 김종문 ,  오현석 ,  김현택 ,  전정우 ,  정성일

IPC: B41F15/14 ,  B41F15/08

CPC classification number: B41F15/14 ,  B41F13/20 ,  B41F13/26 ,  B41F15/08

Abstract: PURPOSE: A contactless imprinting apparatus is provided to reduce a failure rate by preventing dust resulting from the friction of bearings. CONSTITUTION: A contactless imprinting apparatus(1) comprises a cylindrical mold, a pair of radial bearings(30), a pair of thrust bearings(40), and a pair of feed rollers(13). The cylindrical mold rotates in order to form a pattern on a flexible substrate. The radial bearings control a radial motion with an electromechanical force. The thrust bearings are provided on the right and left sides in the direction of the rotary axis of the cylindrical mold. The feed rollers form tension between the cylindrical mold and the flexible substrate. Each stator of the radial bearings comprises an upper first stator part(31) and a lower second stator part(32) separated from the first stator part.

Abstract translation: 目的：提供一种非接触式压印装置，通过防止轴承摩擦产生的灰尘来降低故障率。 构成：非接触式压印装置（1）包括圆柱形模具，一对径向轴承（30），一对推力轴承（40）和一对进给辊（13）。 圆柱形模具旋转以在柔性基底上形成图案。 径向轴承通过机电力控制径向运动。 推力轴承沿圆柱形模具的旋转轴线的方向在左右两侧设置。 进料辊在圆柱形模具和柔性基材之间形成张力。 径向轴承的每个定子包括与第一定子部分分离的上部第一定子部分（31）和下部第二定子部分（32）。

公开(公告)号：KR1020110058344A

公开(公告)日：2011-06-01

申请号：KR1020090115095

申请日：2009-11-26

Applicant: 한국전기연구원

Inventor： 김종문 ,  오현석 ,  김현택 ,  전정우 ,  정성일

IPC: H01L21/677 ,  H01L21/20 ,  B65G49/06 ,  C23C14/00

CPC classification number: H01L21/67173 ,  B65G49/065 ,  H01L21/6723 ,  H01L21/67709 ,  H01L21/67784

Abstract: PURPOSE: A horizontal contactless deposition apparatus is provided to be easily loaded on a base by a roller of a load lock chamber, thereby increasing the efficiency of a deposition process. CONSTITUTION: A deposition chamber(8) performs a deposition process. A conveyor(9) conveys a substrate in the deposition chamber. A base(10) is formed on the bottom of the deposition chamber. A first support unit is made of a permanent magnet(60) and a magnetic plate(50). A second support unit is formed between the base and the conveyor.

Abstract translation: 目的：提供一种水平非接触式沉积装置，通过负载锁定室的辊容易地装载在基座上，从而提高沉积工艺的效率。 构成：沉积室（8）执行沉积工艺。 输送机（9）在沉积室中输送基板。 基底（10）形成在沉积室的底部。 第一支撑单元由永磁体（60）和磁性板（50）制成。 第二支撑单元形成在基座和输送机之间。